United States International Trade Commision Rulings And Harmonized Tariff Schedule
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8506.30.50 - 8515.39.00
> 8514.30.20
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HTS Number:
8514.30.20
Description:
Electric furnaces and ovens for diffusion, oxidation or annealing of semiconductor wafers
MFN Duty Rate:
Free
Previous Tariff (8514.30.00 - Industrial or laboratory electric industrial or laboratory furnaces and ovens nesi)
Next Tariff (8514.30.40 - Industrial or laboratory electric furnaces and ovens, nesi)
Related Rulings:
1996 NY 818472 - The tariff classification of semiconductor manufacturing machines from Japan.
1996 NY A81746 - The tariff classification of diffusion furnaces from Japan
1997 NY A89407 - The tariff classification of semiconductor production and test equipment from Japan.
1998 HQ 961005 - NY 818472 and NY A81746 Revoked; Industrial Furnace for Diffusion, Oxidation or Annealing of Semiconductor Wafers, Subheading 8514.30.20; Other Resistance Heated Furnace; GRI 6
1998 HQ 961329 - NY 855845 Modified; Oxidation/Diffusion Furnace, Resistance Heated Furnace; Subheading 8514.30.20, Other Furnaces for Diffusion, Oxidation or Annealing of Semiconductor Wafers; GRI 6
1998 HQ 961330 - NY 862517 Modified; Oxidation/Diffusion Furnace, Resistance Heated Furnace; Subheading 8514.30.20, Other Furnaces for Diffusion, Oxidation or Annealing of Semiconductor Wafers; GRI 6
1998 HQ 961332 - NY A89407 Modified; Oxidation/Diffusion Furnace, Resistance Heated Furnace; Subheading 8514.30.20, Other Furnaces for Diffusion, Oxidation or Annealing of Semiconductor Wafers; GRI 6
1998 NY NY477 - The tariff classification of semiconductor production and test equipment from Japan.