Patent application number | Description | Published |
20110111581 | DEPOSITION APPARATUS AND MANUFACTURING METHOD OF THIN FILM DEVICE - [Object] To provide a deposition apparatus | 05-12-2011 |
20110151135 | OPTICAL THIN-FILM DEPOSITION DEVICE AND OPTICAL THIN-FILM FABRICATION METHOD - An optical thin-film vapor deposition apparatus and method are capable of producing an optical thin-film by vapor depositing a vapor deposition substance onto substrates ( | 06-23-2011 |
20110151138 | METHOD FOR DEPOSITING FILM - The method for depositing a film of the present invention comprises the first irradiation step of irradiating particles having energy on a surface of a substrate | 06-23-2011 |
20110151247 | METHOD FOR DEPOSITING FILM AND OIL-REPELLENT SUBSTRATE - The method for depositing a film of the present invention comprises the first film deposition step of depositing a first film | 06-23-2011 |
20110168544 | Manufacturing Method of Optical Filter - [Object]To provide a manufacturing method of an optical filter having favorable film quality by removing a foreign substance adhered onto a surface of a substrate by cleaning before a thin film is formed. | 07-14-2011 |
20110262656 | OPTICAL THIN-FILM VAPOR DEPOSITION APPARATUS AND OPTICAL THIN-FILM PRODUCTION METHOD - A method of vapor depositing a vapor deposition substance onto substrates within a vacuum vessel includes holding the substrates with a dome shaped holder disposed within the vacuum vessel, rotating the dome shaped holder, vapor depositing a substance from a vapor deposition source disposed oppositely to the substrates, supplying ions from an ion source to the substrates, and supplying neutralizing electrons from a neutralizer to the substrates. | 10-27-2011 |
20120105872 | OPTICAL FILM THICKNESS METER AND THIN FILM FORMING APPARATUS PROVIDED WITH OPTICAL FILM THICKNESS METER - An optical film thickness meter capable of measurement of an optical film thickness and spectroscopic characteristics with high accuracy and a thin film forming apparatus provided with the optical film thickness meter are provided. The optical film thickness meter includes a light projector ( | 05-03-2012 |
20130074767 | THIN FILM FORMING APPARATUS - Provided is a thin film forming apparatus for reducing operation time and cost by forming a film only on a specific portion on substrates. A substrate holding mechanism provided in the apparatus includes: substrate holding members holding substrates in a manner that a part of a non-film forming portion of a substrate overlaps the other substrate and a film forming portion is exposed, a support member supporting the substrate holding members, and a rotation member which rotates the support member. The substrate holding members include: holding surfaces holding the substrates and disposed between a film forming source and the substrates, step portions formed between the holding surfaces in a manner that ends of the substrates respectively contact with the step portions, and opening portions formed on the holding surfaces of the portion corresponding to the film forming portion when the ends of the substrates contact with the step portions. | 03-28-2013 |
20140016139 | OPTICAL FILM THICKNESS MEASURING DEVICE AND THIN FILM FORMING APPARATUS USING THE OPTICAL FILM THICKNESS MEASURING DEVICE - An optical film thickness measuring device, enabling direct measurement of a film thickness of a product in real time accurately without a monitor substrate, includes: a projector, a light receiver, inner beam splitters disposed in a base substrate holder to reflect a measurement beam to a base substrate, an inner optical reflector that totally reflects a measurement beam from the closest inner beam splitter, external beam splitters the measurement beam from the inner beam splitters toward the light receiver, and an outer optical reflector that reflects the measurement beam from the optical reflector toward the light receiver. The measurement beam reflected by the inner beam splitters and the inner optical reflector is passed through the base substrate and then reflected by the external beam splitters and the outer optical reflector to be guided to the light receiver, so that the measurement beam is received by the light receiver. | 01-16-2014 |
20140199493 | FILM FORMATION METHOD AND FILM FORMATION APPARATUS - Provided is a film formation apparatus with which an anti-fouling film having high usability and antiwear performance may be formed efficiently. According to a film formation apparatus ( | 07-17-2014 |