Patent application number | Description | Published |
20120094472 | METHODS FOR FABRICATING THIN FILM PATTERN AND ARRAY SUBSTRATE - A method for fabricating a thin film pattern and a method for fabricating an array substrate are provided. The method for fabricating a thin film pattern comprises: forming a first film and a second film sequentially; applying a layer of photoresist on the second film; forming a photoresist pattern comprising a totally left region, a partially left region and a totally removed region; performing a first wet etching on the second film in the totally removed region; performing a first dry etching on the first film in the totally removed region to form a first pattern, and etching the photoresist layer to remove the photoresist in the partially left region to expose the second film in the partially left region; performing a second wet etching on the second film in the partially left region; performing a second dry etching to form a second pattern; and removing the residual photoresist. | 04-19-2012 |
20120276697 | MANUFACTURING METHOD OF ARRAY SUBSTRATE - A manufacturing method of an array substrate, comprising the following steps: S1 forming a gate signal line and a gate electrode on a base substrate, successively depositing a gate insulating layer, an active layer, and a metal layer, faulting a mask formed of photoresist on the metal layer, and removing the metal layer outside a region for forming a data line and source/drain electrodes through the mask; S2. simultaneously etching the active layer and ashing the photoresist so as to expose the metal layer within a channel region; S3. etching the active layer exposed by the photoresist after being ashed after the step S2; S4. removing the metal layer within the channel region. | 11-01-2012 |
20120287506 | COLOR FILTER SUBSTRATE CAPABLE OF POLARIZING AND MANUFACTURING METHOD THEREOF - The present disclosure relates to a field of liquid crystal display. A color filter substrate capable of polarizing and a manufacturing method thereof are disclosed. The manufacturing method of a color filter substrate comprises: step 1, forming an intermediate layer containing conductor on a substrate; step 2, forming a photoresist layer on the intermediate layer; step 3, forming the photoresist layer into a photoresist pattern with a grating pattern of nanometer size; and step 4, using this photoresist pattern with a grating pattern of nanometer size to etch the underlying intermediate layer to form the intermediate layer into a black matrix and a polarizing structure having grating patterns. | 11-15-2012 |
20130141775 | ELECTROWETTING DISPLAY PANEL AND THE MANUFACTURING METHOD THEREOF - Embodiments of the present disclosure provide an electrowetting display panel and the manufacturing method thereof The electrowetting display panel comprises: a first glass substrate; a second glass substrate provided opposite to the first glass substrate; a cavity provided between the first glass substrate and the second glass substrate; a colored conductive liquid filled into the cavity; and a reflecting conductive element provided on the surface of the first glass substrate facing away from the second glass substrate, and corresponding to the cavity, wherein the reflecting conductive element is used for controlling the light transmissivity of the colored conductive liquid within the cavity according to the voltage applied to the reflecting conductive element and reflecting the light passing through the colored conductive liquid toward the second glass substrate. | 06-06-2013 |
20140054586 | MANUFACTURING METHOD OF ARRAY SUBSTRATE, ARRAY SUBSTRATE AND DISPLAY - Embodiments of the present invention disclose a manufacturing method of an array substrate, an array substrate and a display. The manufacturing method comprises: forming a gate electrode of a TFT on a substrate; forming a metal oxide semiconductor thin film and a top metal thin film, and performing a mask process to the metal oxide semiconductor thin film and the top metal thin film, in order to form an active layer opposing the gate electrode and a source electrode and a drain electrode of the TFT respectively; and forming a passivation layer overlying the source electrode and the drain electrode, wherein during the mask process to the top metal thin film, a hydrogen peroxide-based etchant with a pH value between 6 and 8 is used to etch the top metal thin film. | 02-27-2014 |
20140054620 | ARRAY SUBSTRATE, METHOD FOR MANUFACTURING THE SAME AND DISPLAY DEVICE - Embodiments of the present invention provide an array substrate, a method for manufacturing the same and a display device. The method for manufacturing a thin film transistor array substrate comprises: forming a passivation layer and a resin layer on a substrate in sequence; removing a part of the resin layer through a patterning process, so as to form a resin-layer via hole passing through the resin layer; etching the passivation layer under the resin-layer via hole, so as to form a via hole passing through the resin layer and the passivation layer; treating the via hole with an etching process, so that a sidewall at the resin layer and a sidewall at the passivation layer for the via hole smoothly adjoin. | 02-27-2014 |
20140061634 | THIN FILM TRANSISTOR, METHOD FOR MANUFACTURING THE SAME, ARRAY SUBSTRATE AND DISPLAY DEVICE - According to embodiments of the invention, a thin film transistor (TFT), a manufacturing method of the TFT, an array substrate and a display device are provided. The manufacturing method of the TFT comprises: forming a gate electrode on a substrate; forming a gate insulating layer on the substrate formed with the gate electrode; forming an oxide semiconductor active layer, an etch stop layer and a source/drain electrode on the gate insulating layer, wherein the etch stop layer is obtained by an oxidation treatment. | 03-06-2014 |
20140070206 | Array Substrate, Method For Manufacturing The Same And Display Device - A manufacturing method of an array substrate, comprising the following steps: S1: forming a pattern comprising a semiconductor layer ( | 03-13-2014 |
20140084282 | THIN FILM TRANSISTOR, ARRAY SUBSTRATE AND DISPLAY DEVICE - Embodiments of the present invention provide a thin film transistor, an array substrate and a display device. The thin film transistor comprises a gate layer, a first insulating layer, an active layer, an etch stop layer and a source/drain electrode layer, wherein the active layer is made of a metal oxide material, the first insulating layer, the active layer, the etch stop layer and the source/drain electrode layer are sequentially stacked from bottom to top, the source/drain electrode layer contains an interval separating a source electrode and a drain electrode therein, the etch stop layer is located below the interval, and the etch stop layer has a width greater than that of the interval, and the first insulating layer comprises a laminate of a first sub-insulation layer and a second sub-insulation layer, the second sub-insulation layer is in contact with the active layer and made of an oxygen-rich insulating material. | 03-27-2014 |
20140125901 | ARRAY SUBSTRATE, MANUFACTURING METHOD THEREOF AND DISPLAY DEVICE - Embodiments of the present application relate to an array substrate, the manufacturing method thereof and a display device. The array substrate comprises: a substrate, of gate lines and of data lines, a plurality of pixel units, defined by the gate lines and the data lines, each of the pixel units comprising a thin film transistor and a pixel electrode, wherein the thin film transistor comprises a source electrode, a drain electrode, an active layer, a gate insulating layer and a gate electrode, and the source electrode and the drain electrode are provided on the substrate opposing to each other with a channel of the thin film transistor provided therebetween, and the pixel electrode is positioned in a region outside the thin film transistor within the pixel unit, and is extended to a position above the drain electrode to be partly lapped over and directly connected to the drain electrode. | 05-08-2014 |