Patent application number | Description | Published |
20080251832 | Logic compatible arrays and operations - An array of memory cells arranged in a plurality of rows and a plurality of columns are provided. The array includes a first program line in a first direction, wherein the first program line is connected to program gates of memory cells in a first row of the array; a first erase line in the first direction, wherein the first erase line is connected to erase gates of the memory cells in the first row of the array; and a first word-line in the first direction, wherein the first word-line is connected to word-line nodes of the memory cells in the first row of the array. | 10-16-2008 |
20110233654 | NANO-CRYSTAL GATE STRUCTURE FOR NON-VOLATILE MEMORY - A non-volatile memory device is disclosed having a charge storage layer that incorporates a plurality of nano-crystals. A substrate having a source region and a drain region is provided. Select and control gates are formed on the substrate. The charge storage layer is provided between the control gate and the substrate. The nano-crystals in the charge storage layer have a size of about 1 nm to about 10 nm, and may be formed of Silicon or Germanium. Writing operations are accomplished via hot electron injection, FN tunneling, or source-side injection. Erase operations are accomplished using FN tunneling. The control gate is formed of a single layer of polysilicon, which reduces the total number of processing steps required to form the device, thus reducing cost. | 09-29-2011 |
20120087188 | STRUCTURE AND INHIBITED OPERATION OF FLASH MEMORY WITH SPLIT GATE - A method of performing a reading operation to a memory device including a plurality of flash memory cells. The method includes applying a first voltage bias to a control gate of a selected memory cell in the flash memory array and applying a second voltage bias to a word line of the selected memory cell. A control gate of an unselected memory cell in the flash memory array is grounded and a third voltage bias is applied to a word line of the unselected cell to turn off a word line channel of the unselected memory cell. The selected memory cell and unselected memory cell are configured in the memory device and are connected to different word lines. The first voltage bias and the second voltage bias have a same polarity. The third voltage bias and the second voltage bias have opposite polarities. | 04-12-2012 |
20130064017 | CONCURRENT OPERATION OF PLURAL FLASH MEMORIES - A device comprises an address storage device. A first circuit includes a first flash memory, configured to sequentially receive first and second addresses and store the first address in the address storage device. The first circuit has a first set of control inputs for causing the first circuit to perform a first operation from the group consisting of read, program and erase on a cell of the first flash memory corresponding to a selected one of the first and second addresses. A second circuit includes a second flash memory, configured to receive the second address. The second circuit has a second set of control inputs for causing the second circuit to read data from a cell of the second flash memory corresponding to the second address while the first operation is being performed. | 03-14-2013 |
20130070519 | READ ARCHITECTURE FOR MRAM - A read architecture for reading random access memory (RAM) cells includes a multi-level sense amplifier, the multi-level sense amplifier including a plurality of sense amplifiers, each sense amplifier having a respective sense threshold and a respective sense output, and a storage module coupled to the multi-level sense amplifier for storing the sense outputs of the multi-level sense amplifier. The storage module stores a first set of sense outputs corresponding to a first read of an RAM cell and stores a second set of sense outputs corresponding to a second read of the RAM cell. The architecture also includes a decision module for comparing the first and second set of sense outputs and determining a data state of the RAM cell based on the comparison. | 03-21-2013 |
20130201754 | MRAM WITH CURRENT-BASED SELF-REFERENCED READ OPERATIONS - A magnetoresistive memory stores logic values in high and low resistance states of magnetic tunnel junction elements. Instead of comparing the resistance of elements to a fixed threshold to discern a logic state, the resistances of elements are self-compared before and after imposing a low resistance state. A measure of the resistance of an element in its unknown resistance state is stored, for example by charging a capacitor to a voltage produced when read current bias is applied. Then the element is written into its low resistance state and read current bias is applied again to develop another voltage, representing the low resistance state. A comparison circuit using current summing and an offset providing a minimum difference tolerance determines whether the resistance of the element was changed or remained the same. This determines the logic state of the element. | 08-08-2013 |
20130265820 | ADJUSTING REFERENCE RESISTANCES IN DETERMINING MRAM RESISTANCE STATES - Magneto-resistive memory bit cells in an array have high or low resistance states storing logic values. During read operations, a bias source is coupled to an addressed memory word, coupling a parameter related to cell resistance to a sense amplifier at each bit position. The sense amplifiers determine whether the parameter value is greater or less than a reference value between the high and low resistance states. The reference value is derived by averaging or splitting a difference of resistances of reference cells at high and/or low resistance states. Bias current is conducted over address lines with varying resistance, due to different distances between the sense amplifiers and addressed memory words, which is canceled by inserting into the comparison circuit a resistance from a dummy addressing array, equal to the resistance of the conductor addressing the selected word line and bit position. | 10-10-2013 |
