Patent application number | Description | Published |
20090261242 | APPARATUS FOR AND METHOD OF WITHDRAWING IONS IN EUV LIGHT PRODUCTION APPARATUS - An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions. | 10-22-2009 |
20100090133 | EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS AND METHOD OF GENERATING EXTREME ULTRAVIOLET LIGHT - An extreme ultraviolet light source apparatus, which is to generate an extreme ultraviolet light by irradiating a target with a main pulse laser light after irradiating the target with a prepulse laser light, the extreme ultraviolet light source apparatus comprises: a prepulse laser light source generating a pre-plasma by irradiating the target with the prepulse laser light while a part of the target remains, the pre-plasma being generated at a different region from a target region, the different region being located on an incident side of the prepulse laser light; and a main pulse laser light source generating the extreme ultraviolet light by irradiating the pre-plasma with the main pulse laser light. | 04-15-2010 |
20100213395 | EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - In an extreme ultraviolet light source apparatus generating an extreme ultraviolet light from a plasma generated by irradiating a target, which is a droplet D of molten Sn, with a laser light, and controlling the flow direction of ion generated at the generation of the extreme ultraviolet light by a magnetic field or an electric field, an ion collection cylinder | 08-26-2010 |
20110101863 | EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE AND METHOD FOR PRODUCING EXTREME ULTRAVIOLET LIGHT - An EUV (Extreme Ultra Violet) light source device ionizes a target material in an ionizer, and supplies the ionized target material to a point of generating a plasma. This reduces the generation of debris. The ionizer simultaneously irradiates laser beams of plural wavelengths corresponding to the excited level of tin on a target material to ionize the target material. The ionized target material is extracted from the ionizer with a high voltage applied from an ion beam extractor, and accelerated and supplied to a plasma generation chamber. When driver laser beam is irradiated on the ionized target material, a plasma is generated, thereby emitting EUV radiation. | 05-05-2011 |
20110284775 | CHAMBER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - A chamber apparatus used with a laser apparatus may include: a chamber provided with at least one inlet through which a laser beam outputted from the laser apparatus enters the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a magnetic field generation unit for generating a magnetic field in the predetermined region; and a charged particle collection unit disposed in a direction of a magnetic flux of the magnetic field for collecting a charged particle thereinto, the charged particle being generated when the target material is irradiated with the laser beam inside the chamber and traveling along the magnetic flux. | 11-24-2011 |
20120097869 | EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - In an extreme ultraviolet light source apparatus generating an extreme ultraviolet light from a plasma generated by irradiating a target, which is a droplet D of molten Sn, with a laser light, and controlling the flow direction of ion generated at the generation of the extreme ultraviolet light by a magnetic field or an electric field, an ion collection cylinder | 04-26-2012 |
20120161040 | EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS AND METHOD OF GENERATING EXTREME ULTRAVIOLET LIGHT - An extreme ultraviolet light source apparatus, which is to generate an extreme ultraviolet light by irradiating a target with a main pulse laser light after irradiating the target with a prepulse laser light, the extreme ultraviolet light source apparatus comprises: a prepulse laser light source generating a pre-plasma by irradiating the target with the prepulse laser light while a part of the target remains, the pre-plasma being generated at a different region from a target region, the different region being located on an incident side of the prepulse laser light; and a main pulse laser light source generating the extreme ultraviolet light by irradiating the pre-plasma with the main pulse laser light. | 06-28-2012 |
20120217414 | APPARATUS FOR AND METHOD OF WITHDRAWING IONS IN EUV LIGHT PRODUCTION APPARATUS - An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions. | 08-30-2012 |
20120261596 | EXTREME ULTRA VIOLET LIGHT SOURCE DEVICE - An extreme ultra violet light source device of a laser produced plasma type, in which charged particles such as ions emitted from plasma can be efficiently ejected. The extreme ultra violet light source device includes: a target nozzle that supplies a target material; a laser oscillator that applies a laser beam to the target material supplied from the target nozzle to generate plasma; collector optics that collects extreme ultra violet light radiated from the plasma; and a magnetic field forming unit that forms an asymmetric magnetic field in a position where the laser beam is applied to the target material. | 10-18-2012 |
20130075625 | TARGET SUPPLY UNIT AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - A target supply unit includes a nozzle through which a target material is outputted, and a first electrically conductive member having a first opening formed therein and positioned to face the nozzle in a direction into which the target material is outputted through the nozzle. The first electrically conductive member is positioned so that the first opening is located below the nozzle in a gravitational direction. The target supply unit includes a voltage generator which applies a voltage between the target material and the first electrically conductive member. | 03-28-2013 |
