Patent application number | Description | Published |
20120167573 | Thermal Barrier Coatings and Methods of Application - A coated part is exposed to a gas flow. The gas flow has a characteristic gas flow direction distribution over a surface of the coated part. The coated part has a substrate having a substrate surface and a coating over the substrate surface. The coating comprises at least one coating layer. A first such layer is columnar and has a column boundary direction distribution. The column boundary direction distribution is selected for partial local alignment with the gas flow direction distribution. | 07-05-2012 |
20120196051 | Deposition Apparatus and Methods - A deposition apparatus includes a deposition chamber and a deposition material source. An electron beam source is positioned to direct a first electron beam to vaporize a portion of the deposition material. A first electrode is provided for generating a primary plasma from the deposition material source. A second electrode is provided for generating a secondary plasma and further accelerating ions from the primary plasma. A bias electric potential is applied to the workpiece to draw ions from the secondary plasma to the workpiece. A control system may be coupled to the electron beam source, the bias voltage source, and power supplies for the first and second electrodes. | 08-02-2012 |
20120231173 | Ceramic Coating Deposition - A material is applied to a part. The part is placed in a deposition chamber and a first electric potential is applied to the part. Components are evaporated for forming the material. The evaporated components are ionized. The first electric potential is modulated so as to draw the ionized component to the part. The modulation comprises a plurality of first steps for PA-PVD. Each of the first steps comprises a series of pulses of negative potential. The modulation further comprises a plurality of second steps for PVD alternating with the first steps. | 09-13-2012 |
20120244290 | Deposition Substrate Temperature and Monitoring - The disclosure provides an apparatus for depositing a coating on one or more parts ( | 09-27-2012 |
20120328903 | METHOD FOR LIMITING SURFACE RECRYSTALLIZATION - A method to limit surface zone recrystallization in a superalloy article includes limiting recrystallization in a surface zone of a superalloy article by treating the superalloy article in an oxygen-containing environment to introduce oxygen into the surface zone in an amount sufficient to pin any new grain boundaries in the surface zone. | 12-27-2012 |
20130129937 | Vapor Deposition of Ceramic Coatings - An apparatus for applying a coating to a substrate comprises a deposition chamber. A crucible may hold a melt pool of coating material. The melt pool is rotated during deposition. | 05-23-2013 |
20130309419 | Ceramic Coating Deposition - A ceramic material is applied to a part. The part is placed in a deposition chamber and a first electric potential is applied to the part. Components are evaporated for forming the material. The evaporated components are ionized. The first electric potential is modulated so as to draw the ionized component to the part. The modulation comprises maintaining at least an ion current density in a range of 2-1000 mA/cm | 11-21-2013 |
20140199490 | Deposition Substrate Temperature and Monitoring - An apparatus for depositing a coating on one or more parts ( | 07-17-2014 |