United States International Trade Commision Rulings And Harmonized Tariff Schedule
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8446.30.50 - 8458.99.50
> 8456.99.10
Previous Tariff (8456.91.00 - Machine tools for dry etching patterns on semiconductor materials by electro-chemical, electron-beam, ionic-beam or plasma arc processes)
Next Tariff (8456.99.30 - Machine tool for working metal by removal of material nesoi, operated by electro-chemical, electron-beam, ionic-beam or plasma arc processes)
HTS Number:
8456.99.10
Description:
Focused ion beam milling machines to produce or repair masks and reticles for patterns on semiconductor devices
MFN Duty Rate:
Free
Previous Tariff (8456.91.00 - Machine tools for dry etching patterns on semiconductor materials by electro-chemical, electron-beam, ionic-beam or plasma arc processes)
Next Tariff (8456.99.30 - Machine tool for working metal by removal of material nesoi, operated by electro-chemical, electron-beam, ionic-beam or plasma arc processes)
Related Rulings:
2000 NY G80858 - The tariff classification of ion sources from England