20130256568 | EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS AND METHOD OF GENERATING ULTRAVIOLET LIGHT - An extreme ultraviolet light source apparatus, which is to generate an extreme ultraviolet light by irradiating a target with a main pulse laser light after irradiating the target with a prepulse laser light, the extreme ultraviolet light source apparatus comprises: a prepulse laser light source generating a pre-plasma by irradiating the target with the prepulse laser light while a part of the target remains, the pre-plasma being generated at a different region from a target region, the different region being located on an incident side of the prepulse laser light; and a main pulse laser light source generating the extreme ultraviolet light by irradiating the pre-plasma with the main pulse laser light. | 10-03-2013 |
20130284949 | EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT - An EUV (Extreme Ultra Violet) light source device ionizes a target material in an ionizer, and supplies the ionized target material to a point of generating a plasma. This reduces the generation of debris. The ionizer simultaneously irradiates laser beams of plural wavelengths corresponding to the excited level of tin on a target material to ionize the target material. The ionized target material is extracted from the ionizer with a high voltage applied from an ion beam extractor, and accelerated and supplied to a plasma generation chamber. When driver laser beam is irradiated on the ionized target material, a plasma is generated, thereby emitting EUV radiation. | 10-31-2013 |
20140021376 | EXTREME ULTRA VIOLET LIGHT SOURCE DEVICE - An extreme ultra violet light source device of a laser produced plasma type, in which charged particles such as ions emitted from plasma can be efficiently ejected. The extreme ultra violet light source device includes: a target nozzle that supplies a target material; a laser oscillator that applies a laser beam to the target material supplied from the target nozzle to generate plasma; collector optics that collects extreme ultra violet light radiated from the plasma; and a magnetic field forming unit that forms an asymmetric magnetic field in a position where the laser beam is applied to the target material. | 01-23-2014 |
Patent application number | Description | Published |
20080197298 | Extreme ultra violet light source apparatus - In an extreme ultra violet light source apparatus having a comparatively large output power for exposing, a solid target is supplied fast and continuously while heat dissipation for irradiation of a driver laser light is performed successfully. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a target material supplying unit which coats a wire with target material, a wire supplying unit which supplies the wire coated with the target material to a predetermined position within the chamber, a driver laser which applies a laser beam onto the wire coated with the target material to generate plasma; and a collector mirror which collects the extreme ultra violet light radiated from the plasma and outputting the extreme ultra violet light. | 08-21-2008 |
20090261277 | Extreme ultra violet light source apparatus - In an extreme ultra violet light source apparatus of a laser produced plasma type, charged particles such as ions emitted from plasma are promptly ejected to the outside of a chamber. The extreme ultra violet light source apparatus includes a chamber in which extreme ultra violet light is generated, a target supply unit for supplying a target material to a predetermined position within the chamber, a driver laser for applying a laser beam to the target material supplied by the target supply unit to generate plasma, a collector mirror for collecting the extreme ultra violet light radiated from the plasma to output the extreme ultra violet light, a magnetic field forming unit for forming an asymmetric magnetic field in a generation position of the plasma by using a coil, and a charged particle collection mechanism provided on at least one of two surfaces of the chamber to which lines of magnetic force generated by the coil extend. | 10-22-2009 |
20100078579 | EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An EUV light source apparatus in which contamination or damage of optical elements and other component elements by debris can be suppressed to realize longer lives of them. The EUV light source apparatus is an apparatus for radiating extreme ultraviolet light by generating plasma of a target material within a chamber, and includes: a first laser unit for applying a first laser beam to the target material to generate pre-plasma; a second laser unit for applying a second laser beam to the pre-plasma to generate a main plasma for radiating the extreme ultraviolet light; and a magnetic field generating unit for generating a magnetic field within the chamber to control a state of at least one of the pre-plasma and the main plasma. | 04-01-2010 |
20100176312 | EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS - In a laser produced plasma type extreme ultra violet light source apparatus, charged particles such as ions emitted from plasma can be efficiently ejected by the action of a magnetic field and secondary production of contaminants can be suppressed. The extreme ultra violet light source apparatus includes: a target nozzle for supplying a target material; a laser oscillator for applying a laser beam to the target material supplied by the target nozzle to generate plasma; an EUV collector mirror for collecting extreme ultra violet light radiated from the plasma; and an electromagnet for forming a magnetic field in a position where the laser beam is applied to the target material, wherein an aperture of the electromagnet is formed according to a shape of lines of magnetic flux of the magnetic field. | 07-15-2010 |
