Patent application number | Description | Published |
20080275661 | On-machine methods for identifying and compensating force-ripple and side-forces produced by actuators on a multiple-axis stage - Methods, apparatus, and systems are disclosed for identifying force-ripple and/or side-forces in actuators used for moving a multiple-axis stage. The identified force-ripple and/or side-forces can be mapped, and maps of corresponding position-dependent compensation ratios useful for correcting same are obtained. The methods are especially useful for stages providing motion in at least one degree of freedom using multiple (redundant) actuators. In an exemplary method a stage member is displaced, using at least one selected actuator, multiple times over a set distance in the range of motion of the subject actuator(s). Each displacement has a predetermined trajectory and respective starting point in the range. For each displacement, respective section force-command(s) are extracted and normalized to a reference section force-command to define a section compensation-ratio. Multiple section compensation-ratios are assembled, as functions of displacement in the range, to provide a map of compensation ratios for the actuator(s) throughout the range. | 11-06-2008 |
20080278705 | STAGE ASSEMBLY WITH MEASUREMENT SYSTEM INITIALIZATION, VIBRATION COMPENSATION, LOW TRANSMISSIBILITY, AND LIGHTWEIGHT FINE STAGE - A stage assembly ( | 11-13-2008 |
20080291464 | INTERFEROMETRIC POSITION-MEASURING DEVICES AND METHODS - Process tools and methods are disclosed that involve interferometric and other measurements of movements and positions relative to a process position, such as movements and positions of a stage relative to a lithographic optical system. An exemplary apparatus includes a stage that places a workpiece relative to the tool, and that is movable in at least one direction relative to the tool. At least one first interferometer system is situated relative to the stage to determine stage position in a movement direction relative to the process position. A movement-measuring device determines displacement of the tool from the process position. Using data from the interferometer system and movement-measuring device a processor determines a position of the stage relative to the tool. The processor also corrects the determined position for displacement of the tool. | 11-27-2008 |
20090237793 | ACTIVE-ISOLATION MOUNTS FOR OPTICAL ELEMENTS - Disclosed are, inter alia, optical components that include an optical element (e.g., mirror) and at least three active-isolation mounts mounting the optical element to a frame (e.g., optical barrel or optical frame). An active-isolation mount has a non-contacting actuator connecting a respective location on the optical element to the frame and provides movability of the respective location relative to the frame in at least one direction. At least one displacement sensor is associated with each respective location on the optical element. The displacement sensors are sensitive to displacements of the respective locations in at least one respective direction and reference the displacements to an absolute reference. The actuators and sensors are connected to a servo control loop to provide feedback control. | 09-24-2009 |
20110043781 | Projection optical device and exposure apparatus - A projection optical device includes a projection optical system which projects an image of a pattern, a support member attached to the projection optical system, and a plurality of coupling members connected to the support member. The coupling members suspend and support the projection optical system through the support member from an upper direction of the support member. The projection optical device can include a frame to which one end of each of the coupling members is attached, such that the projection optical system hangs from the frame via the support member and the coupling members. A projection optical device also can include a liquid supply which supplies a temperature-controlled liquid to a side surface of a projection optical system utilizing gravity to cause the temperature-controlled liquid to flow along the side surface of the projection optical system. | 02-24-2011 |
20110242660 | DIRECT DERIVATIVE FEEDFORWARD VIBRATION COMPENSATION SYSTEM - Methods and apparatus for providing vibration compensation using position measurements are disclosed. According to one aspect of the present invention, a method of compensating for vibrations of an object includes obtaining a plurality of position measurements associated with the object. The method also includes processing the plurality of position measurements to determine a derivative acceleration, and determining a compensatory force to counteract the vibrations of the object. Determining the compensatory force includes using the derivative acceleration. Finally, the method includes applying the compensatory force to the object. | 10-06-2011 |
