Yuji Kamikawa
Yuji Kamikawa, Koshi-Shi JP
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20090056764 | Liquid processing apparatus, liquid processing method, and storage medium - A liquid processing apparatus | 03-05-2009 |
20090078287 | Liquid processing apparatus and process liquid supplying method - A liquid processing apparatus includes: a processing part | 03-26-2009 |
20110079240 | ULTRASONIC CLEANING APPARATUS, ULTRASONIC CLEANING METHOD, AND STORAGE MEDIUM STORING COMPUTER PROGRAM FOR EXECUTING ULTRASONIC CLEANING METHOD - An ultrasonic cleaning apparatus including: a cleaning tank for storing a cleaning liquid; an object-to-be-processed holder for insertion into the cleaning tank, the holder holding an object to be processed and immersing the object into the cleaning liquid; a vibrator disposed on a bottom part of the cleaning tank; and an ultrasonic oscillator configured to make the vibrator ultrasonically vibrate. In the cleaning tank, a lateral holding member configured to hold the object is disposed. The holder is configured to be laterally moved by a driving apparatus. The control device is configured to control the driving apparatus such that the holder is laterally moved after the object has been held by the lateral holding member, and the control device is configured to control the ultrasonic oscillator such that the vibrator is made to ultrasonically vibrate so that the ultrasonic vibration from the vibrator is propagated to the object. | 04-07-2011 |
20120312332 | LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORAGE MEDIUM - A liquid processing apparatus | 12-13-2012 |
Yuji Kamikawa, Tosu-Shi JP
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20090010748 | Batch forming apparatus, substrate processing system, batch forming method, and storage medium - A batch forming apparatus forms a batch of substrates by combining a plurality of substrates that have been taken out from a plurality of carriers each containing therein the substrates in a stacked manner. The batch forming apparatus includes: a substrate transfer mechanism that takes out the substrates from each carrier and transfer the substrates; a substrate relative positional relationship changing mechanism that rearranges one or more substrates out of the substrates transferred by the substrate transfer mechanism one by one relative to other substrates to change positional relationships of the substrates relative to each other; and a batch forming mechanism that forms a batch of substrates out of the substrates that have been transferred thereto by the substrate transfer mechanism, with positional relationships of the substrates having been changed relative to each other by the substrate relative positional relationship changing mechanism. A substrate processing system includes such a batch forming apparatus, and a substrate processing apparatus that process the batch of substrates formed by the batch forming apparatus. | 01-08-2009 |
20100215461 | SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus | 08-26-2010 |
20110290280 | SUBSTRATE PROCESSING METHOD AND NON-TRANSITORY STORAGE MEDIUM FOR CARRYING OUT SUCH METHOD - Disclosed is a substrate processing apparatus for cleaning and drying a substrate such as a semiconductor wafer. This substrate processing apparatus includes a liquid processing unit for processing a substrate by immersing the substrate in stored purified water, a drying unit arranged above the liquid processing unit and configured to dry the substrate, a substrate transfer apparatus for transferring the substrate between the liquid processing unit and drying unit, a fluid supply mechanism for supplying a fluid mixture containing vapor or mist of purified water and vapor or mist of a volatile organic solvent to the drying unit, and a controller for controlling the supply of the fluid mixture. | 12-01-2011 |
20140356106 | SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus, which utilizes a first transfer apparatus and a second transfer apparatus which are configured to transfer a transfer container containing a plurality of substrates, along a first transfer path and a second transfer path whose lateral positions differ from each other, respectively, including a first load port where the transfer container is loaded and unloaded by the first transfer apparatus, and a second load port that is arranged stepwise with respect to the first load port, with the transfer container being loaded to and unloaded from the second load port by the second transfer apparatus. | 12-04-2014 |
Yuji Kamikawa, Saga-Ken JP
Patent application number | Description | Published |
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20090151756 | Liquid treating apparatus - A liquid treating apparatus comprising a holding device ( | 06-18-2009 |