20100192973 | EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS AND CLEANING METHOD - An extreme ultraviolet light source apparatus that can eliminate debris adhering to a component such as optical elements provided within a chamber. The extreme ultraviolet light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target material supply unit for supplying a target material into the chamber; a driver laser unit for irradiating the target material with a driver pulse laser beam to generate plasma; a cleaning laser unit for emitting a cleaning pulse laser beam; and a control unit for controlling an irradiation position of the cleaning pulse laser beam emitted from the cleaning laser unit so as to irradiate a component provided within the chamber with the cleaning pulse laser beam to remove debris adhering to a surface of the component. | 08-05-2010 |
20110163247 | EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS - In an extreme ultra violet light source apparatus of a laser produced plasma type, charged particles such as ions emitted from plasma are promptly ejected to the outside of a chamber. The extreme ultra violet light source apparatus includes a chamber in which extreme ultra violet light is generated, a target supply unit for supplying a target material to a predetermined position within the chamber, a driver laser for applying a laser beam to the target material supplied by the target supply unit to generate plasma, a collector mirror for collecting the extreme ultra violet light radiated from the plasma to output the extreme ultra violet light, a magnetic field forming unit for forming an asymmetric magnetic field in a generation position of the plasma by using a coil, and a charged particle collection mechanism provided on at least one of two surfaces of the chamber to which lines of magnetic force generated by the coil extend. | 07-07-2011 |
Patent application number | Description | Published |
20140029238 | ILLUMINATION APPARATUS - Provided is an illumination device that can be made thin and increases the efficiency of extracting light to the outside. The present invention is provided with: light-emitting structures wherein a blue light-emitting element is embedded in a transparent resin having a convex surface shape; a substrate wherein the light-emitting structures are disposed two-dimensionally; a diffuser plate that diffuses the blue light of the blue light-emitting elements; and a fluorescent sheet that is disposed spaced from the substrate and that contains a particulate fluorescent body that obtains a white light from the blue light of the blue light-emitting elements. | 01-30-2014 |
20140070021 | CONTROL METHOD FOR TARGET SUPPLY DEVICE, AND TARGET SUPPLY DEVICE - A control method for a target supply device may employ a target supply device, provided in an EUV light generation apparatus including an image sensor, that includes a target generator having a nozzle and configured to hold a target material and a pressure control unit configured to control a pressure within the target generator, and the method may include outputting the target material in the target generator from a nozzle hole in the nozzle by pressurizing the interior of the target generator using the pressure control unit, determining whether or not a difference between an output direction of the target material outputted from the nozzle hole that is detected by the image sensor and a set direction is within a predetermined range, and holding the pressure in the target generator using the pressure control unit until the difference falls within the predetermined range. | 03-13-2014 |
20140097461 | PHOSPHOR SHEET-FORMING RESIN COMPOSITION - A phosphor sheet-forming resin composition uses a low-cost resin material having high light fastness and low visible light absorption and is capable of providing a phosphor sheet at low cost with deterioration of a phosphor due to moisture being suppressed. The phosphor sheet-forming resin composition contains a film-forming resin composition and a powdery phosphor that emits fluorescence when irradiated with excitation light. The film-forming resin composition contains a hydrogenated styrene-based copolymer, and uses a sulfide-based phosphor as the phosphor. Examples of the hydrogenated styrene-based copolymer include hydrogenated products of styrene-ethylene-butylene-styrene block copolymers. CaS:Eu is used as a preferred sulfide-based phosphor. | 04-10-2014 |
20140124813 | PHOSPHOR SHEET-FORMING RESIN COMPOSITION - A phosphor sheet-forming resin composition uses a low-cost resin material having high light fastness and low visible light absorption and is capable of providing a phosphor sheet at low cost with deterioration of a phosphor due to moisture being suppressed. The resin composition contains a film-forming resin composition and a powdery phosphor that emits fluorescence when irradiated with excitation light. The film-forming resin composition used contains a polyolefin copolymer component and a maleic anhydride component. A sulfurized phosphor, an oxide-based phosphor, or a phosphor mixture thereof is preferably used as the phosphor. | 05-08-2014 |
20150083939 | EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - An extreme ultraviolet light generation device may be configured to generate extreme ultraviolet light by irradiating a target with a laser beam to turn the target into plasma. The extreme ultraviolet light generation device may comprise: a chamber provided with at least one through-hole; an optical system configured to introduce the laser beam into a predetermined region in the chamber through the at least one through-hole; and a target supply device configured to supply a powder target as the target to the predetermined region. | 03-26-2015 |