United States International Trade Commision Rulings And Harmonized Tariff Schedule

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HTS Number: 8514.10.80

Description: Resistance heated industrial or laboratory furnaces and ovens, nesoi

Previous Tariff (8514.10.40 - Resistance heated industrial or laboratory furnaces and ovens for the manufacture of semiconductor devices on semiconductor wafers)
Next Tariff (8514.20.00 - Induction or dielectric industrial or laboratory furnaces and ovens)

Related Rulings:

• 1998 HQ 961005 - NY 818472 and NY A81746 Revoked; Industrial Furnace for Diffusion, Oxidation or Annealing of Semiconductor Wafers, Subheading 8514.30.20; Other Resistance Heated Furnace; GRI 6
• 1998 HQ 961329 - NY 855845 Modified; Oxidation/Diffusion Furnace, Resistance Heated Furnace; Subheading 8514.30.20, Other Furnaces for Diffusion, Oxidation or Annealing of Semiconductor Wafers; GRI 6
• 1998 HQ 961330 - NY 862517 Modified; Oxidation/Diffusion Furnace, Resistance Heated Furnace; Subheading 8514.30.20, Other Furnaces for Diffusion, Oxidation or Annealing of Semiconductor Wafers; GRI 6
• 1998 HQ 961332 - NY A89407 Modified; Oxidation/Diffusion Furnace, Resistance Heated Furnace; Subheading 8514.30.20, Other Furnaces for Diffusion, Oxidation or Annealing of Semiconductor Wafers; GRI 6