20100083986 | LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORAGE MEDIUM - A liquid processing apparatus includes: a hollow holding plate configured to hold an object to be processed; a hollow outer rotational shaft fixedly connected to the holding plate; a rotary drive part configured to rotate the outer rotational shaft; and a lift pin plate disposed in a hollow space of the holding plate, and having a lift pin configured to support the object to be processed. Inside the lift pin plate, a cleaning-liquid supply part configured to supply a cleaning liquid is extended. Connected to the lift pin plate is a lifting member configured to locate the lift pin plate on an upper position and a lower position. When located on the lower position, the lift pin plate receives a force of the rotary drive part for rotating the outer rotational shaft so that the lift pin plate is rotated. | 04-08-2010 |
20100147335 | LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORAGE MEDIUM - A liquid processing apparatus includes: a hollow holding plate to hold an object to be processed; a hollow outer rotary shaft fixedly joined to the holding plate; a lift pin plate having a lift pin to support the object; an inner rotary shaft fixedly joined to the lift pin plate; and a lifting member to raise and lower the lift pin plate to locate the lift pin plate on an upper position and a lower position. Inside the inner rotary shaft, there is disposed a cleaning-liquid supply part to supply a cleaning liquid to the object to be processed. An outer rotary drive part is joined to the outer rotary shaft, the outer rotary drive part being configured to rotate the outer rotary shaft. An inner rotary drive part is joined to the inner rotary shaft, the inner rotary drive part being configured to rotate the inner rotary shaft. | 06-17-2010 |
Yuji Kamikawa, Tosu City JP
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20090265039 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM - A substrate processing apparatus capable of reducing a consumed amount of a processing liquid is provided. The substrate processing apparatus includes a plurality of processing units | 10-22-2009 |
20100095981 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - Disclosed are a substrate processing apparatus and a substrate processing method to efficiently remove a resist residue of a substrate surface by using sulfuric acid without hydrogen peroxide solution that is not stable in a high temperature, or by using sulfuric acid together with hydrogen peroxide solution that is not stable in a high temperature. The substrate processing apparatus to process a substrate by using a first processing liquid including sulfuric acid and a second processing liquid including water includes a liquid-film forming device to form a liquid film of the first processing liquid maintained at a temperature higher than room temperature on at least one surface of the substrate, and a vapor/mist supply device to supply vapor or mist of the second processing liquid on the surface of the substrate on which the liquid film of the first processing liquid is formed. Further, the substrate processing apparatus to process a substrate within a processing chamber by using a first processing liquid including sulfuric acid and a second processing liquid including hydrogen peroxide solution includes a processing tank to store the first processing liquid at a temperature higher than room temperature, a substrate elevating mechanism to move the substrate up and down between the processing tank and the processing chamber, and a mist supply device to supply mist of the second processing liquid to a portion of the substrate in the vicinity of a liquid surface of the first processing liquid stored in the processing tank when the substrate is lifted from or immersed into the processing tank by the substrate elevating mechanism. | 04-22-2010 |
Yuji Kamikawa, Tosu City Saga JP
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20100058606 | EVAPORATOR, EVAPORATION METHOD AND SUBSTRATE PROCESSING APPARATUS - Disclosed are an evaporator, an evaporation method, and a substrate processing apparatus, which can increase the concentration of generated vapor of an organic solvent and efficiently heat the organic solvent. The evaporator includes a fluid tube, a liquid organic solvent supply device for supplying the organic solvent liquid to one end of the fluid tube, and heating units for heating the fluid tube. The fluid tube has a cross section that increases from the one end to the other end. When the organic solvent liquid supplied to one end of the fluid tube is heated, the organic solvent vapor is discharged from the other end of the fluid tube. The substrate processing apparatus includes the above-described evaporator. | 03-11-2010 |