20130271207 | REFERENCE GENERATION IN AN INTEGRATED CIRCUIT DEVICE - A method for generating a reference voltage in an integrated circuit device that is powered by a low voltage power includes generating a coarse first reference voltage using a coarse reference generator, routing the coarse first reference voltage to a boost regulator as an input reference voltage by a hand-off switch circuit, the boost regulator generating an initial-state stepped-up supply based on the first reference voltage, and generating at least two outputs of a second, more accurate, reference voltage from the stepped-up supply voltage using a fine-resolution reference generator. The second reference can be then looped back to the boost regulator, thus, generating a more accurate steady-state stepped-up supply voltage. | 10-17-2013 |
20130272059 | DIFFERENTIAL MRAM STRUCTURE WITH RELATIVELY REVERSED MAGNETIC TUNNEL JUNCTION ELEMENTS ENABLING WRITING USING SAME POLARITY CURRENT - A magnetoresistive memory has first and second magnetic tunnel junction (MTJ) elements operated differentially, each with a pinned magnetic layer and a free magnetic layer that can have field alignments that are parallel or anti-parallel, producing differential high and low resistance states representing a bit cell value. Writing a high resistance state to an element requires an opposite write current polarity through the pinned and free layers, and differential operation requires that the two MTJ elements be written to different resistance states. One aspect is to arrange or connect the layers in normal and reverse order relative to a current bias source, thereby achieving opposite write current polarities relative to the layers using the same current polarity relative to the current bias source. The differentially operated MTJ elements can supplement or replace single MTJ elements in a nonvolatile memory bit cell array. | 10-17-2013 |
20130307080 | SEMICONDUCTOR DEVICE WITH SELF-ALIGNED INTERCONNECTS - A semiconductor device and method for fabricating a semiconductor device is disclosed. An exemplary semiconductor device includes a substrate including a metal oxide device. The metal oxide device includes first and second doped regions disposed within the substrate and interfacing in a channel region. The first and second doped regions are doped with a first type dopant. The first doped region has a different concentration of dopant than the second doped region. The metal oxide device further includes a gate structure traversing the channel region and the interface of the first and second doped regions and separating source and drain regions. The source region is formed within the first doped region and the drain region is formed within the second doped region. The source and drain regions are doped with a second type dopant. The second type dopant is opposite of the first type dopant. | 11-21-2013 |
20130308367 | STRUCTURE AND METHOD FOR FORMING CONDUCTIVE PATH IN RESISTIVE RANDOM-ACCESS MEMORY DEVICE - An array and forming method for resistive-RAM (RRAM) devices provides for the simultaneous selection of multiple bit cells and the simultaneous forming of the RRAM resistive elements within the selected bit cells. The bit cells each include a resistive element and a transistor and are arranged vertically along vertical bit lines. The resistive elements of the bit cells are coupled to source lines that are parallel to word lines and perpendicular to the vertical bit lines. The bit lines are maintained at different biases. A high voltage is applied to one of the source lines coupled to adjacent resistive elements of bit cells disposed along more than one vertical bit line. When the associated transistors are turned on by a sufficiently high gate voltage, the desired RRAM resistive elements along one of the bit lines are formed without stressing other bit cells of the array. | 11-21-2013 |
20140003141 | CONCURRENT OPERATION OF PLURAL FLASH MEMORIES | 01-02-2014 |
20140094009 | SEMICONDUCTOR DEVICE WITH SELF-ALIGNED INTERCONNECTS - A semiconductor device and method for fabricating a semiconductor device is disclosed. An exemplary semiconductor device includes a substrate including a metal oxide device. The metal oxide device includes first and second doped regions disposed within the substrate and interfacing in a channel region. The first and second doped regions are doped with a first type dopant. The first doped region has a different concentration of dopant than the second doped region. The metal oxide device further includes a gate structure traversing the channel region and the interface of the first and second doped regions and separating source and drain regions. The source region is formed within the first doped region and the drain region is formed within the second doped region. The source and drain regions are doped with a second type dopant. The second type dopant is opposite of the first type dopant. | 04-03-2014 |
20140157088 | MRAM Smart Bit Write Algorithm with Error Correction Parity Bits - Some aspects of the present disclosure relate a method. The method attempts to write an expected multi-bit word to a memory location in memory. After writing of the multi-bit word has been attempted, an actual multi-bit word is read from the memory location. The actual multi-bit word is then compared with the expected multi-bit word to identify a number of erroneous bits and a number of correct bits stored in the memory location. The number of erroneous bits is re-written to the memory location without attempting to re-write the correct bits to the memory location. | 06-05-2014 |
20150063048 | Sample-and-Hold Current Sense Amplifier and Related Method - A device includes an amplifier and a first switched current sampler. The first switched current sampler includes a first transistor, a first capacitor, and first, second, and third switches. The first capacitor has a first terminal electrically connected to a gate electrode of the first transistor, and a second terminal electrically connected to a source electrode of the first transistor. The first switch has a first terminal electrically connected to a first current source, and a second terminal electrically connected to the gate electrode of the first transistor. The second switch has a first terminal electrically connected to the first current source, and a second terminal electrically connected to a drain electrode of the first transistor. The third switch has a first terminal electrically connected to the drain electrode of the first transistor, and a second terminal electrically connected to a first input terminal of the amplifier. | 03-05-2015 |