20120113405 | METHOD FOR DETERMINING A COMMUTATION OFFSET AND FOR DETERMINING A COMPENSATION MAP FOR A STAGE - A method for determining a commutation offset for a mover ( | 05-10-2012 |
20120127445 | ISOLATION SYSTEM FOR AN OPTICAL ELEMENT OF AN EXPOSURE APPARATUS - An optical isolation assembly ( | 05-24-2012 |
20120127447 | METHOD FOR DETERMING A COMMUTATION OFFSET AND FOR DETERMINING A COMPENSATION MAP FOR A STAGE - A method for determining a commutation offset for a mover ( | 05-24-2012 |
20130182235 | MEASUREMENT SYSTEM THAT INCLUDES AN ENCODER AND AN INTERFEROMETER - A stage assembly ( | 07-18-2013 |
20140055060 | LINEARIZED CONTROL OF PIEZOELECTRIC ACTUATOR TO REDUCE HYSTERESIS - An exemplary piezoelectric actuator includes a piezoelectric transducer that exhibits displacements when energized with corresponding voltages. A control system is electrically connected to the piezoelectric transducer so as to provide the transducer with the voltages. The control system includes feedback of displacements of the transducer as functions of respective voltage commands and feed-forward of electrical currents passing through the transducer as functions of the respective voltages applied to the transducer. The control system further has a feedback controller connected to receive transducer-displacement data corresponding to the voltages applied to the transducer. The control system further can include a current-feed-forward amplifier connected to receive transducer-current data corresponding to the voltages applied to the transducer. Such a control system facilitates reduction of hysteresis in controlled actuation of the actuator. | 02-27-2014 |
Patent application number | Description | Published |
20080228872 | SYSTEM AND METHOD FOR PROCESSING TRANSACTIONS IN A MULTISYSTEM DATABASE ENVIRONMENT - A system for satisfying a request from a client for a send-then-commit transaction includes a front-end information management system (IMS) server. Shared message queues (SMQ) communicate with the front-end IMS server and plural back-end IMS. The front-end IMS server receives the request from the client and transmits the request to the SMQ. A back-end IMS server accesses the SMQ and generates a transaction output in response to the request. The back-end IMS server transmits the result to the front-end IMS server and the front-end IMS server interfaces with the client to communicate the response thereto. The back-end IMS server and front-end IMS server operate in separate system images, but work together in a resource recovery services (RRS) environment to commit or backout the transaction output. | 09-18-2008 |
20090077101 | SYSTEM FOR HANDLING ASYNCHRONOUS DATABASE TRANSACTIONS IN A WEB BASED ENVIRONMENT - A system and computer readable medium for handling asynchronous database transactions in a web based environment is disclosed. The system and computer readable medium comprise providing a first ID from a device via a dedicated persistent connection and generating a second ID in an application server upon receipt of the first ID. The system and computer readable medium also include utilizing the first ID and second ID to obtain the appropriate data from a database system and to send the appropriate data to the device. A system and computer readable medium in accordance with the present invention uses a database resource adapter, which runs inside an application server, to generate a socket ID internally for every input transaction running with the dedicated persistent socket connection and also saves the customer-specified client ID for database queue creation and legacy application. This operation is transparent to the customers' client application. | 03-19-2009 |
20090172155 | METHOD AND SYSTEM FOR MONITORING, COMMUNICATING, AND HANDLING A DEGRADED ENTERPRISE INFORMATION SYSTEM - A system and method in accordance with the present invention provides a 3-phase commit client-server protocol that allows the EIS server to detect the sick-but-not-dead situations, identify the resources involved, determine its degraded level, take the actions if needed, and send out a degraded status information message to the client. In a system and method in accordance with the present invention an internal availability monitor analyzes the resources that have not been externalized, such as storage pools, control blocks, etc, and are therefore not available to external monitors. | 07-02-2009 |