20120323052 | EVAPORATOR, EVAPORATION METHOD AND SUBSTRATE PROCESSING APPARATUS - Disclosed are an evaporator, an evaporation method, and a substrate processing apparatus, which can increase the concentration of generated vapor of an organic solvent and efficiently heat the organic solvent. The evaporator includes a fluid tube, a liquid organic solvent supply device for supplying the organic solvent liquid to one end of the fluid tube, and heating units for heating the fluid tube. The fluid tube has a cross section that increases from the one end to the other end. When the organic solvent liquid supplied to one end of the fluid tube is heated, the organic solvent vapor is discharged from the other end of the fluid tube. The substrate processing apparatus includes the above-described evaporator. | 12-20-2012 |
Yuji Kamikawa, Saga JP
Patent application number | Description | Published |
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20090101186 | Substrate Processing Apparatus and Substrate Processing Method - Disclosed is a substrate processing apparatus for cleaning and drying a substrate such as a semiconductor wafer. This substrate processing apparatus includes a liquid processing unit for processing a substrate by immersing the substrate in stored purified water, a drying unit arranged above the liquid processing unit and configured to dry the substrate, a substrate transfer apparatus for transferring the substrate between the liquid processing unit and drying unit, a fluid supply mechanism for supplying a fluid mixture containing vapor or mist of purified water and vapor or mist of a volatile organic solvent to the drying unit, and a controller for controlling the supply of the fluid mixture. | 04-23-2009 |
20140020849 | EVAPORATOR, EVAPORATION METHOD AND SUBSTRATE PROCESSING APPARATUS - Disclosed are an evaporator, an evaporation method, and a substrate processing apparatus, which can increase the concentration of generated vapor of an organic solvent and efficiently heat the organic solvent. The evaporator includes a fluid tube, a liquid organic solvent supply device for supplying the organic solvent liquid to one end of the fluid tube, and heating units for heating the fluid tube. The fluid tube has a cross section that increases from the one end to the other end. When the organic solvent liquid supplied to one end of the fluid tube is heated, the organic solvent vapor is discharged from the other end of the fluid tube. The substrate processing apparatus includes the above-described evaporator. | 01-23-2014 |
Yuji Kamikawa, Kumamoto JP
Patent application number | Description | Published |
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20110240066 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM - Disclosed is a substrate processing apparatus capable of drying a substrate to be processed while suppressing a pattern collapse or occurrence of contamination. In a processing vessel, a substrate is immersed in a liquid in the longitudinal direction, and the liquid is pushed out by a substitution fluid of a supercritical state to be discharged from the processing vessel. Thereafter, the substitution fluid subjected to the substitution with the liquid is discharged from the processing vessel to depressurize the processing vessel, and the substitution fluid is changed from the supercritical state to a gaseous state to dry the substrate. | 10-06-2011 |
20110247662 | SUBSTRATE PROCESSING APPARATUS - Disclosed is a substrate processing apparatus capable of drying a substrate to be processed while suppressing the pattern collapse or the occurrence of contamination. A substrate is held in a liquid bath while being immersed in a liquid, and the liquid bath is disposed in a processing space of a processing vessel. A processing of drying the substrate is performed by replacing the liquid in the liquid bath with a supercritical-state fluid. A predetermined mechanism moves liquid bath between a processing location in the processing case and a stand-by location outside the processing case. A heater installed in the processing case changes the fluid to a supercritical state or maintains the supercritical state while cooling mechanisms cool down the liquid bath moved to the stand-by location outside the processing vessel. | 10-13-2011 |
Yuji Kamikawa, Koshi-City JP
