Patent application number | Description | Published |
20090027638 | Lithographic appararus and method - A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system includes a first gas-conditioned sub-environment and a second gas-conditioned sub-environment. The apparatus includes a gas control unit configured to control the feeding of conditioned gas into the first sub-environment and into the second sub-environment via the first sub-environment so as to prevent contamination from the second sub-environment to the first sub-environment. The apparatus includes a gate configured to leak the conditioned gas at a rate from the second sub-environment to ambient atmosphere, and a detector configured to detect at least one property of the second gas-conditioned environment. | 01-29-2009 |
20090073396 | Lithographic apparatus and device manufacturing method - A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source. | 03-19-2009 |
20090090877 | MODULE AND METHOD FOR PRODUCING EXTREME ULTRAVIOLET RADIATION - A module for producing extreme ultraviolet radiation includes a supply configured to supply droplets of an ignition material to a predetermined target ignition position and a laser arranged to be focused on the predetermined target ignition position and to produce a plasma by hitting such a droplet which is located at the predetermined target ignition position in order to change the droplet into an extreme ultraviolet producing plasma. Also, the module includes a collector mirror having a mirror surface constructed and arranged to reflect the radiation in order to focus the radiation on a focal point. A fluid supply is constructed and arranged to form a gas flow flowing away from the mirror surface in a direction transverse with respect to the mirror surface in order to mitigate particle debris produced by the plasma. | 04-09-2009 |
20100116029 | Gas Gauge, Lithographic Apparatus and Device Manufacturing Method - A gas gauge has a gas delivery tube arranged to determine a distance to an object. The gas delivery tube includes a gas conduit through which a suitable measurement gas is supplied. The measurement gas leaves the gas delivery tube under pressure via an outlet and impinges on the object in an interaction area, wherein a pressure of a recoiled gas is measured by a pressure detector. A gas having a low atomic number may be used. The pressure sensor may include a membrane positioned in the gas delivery tube at least partially enveloping the gas conduit at or near the gas outlet. The pressure sensor may include a membrane disk arranged about the gas conduit. The pressure sensor may include a suitable plurality of pressure elements arranged in a substantially common plane and which may be spaced apart yet enveloping the gas conduit. | 05-13-2010 |
20100309447 | LITHOGRAPHIC APPARATUS, A PROJECTION SYSTEM AND A DEVICE MANUFACTURING METHOD - A lithographic apparatus is disclosed that includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate, a vacuum chamber through which the patterned beam of radiation is projected during use, and a purge system configured to provide a purge gas flow in the chamber. | 12-09-2010 |
20120147348 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source. | 06-14-2012 |
20150077728 | SENSOR, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized. | 03-19-2015 |
20150077729 | MODULE AND METHOD FOR PRODUCING EXTREME ULTRAVIOLET RADIATION - A module for producing extreme ultraviolet radiation, including an extreme ultraviolet radiation-emitting source, the source being provided with a supply configured to supply a fluid of an ignition material to a predetermined target ignition position and a target-igniting mechanism constructed and arranged to produce a plasma from the ignition material at the target ignition position, the plasma emitting the extreme ultraviolet radiation; a collector mirror constructed and arranged to focus radiation emitted by the plasma at a focal point; and a heat sink having a thermal energy-diverting surface constructed and arranged to divert thermal energy away from the target ignition position, wherein the heat sink is located at a position proximate the target ignition position. | 03-19-2015 |