20140280759 | DATA TRANSMISSION FOR TRANSACTION PROCESSING IN A NETWORKED ENVIRONMENT - Techniques are disclosed to transmit arbitrarily large data units for transaction processing in a networked environment. A request is received to store a data unit of a size exceeding an allocated memory address space of a transaction gateway component of the networked environment. A predefined store function, provided by a repository interface component, is invoked to store the data unit to a data repository component of the networked environment and without segmenting the data unit. A repository handle of the stored data unit is identified. A predefined load function, provided by the repository interface component, is invoked to load a portion of the stored data unit, based on the identified repository handle, where the portion is smaller than the stored data unit. | 09-18-2014 |
Patent application number | Description | Published |
20090004653 | Sulfonated [8,9]benzophenoxazine dyes and the use of their labelled conjugates - Fluorescent, sulfonated 3,7-diamino-[8,9]benzophenoxazine dyes are provided that are especially useful for labelling biopolymers and other substrates. The dye-labelled conjugates can be used in a variety of contexts, including cell surface assays employing intact, live cells and in nucleic acid detection methods. The new dyes are water soluble and can be conjugated to a variety of substrates, such as polynucleotides, nucleosides, nucleotides, peptides, proteins, antibodies, carbohydrates, ligands, particles and surfaces. | 01-01-2009 |
20100273943 | PEPTIDE CONJUGATES AND FLUORESCENCE DETECTION METHODS FOR INTRACELLULAR CASPASE ASSAY - Polypeptides labelled with a donor and acceptor pair of dyes selected from a dibenzorhodamine dye and a diamino-benzophenoxazine dye are peptide conjugates which are useful for intracellular and bead-based assays with fluorescence detection. Peptide conjugates with a caspase-recognition site undergo cleavage into peptide fragments which may be detected, located, and quantitated by the changes in fluorescence. Intracellular cleavage of peptide conjugates is correlated with apoptosis. | 10-28-2010 |
20100311175 | MASS TAGS FOR QUANTITATIVE ANALYSES - This invention pertains to methods, mixtures, kits and/or compositions for the determination of analytes by mass analysis using unique labeling reagents or sets of unique labeling reagents. The labeling reagents can be isomeric or isobaric and can be used to produce mixtures suitable for multiplex analysis of the labeled analytes. | 12-09-2010 |
20110097758 | Peptide Conjugates and Fluorescence Detection Methods for Intracellular Caspase Assay - Polypeptides labelled with a donor and acceptor pair of dyes selected from a dibenzorhodamine dye and a diamino-benzophenoxazine dye are peptide conjugates which are useful for intracellular and bead-based assays with fluorescence detection. Peptide conjugates with a caspase-recognition site undergo cleavage into peptide fragments which may be detected, located, and quantitated by the changes in fluorescence. Intracellular cleavage of peptide conjugates is correlated with apoptosis. | 04-28-2011 |
20140179901 | Peptide Conjugates and Fluorescence Detection Methods for Intracellular Caspase Assay - Polypeptides labelled with a donor and acceptor pair of dyes selected from a dibenzorhodamine dye and a diamino-benzophenoxazine dye are peptide conjugates which are useful for intracellular and bead-based assays with fluorescence detection. Peptide conjugates with a caspase-recognition site undergo cleavage into peptide fragments which may be detected, located, and quantitated by the changes in fluorescence. Intracellular cleavage of peptide conjugates is correlated with apoptosis. | 06-26-2014 |
Patent application number | Description | Published |
20100131411 | Method for Secure Storage and Delivery of Media Content - The memory device contains control structures that allow media content to be stored securely and distributed in a manner envisioned by the content owner, or service providers involved in the distribution. A wide variety of different avenues become available for distributing media content using such memory devices, such as where the devices contain one or more of the following: abridged preview media content, encrypted unabridged media content, prepaid content, rights and/or rules governing access to such content. The memory device has a type of control structures that enable a service provider (who can also be the content owner) to create a secure environment for media content distribution where end users and terminals register with the service provider, and gain access to the content in a manner controlled by the service provider. The various components to be loaded (e.g. abridged preview media content, encrypted unabridged media content, prepaid content, rights and/or rules governing access to such content) may be generated and loaded in a secure and efficient manner. | 05-27-2010 |
