Patent application number | Description | Published |
20120028196 | METHOD OF FORMING PATTERN AND ORGANIC PROCESSING LIQUID FOR USE IN THE METHOD - An embodiment of the method of forming a pattern, comprises (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) processing the exposed film with an organic processing liquid, wherein the processing liquid contains an organic solvent whose normal boiling point is 175° C. or higher, the organic solvent being contained in the processing liquid in a content of less than 30 mass %. | 02-02-2012 |
20120076948 | METHOD FOR PRODUCING CURABLE COMPOSITION FOR IMPRINTS - Provided is a method for producing a curable composition for imprints which excellent in patternability. | 03-29-2012 |
20120207943 | METHOD FOR PRODUCING CURABLE COMPOSITION FOR IMPRINTS - Provided is a method of producing a curable composition for imprints including (A) a polymerizable monomer, (B) a polymerization initiator, and (C) a solvent which is capable of effectively suppressing lifting or separation of patterns, excellent in coatability, and excellent in time-dependent stability. The method of producing a curable composition for imprints comprises preparing one species of liquid (D) which contains at least either one of the polymerizable monomer (A) and the polymerization initiator (B), passing the liquid (D) through a filter, and then adding the solvent (C). | 08-16-2012 |
20130011785 | PATTERN FORMING METHOD AND RESIST COMPOSITION - Provided is a method of forming a pattern, ensuring excellent exposure latitude (EL) and focus latitude (depth of focus DOF). The method of forming a pattern includes (A) forming a film from a resist composition, the resist composition, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent, thereby forming a negative pattern. The resist composition contains (a) a resin that is configured to decompose when acted on by an acid and ΔSP thereof represented by formula (1) below is 2.5 (MPa) | 01-10-2013 |
20140154471 | CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN - Disclosed is a to provide a curable composition for imprints capable of keeping a good patternability and of producing less defects even after repetitive pattern transfer. The curable composition for imprints comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a
| 06-05-2014 |
20140220353 | UNDERLAY FILM COMPOSITION FOR IMPRINTS AND METHOD OF FORMING PATTERN AND PATTERN FORMATION METHOD USING THE SAME - Provided is the pattern formability and line edge roughness of the resultant substrate. | 08-07-2014 |
20140255662 | CURABLE COMPOSITION FOR IMPRINT, PATTERN-FORMING METHOD AND PATTERN - Provide a curable composition for imprint, which is improved in the surface roughness of the cured film. A curable composition for imprint comprising a polymerizable compound (A), a polymerization initiator (B), and a non-polymerizable compound (C),
| 09-11-2014 |
20150014819 | UNDERLYING FILM COMPOSITION FOR IMPRINTS AND PATTERN FORMING METHOD USING THE SAME - Provided is an underlying film composition for imprints showing a good adhesiveness with a base and capable of reducing failure or defect of resist pattern. The underlying film composition for imprints comprising a curable main component and a urea-based crosslinking agent. | 01-15-2015 |
20150079793 | ADHESION-PROMOTING COMPOSITION USED BETWEEN CURABLE COMPOSITION FOR IMPRINTS AND SUBSTRATE, AND SEMICONDUCTOR DEVICE USING THE SAME - Provided is an adhesion-promoting composition between a curable composition for imprints and a substrate, which excellent in adhesiveness and can control pattern failure. An adhesion-promoting composition used between a curable composition for imprints and a substrate, which comprises a compound having a molecular weight of 500 or larger and having a reactive group, and has a content of a compound, with a molecular weight of 200 or smaller, of more than 1% by mass and not more than 10% by mass of a total solid content. | 03-19-2015 |
20150079804 | UNDER LAYER FILM-FORMING COMPOSITION FOR IMPRINTS AND METHOD OF FORMING PATTERN - An under layer film having excellent surface planarity is provided. In one aspect, the under layer film-forming composition for imprints includes a (meth)acrylic resin (A) containing an ethylenic unsaturated group (P) and a nonionic hydrophilic group (Q), and having a weight average molecular weight of 1,000 or larger; and a solvent (B), the resin (A) having an acid value of smaller than 1.0 mmol/g. In another aspect, the under layer film-forming composition for imprints includes a (meth)acrylic resin (A2) containing an ethylenic unsaturated group (P), and containing, as a nonionic hydrophilic group (Q), a cyclic substituent (Q2) having a carbonyl group in the cyclic structure thereof, with a weight average molecular weight of 1,000 or larger; and a solvent (B). | 03-19-2015 |