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20120006356 | Substrate Processing Apparatus, Substrate Processing Method, and Computer-Readable Storage Medium - Disclosed is a substrate processing apparatus in which a liquid state raw material is maintained at a high-temperature and high-pressure fluid state by a cooling mechanism at a first raw material receiving unit, a supplying valve of a raw material supplying path is opened to provide the high-temperature and high-pressure fluid to a processing chamber where a target substrate is disposed, and the target substrate is dried by the high-temperature and high-pressure fluid. A second raw material receiving unit is cooled down below a condensation temperature of the raw material by a second cooling mechanism, the high-temperature and high-pressure fluid in the processing chamber is collected at the second raw material receiving unit by opening a collecting valve. The collected raw material is re-utilized as a raw material supplied from the first raw material receiving unit to the processing chamber. | 01-12-2012 |
20120132230 | Substrate Processing Apparatus, Substrate Processing Method, and Storage Medium - Disclosed is a substrate processing apparatus including a processing vessel in which a target substrate W is processed by using a high-pressure fluid in a supercritical state or a subcritical state, and pipes that are divided into a first pipe member and a second pipe member in a flowing direction of the fluid and circulate the fluid are connected to processing vessel. A connecting/disconnecting mechanism moves at least one of first and second pipe members between a connection position and a separation position of first pipe member and the second pipe member, and opening/closing valves are installed in each of first and second pipe members and are closed at the time of separating pipe members. | 05-31-2012 |
20130319470 | NOZZLE CLEANING DEVICE, NOZZLE CLEANING METHOD, AND SUBSTRATE PROCESSING APPARATUS - A nozzle cleaning device is capable of uniformly cleaning a nozzle from a front end of the nozzle to an upper part thereof. The nozzle cleaning device includes a storage tank, a liquid discharging portion and an overflow discharging portion. The storage tank has a cylindrical inner peripheral surface and is configured to store therein a cleaning liquid that cleans a nozzle used in a substrate process. The liquid discharging portion is configured to discharge the cleaning liquid into the storage tank toward a position eccentric with respect to a central axis of the cylindrical inner peripheral surface to store the cleaning liquid within the storage tank and configured to form a vortex flow of the cleaning liquid revolving within the storage tank. The overflow discharging portion is configured to discharge the cleaning liquid that overflows the storage tank. | 12-05-2013 |
Yuji Kamikawa, Kanagawa JP
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20130136487 | CLEANING DEVICE, IMAGE FORMING APPARATUS, AND TRANSFER UNIT - A cleaning device includes a first cleaning member, a first opposing member, a second cleaning member, a second opposing member, and a pressing member. The first and second cleaning members clean an outer surface of a belt member by coming into contact with the outer surface. The first and second opposing members are in contact with an inner face of the belt member at positions that are opposite the first and second cleaning members. The pressing member is disposed between the first and second opposing members and is in contact with the outer surface of the belt member. The pressing member presses a portion of the belt member that is located between the first and second opposing members from an outer surface side of the belt member toward an inner face side of the belt member. | 05-30-2013 |
20140056609 | CLEANING DEVICE AND IMAGE FORMING APPARATUS - A cleaning device includes first and second cleaning members and a moving member. The first cleaning member contacts a surface of a rotating member, which is in contact with an image carrier, to clean the rotating member by removing substances attached thereto. The moving member supports the first cleaning member in a movable manner. The second cleaning member is disposed downstream of the first cleaning member in a rotation direction in which the rotating member rotates and contacts the surface of the rotating member to clean the rotating member by removing the substances. The second cleaning member removes the substances that remain on the surface of the rotating member after the first cleaning member has been separated from the rotating member so that the substances are removed before a part of the surface of the rotating member on which the substances remain comes into contact with the image carrier. | 02-27-2014 |
Yuji Kamikawa, Tokyo JP
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20130152964 | SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM AND PROGRAM STORAGE MEDIUM - The present invention provides a substrate cleaning method capable of removing particles from the entire surface of a substrate to be processed at a high removing efficiency. In the substrate cleaning method according to the present invention, a substrate to be processed W is immersed in a cleaning liquid in a cleaning tank | 06-20-2013 |