20100131775 | Method for Secure Storage and Delivery of Media Content - The memory device contains control structures that allow media content to be stored securely and distributed in a manner envisioned by the content owner, or service providers involved in the distribution. A wide variety of different avenues become available for distributing media content using such memory devices, such as where the devices contain one or more of the following: abridged preview media content, encrypted unabridged media content, prepaid content, rights and/or rules governing access to such content. The memory device has a type of control structures that enable a service provider (who can also be the content owner) to create a secure environment for media content distribution where end users and terminals register with the service provider, and gain access to the content in a manner controlled by the service provider. The various components to be loaded (e.g. abridged preview media content, encrypted unabridged media content, prepaid content, rights and/or rules governing access to such content) may be generated and loaded in a secure and efficient manner. | 05-27-2010 |
20100138673 | Method for Secure Storage and Delivery of Media Content - The memory device contains control structures that allow media content to be stored securely and distributed in a manner envisioned by the content owner, or service providers involved in the distribution. A wide variety of different avenues become available for distributing media content using such memory devices, such as where the devices contain one or more of the following: abridged preview media content, encrypted unabridged media content, prepaid content, rights and/or rules governing access to such content. The memory device has a type of control structures that enable a service provider (who can also be the content owner) to create a secure environment for media content distribution where end users and terminals register with the service provider, and gain access to the content in a manner controlled by the service provider. The various components to be loaded (e.g. abridged preview media content, encrypted unabridged media content, prepaid content, rights and/or rules governing access to such content) may be generated and loaded in a secure and efficient manner. | 06-03-2010 |
20100169222 | Method for Secure Storage and Delivery of Media Content - The memory device contains control structures that allow media content to be stored securely and distributed in a manner envisioned by the content owner, or service providers involved in the distribution. A wide variety of different avenues become available for distributing media content using such memory devices, such as where the devices contain one or more of the following: abridged preview media content, encrypted unabridged media content, prepaid content, rights and/or rules governing access to such content. The memory device has a type of control structures that enable a service provider (who can also be the content owner) to create a secure environment for media content distribution where end users and terminals register with the service provider, and gain access to the content in a manner controlled by the service provider. The various components to be loaded (e.g. abridged preview media content, encrypted unabridged media content, prepaid content, rights and/or rules governing access to such content) may be generated and loaded in a secure and efficient manner. | 07-01-2010 |
20150162762 | METHOD AND APPARATUS FOR CONTROLING CHARGING PROCESS - An apparatus for controlling a charging process is provided. The apparatus comprises a first interface, a second interface, and a switch connected therebetween. The first interface may be electrically connectable to a charger to receive power, and the second interface may be electrically connectable to a device. The switch may receive a signal transmitted from the device and, in response to the signal, turn on/off the power provided from the first interface to the second interface. The apparatus is compatible with existing chargers. | 06-11-2015 |
Patent application number | Description | Published |
20080202425 | TEMPERATURE CONTROLLED LID ASSEMBLY FOR TUNGSTEN NITRIDE DEPOSITION - Embodiments of the invention provide apparatuses for vapor depositing tungsten-containing materials, such as metallic tungsten and tungsten nitride. In one embodiment, a processing chamber is provided which includes a lid assembly containing a lid plate, a showerhead, a mixing cavity, a distribution cavity, and a resistive heating element contained within the lid plate. In one example, the resistive heating element is configured to provide the lid plate at a temperature within a range from about 120° C. to about 180° C., preferably, from about 140° C. to about 160° C., more preferably, from about 145° C. to about 155° C. The mixing cavity may be in fluid communication with a tungsten precursor source containing tungsten hexafluoride and a nitrogen precursor source containing ammonia. In some embodiments, a single processing chamber may be used to deposit metallic tungsten and tungsten nitride materials by CVD processes. | 08-28-2008 |
20080206987 | PROCESS FOR TUNGSTEN NITRIDE DEPOSITION BY A TEMPERATURE CONTROLLED LID ASSEMBLY - Embodiments of the invention provide processes for vapor depositing tungsten-containing materials, such as metallic tungsten and tungsten nitride. In one embodiment, a method for forming a tungsten-containing material is provided which includes positioning a substrate within a processing chamber containing a lid plate, heating the lid plate to a temperature within a range from about 120° C. to about 180° C., exposing the substrate to a reducing gas during a pre-nucleation soak process, and depositing a first tungsten nucleation layer on the substrate during a first atomic layer deposition process within the processing chamber. The method further provides depositing a tungsten nitride layer on the first tungsten nucleation layer during a vapor deposition process, depositing a second tungsten nucleation layer on the tungsten nitride layer during a second atomic layer deposition process within the processing chamber, and exposing the substrate to another reducing gas during a post-nucleation soak process. | 08-28-2008 |
20100112215 | CHEMICAL PRECURSOR AMPOULE FOR VAPOR DEPOSITION PROCESSES - An apparatus for generating a gaseous chemical precursor is provided and contains a canister having a sidewall, a top, and a bottom encompassing an interior volume therein, an inlet port and an outlet port in fluid communication with the interior volume, and an inlet tube extending into the canister and having an inlet end and an outlet end, wherein the inlet end is coupled to the inlet port. The apparatus further contains a gas dispersion plate coupled to the outlet end of the inlet tube, wherein the gas dispersion plate is at an angle within a range from about 3° to about 80°, relative to a horizontal plane which is perpendicular to a vertical axis of the canister. | 05-06-2010 |
20110265721 | PROCESS CHAMBER LID DESIGN WITH BUILT-IN PLASMA SOURCE FOR SHORT LIFETIME SPECIES - An apparatus and a method for depositing materials, and more particularly a vapor deposition chamber configured to deposit a material during a plasma-enhanced process are provided. In one embodiment a chamber comprises a chamber body defining a process volume, a substrate support disposed in the process volume and configured to support one or more substrates, a process lid assembly disposed over the substrate support, wherein the process lid assembly has a plasma cavity configured to generate a plasma and provide one or more radical species to the process volume, a RF (radio frequency) power source coupled to the gas distribution assembly, a plasma forming gas source coupled with the process lid assembly, and a reactant gas source coupled with the process lid assembly. | 11-03-2011 |
20110274836 | REMOVAL OF TRAPPED SILICON WITH A CLEANING GAS - Embodiments of the present invention relate to apparatus and methods of preventing build-up of explosive material in vacuum forelines of deposition systems. A cleaning gas such as nitrogen trifluoride (NF | 11-10-2011 |
20120003388 | METHODS AND APPARATUS FOR THERMAL BASED SUBSTRATE PROCESSING WITH VARIABLE TEMPERATURE CAPABILITY - A substrate support may include a body; an inner ring disposed about the body; an outer ring disposed about the inner ring forming a first opening therebetween; a first seal ring disposed above the first opening; a shadow ring disposed above the inner ring, extending inward from the outer ring and forming a second opening between the shadow and outer rings; a second seal ring disposed above the second opening; a space at least partially defined by the body and the inner, outer, first, second, and shadow rings; a first gap defined between a processing surface of a substrate when present and the shadow ring; and a plurality of second gaps fluidly coupled to the space; wherein the first gap and the plurality of second gaps are configured such that, when a substrate is present, a gas provided to the space flows out of the space through the first gap. | 01-05-2012 |
20120325149 | GAS DISTRIBUTION SYSTEM - In some embodiments, a gas distribution system may include a body disposed within a through hole formed in a process chamber body, the body comprising an opening, wherein an outer surface of the body is disposed a first distance from an inner surface of the through hole to form a first gap; a flange disposed proximate a first end of the body, the flange having an outer dimension greater than an inner dimension of the through hole; a showerhead disposed proximate a second end of the body opposite the first end and extending outwardly from the body to overlap a portion of the process chamber body, the showerhead configured to allow a flow of gas to an inner volume of the process chamber, wherein an outer surface of the showerhead is disposed a second distance from an inner surface of the process chamber body to form a second gap. | 12-27-2012 |
20130055952 | REFLECTIVE DEPOSITION RINGS AND SUBSTRATE PROCESSING CHAMBERS INCORPORTING SAME - Apparatus for improving temperature uniformity across a substrate are provided herein. In some embodiments, a deposition ring for use in a substrate processing system to process a substrate may include an annular body having a first surface, an opposing second surface, and a central opening passing through the first and second surfaces, wherein the second surface is configured to be disposed over a substrate support having a support surface to support a substrate having a given width, and wherein the opening is sized to expose a predominant portion of the support surface; and wherein the first surface includes at least one reflective portion configured to reflect heat energy toward a central axis of the annular body, wherein the at least one reflective portion has a surface area that is about 5 to about 50 percent of a total surface area of the first surface. | 03-07-2013 |
20130247826 | APPARATUS FOR VARIABLE SUBSTRATE TEMPERATURE CONTROL - In some embodiments, an apparatus for variable substrate temperature control may include a heater moveable along a central axis of a substrate support; a seal ring disposed about the heater, the seal ring configured to interface with a shadow ring disposed above the heater to form a seal; a plurality of spacer pins configured to support a substrate and disposed within a plurality of through holes formed in the heater, the plurality of spacer pins moveable parallel to the central axis, wherein the plurality of spacer pins control a first distance between the substrate and the heater and a second distance between the substrate and the shadow ring; and a resilient element disposed beneath the seal ring to bias the seal ring toward a backside surface of the heater. | 09-26-2013 |
20140076234 | MULTI CHAMBER PROCESSING SYSTEM - A multi-chamber processing system includes a transfer chamber, a first processing chamber outfitted to perform CVD, a second processing chamber, and a robot positioned to transfer substrates between the transfer chamber, the first processing chamber, and the second processing chamber. The second processing chamber may include one or a combination of a first electrode and a second electrode comprising a plasma cavity formed therein. | 03-20-2014 |
20140087091 | APPARATUSES AND METHODS FOR ATOMIC LAYER DEPOSITION - Embodiments of the invention provide apparatuses and methods for atomic layer deposition (ALD), such as plasma-enhanced ALD (PE-ALD). In some embodiments, a PE-ALD chamber is provided which includes a chamber lid assembly coupled with a chamber body having a substrate support therein. In one embodiment, the chamber lid assembly has an inlet manifold assembly containing an annular channel encompassing a centralized channel, wherein the centralized channel extends through the inlet manifold assembly, and the inlet manifold assembly further contains injection holes extending from the annular channel, through a sidewall of the centralized channel, and to the centralized channel. The chamber lid assembly further contains a showerhead assembly disposed below the inlet manifold assembly, a water box disposed between the inlet manifold assembly and the showerhead assembly, and a remote plasma system (RPS) disposed above and coupled with the inlet manifold assembly, and in fluid communication with the centralized channel. | 03-27-2014 |
20140174362 | Apparatus And Methods For Symmetrical Gas Distribution With High Purge Efficiency - Provided are apparatus and methods for depositing materials by vapor deposition and plasma enhanced vapor deposition techniques, and more particularly a gas distribution assembly and vapor deposition chamber to deposit a material. The gas distribution assembly comprises a plurality of sections with each section containing a flow channel with passages extending from the flow channel to the processing region of a processing chamber. | 06-26-2014 |
20140251207 | SUBSTRATE SUPPORT WITH MULTI-PIECE SEALING SURFACE - Embodiments of substrate supports and sealing rings for use in a substrate support are provided herein. In some embodiments, a substrate support structure includes an arcuate sealing piece having a first side including a generally planar support surface; a first arcuate portion; a second arcuate portion disposed radially inward of the first arcuate portion; a first end portion comprising a first arcuate extension extending from the first arcuate portion; and a second end portion comprising a second arcuate extension extending from the second arcuate portion. | 09-11-2014 |
20140251214 | HEATED SUBSTRATE SUPPORT WITH FLATNESS CONTROL - Embodiments of heated substrate supports are provided herein, In some embodiments, a heated substrate support includes a support plate having a top surface and an opposite bottom surface; and a first heater disposed within the support plate, wherein the first heater is disposed beneath a mid-plane of the support plate, and wherein the first heater is disposed proximate a central zone of the support plate. | 09-11-2014 |
20140265097 | SUBSTRATE SUPPORT PLATE WITH IMPROVED LIFT PIN SEALING - Embodiments of lift pin assemblies and substrate supports having such lift pin assemblies are provided herein. In some embodiments, a lift pin assembly includes a body with a first end including a flange and an opposing second end; a bore through the body from the first end to the second end; a profile on an outer surface proximate a second end; and a collar, wherein the profile is configured to removably lock the collar onto the second end. | 09-18-2014 |
Patent application number | Description | Published |
20080268645 | METHOD FOR FRONT END OF LINE FABRICATION - In one embodiment, a method for removing native oxides from a substrate surface is provided which includes supporting a substrate containing silicon oxide within a processing chamber, generating a plasma of reactive species from a gas mixture within the processing chamber, cooling the substrate to a first temperature of less than about 65° C. within the processing chamber, and directing the reactive species to the cooled substrate to react with the silicon oxide thereon while forming a film on the substrate. The film usually contains ammonium hexafluorosilicate. The method further provides positioning the substrate in close proximity to a gas distribution plate, and heating the substrate to a second temperature of about 100° C. or greater within the processing chamber to sublimate or remove the film. The gas mixture may contain ammonia, nitrogen trifluoride, and a carrier gas. | 10-30-2008 |
20090095621 | SUPPORT ASSEMBLY - A method and apparatus for removing native oxides from a substrate surface is provided. In one aspect, the apparatus comprises a support assembly. In one embodiment, the support assembly includes a shaft coupled to a disk-shaped body. The shaft has a vacuum conduit, a heat transfer fluid conduit and a gas conduit formed therein. The disk-shaped body includes an upper surface, a lower surface and a cylindrical outer surface. A thermocouple is embedded in the disk-shaped body. A flange extends radially outward from the cylindrical outer surface, wherein the lower surface of the disk-shaped body comprises one side of the flange. A fluid channel is formed in the disk-shaped body proximate the flange and lower surface. The fluid channel is coupled to the heat transfer fluid conduit of the shaft. A plurality of grooves are formed in the upper surface of the disk-shaped body, and are coupled by a hole in the disk-shaped body to the vacuum conduit of the shaft. A gas conduit is formed through the disk-shaped body and couples the gas conduit of the shaft to the cylindrical outer surface of the disk-shaped body. The gas conduit in the disk-shaped body has an orientation substantially perpendicular to a centerline of the disk-shaped body. | 04-16-2009 |
20090111280 | METHOD FOR REMOVING OXIDES - A method for removing native oxides from a substrate surface is provided. In one embodiment, the method comprises positioning a substrate having an oxide layer into a processing chamber, generating a plasma of a reactive species from a gas mixture within the processing chamber, exposing the substrate to the reactive species while forming a volatile film on the substrate and maintaining the substrate at a temperature below 65° C., heating the substrate to a temperature of at least about 75° C. to vaporize the volatile film and remove the oxide layer, and depositing a first layer on the substrate after heating the substrate. | 04-30-2009 |
20100003406 | APPARATUSES AND METHODS FOR ATOMIC LAYER DEPOSITION - Embodiments of the invention provide apparatuses and methods for atomic layer deposition (ALD), such as plasma-enhanced ALD (PE-ALD). In some embodiments, a PE-ALD chamber is provided which includes a chamber lid assembly coupled with a chamber body having a substrate support therein. In one embodiment, the chamber lid assembly has an inlet manifold assembly containing an annular channel encompassing a centralized channel, wherein the centralized channel extends through the inlet manifold assembly, and the inlet manifold assembly further contains injection holes extending from the annular channel, through a sidewall of the centralized channel, and to the centralized channel. The chamber lid assembly further contains a showerhead assembly disposed below the inlet manifold assembly, a water box disposed between the inlet manifold assembly and the showerhead assembly, and a remote plasma system (RPS) disposed above and coupled with the inlet manifold assembly, and in fluid communication with the centralized channel. | 01-07-2010 |
20110223755 | METHOD FOR REMOVING OXIDES - A method for removing native oxides from a substrate surface is provided. In one embodiment, the method comprises positioning a substrate having an oxide layer into a processing chamber, generating a plasma of a reactive species from a gas mixture within the processing chamber, exposing the substrate to the reactive species while forming a volatile film on the substrate and maintaining the substrate at a temperature below 65° C., heating the substrate to a temperature of at least about 75° C. to vaporize the volatile film and remove the oxide layer, and depositing a first layer on the substrate after heating the substrate. | 09-15-2011 |
20120000422 | APPARATUSES AND METHODS FOR ATOMIC LAYER DEPOSITION - Embodiments of the invention provide apparatuses and methods for atomic layer deposition (ALD), such as plasma-enhanced ALD (PE-ALD). In some embodiments, a PE-ALD chamber is provided which includes a chamber lid assembly coupled with a chamber body having a substrate support therein. In one embodiment, the chamber lid assembly has an inlet manifold assembly containing an annular channel encompassing a centralized channel, wherein the centralized channel extends through the inlet manifold assembly, and the inlet manifold assembly further contains injection holes extending from the annular channel, through a sidewall of the centralized channel, and to the centralized channel. The chamber lid assembly further contains a showerhead assembly disposed below the inlet manifold assembly, a water box disposed between the inlet manifold assembly and the showerhead assembly, and a remote plasma system (RPS) disposed above and coupled with the inlet manifold assembly, and in fluid communication with the centralized channel. | 01-05-2012 |
20120244704 | METHOD FOR REMOVING OXIDES - A method for removing native oxides from a substrate surface is provided. In one embodiment, the method comprises positioning a substrate having an oxide layer into a processing chamber, exposing the substrate to a gas mixture while forming a volatile film on the substrate and maintaining the substrate at a temperature below 65° C., heating the substrate to a temperature of at least about 75° C. to sublimate the volatile film and remove the oxide layer, and depositing a first layer on the substrate after heating the substrate. | 09-27-2012 |
20120267346 | SUPPORT ASSEMBLY - A method and apparatus for removing native oxides from a substrate surface is provided. In one aspect, the apparatus comprises a support assembly. In one embodiment, the support assembly includes a shaft coupled to a disk-shaped body. The disk-shaped body includes an upper surface, a lower surface and a cylindrical outer surface. A flange extends radially outward from the cylindrical outer surface. A fluid channel is formed in the disk-shaped body and is coupled to the heat transfer fluid conduit of the shaft. A plurality of grooves formed in the upper surface are coupled by a hole to the vacuum conduit of the shaft. A gas conduit formed through the disk-shaped body couples the gas conduit of the shaft to the cylindrical outer surface of the disk-shaped body. | 10-25-2012 |
20130008984 | APPARATUSES AND METHODS FOR ATOMIC LAYER DEPOSITION - Embodiments of the invention provide apparatuses and methods for atomic layer deposition (ALD), such as plasma-enhanced ALD (PE-ALD). In some embodiments, a PE-ALD chamber is provided which includes a chamber lid assembly coupled with a chamber body having a substrate support therein. In one embodiment, the chamber lid assembly has an inlet manifold assembly containing an annular channel encompassing a centralized channel, wherein the centralized channel extends through the inlet manifold assembly, and the inlet manifold assembly further contains injection holes extending from the annular channel, through a sidewall of the centralized channel, and to the centralized channel. The chamber lid assembly further contains a showerhead assembly disposed below the inlet manifold assembly, a water box disposed between the inlet manifold assembly and the showerhead assembly, and a remote plasma system (RPS) disposed above and coupled with the inlet manifold assembly, and in fluid communication with the centralized channel. | 01-10-2013 |