Yorozuya
Shinichi Yorozuya, Kanagawa JP
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20090171095 | PRODUCTION METHOD OF HETEROCYCLIC MERCAPTO COMPOUND - A method of the invention industrially produces heterocyclic mercapto compounds useful as raw materials or intermediates in the synthesis of medicaments or pesticides, or as permanent wave agent, with a high yield and high productivity using easily available starting materials. A heterocyclic mercapto compound represented by Formula (1) (wherein X represents any structure of —O—, —S—, —NH—, and —NR | 07-02-2009 |
20090208439 | Agent for Permanent Hair Waving Containing Heterocyclic Mercapto Compound - Disclosed is an agent for permanent hair waving that can realize permanent hair waving even in the neutral to weakly acidic pH range in which irritation particularly to the skin is not significant. The agent for permanent hair waving includes at least one heterocyclic mercapto compound represented by formula (1): | 08-20-2009 |
Shinichi Yorozuya, Aizuwakamatsu-Shi JP
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20110137066 | PROCESS OF INHIBITING POLYMERIZATION OF ISOCYANATE GROUP-CONTAINING, ETHYLENICALLY UNSATURATED CARBOXYLATE COMPOUNDS, AND PROCESS FOR PRODUCING THE COMPOUNDS - It is an object of the invention to provide a process of inhibiting polymerization of isocyanate group-containing, ethylenically unsaturated carboxylate compounds, and a process for producing isocyanate group-containing, ethylenically unsaturated carboxylate compounds which involves the polymerization inhibition process. The process of inhibiting polymerization of isocyanate group-containing, ethylenically unsaturated carboxylate compounds of the invention includes controlling the oxygen gas (O | 06-09-2011 |
20130317248 | STABILIZED ISOCYANATE GROUP-CONTAINING ETHYLENICALLY UNSATURATED COMPOUND - An object of the present invention is to improve the stability of an ethylenically unsaturated compound having an isocyanate group in the molecule by preventing a polymerization of the ethylenically unsaturated compound. The present invention relates to a stabilizing composition for an isocyanate group-containing ethylenically unsaturated compound, comprising: an isocyanate group-containing ethylenically unsaturated compound (A) which comprises one or more isocyanate groups and one or more ethylenically unsaturated groups in the molecule; and a stabilizing agent (B) which is a compound in which at least one of the ethylenically unsaturated groups in the compound (A) is replaced with an alkyl group which may have a substituent. | 11-28-2013 |
20130317252 | STABILIZED ISOCYANATE GROUP-CONTAINING ETHYLENICALLY UNSATURATED COMPOUND - An object of the present invention is to improve the stability of an ethylenically unsaturated compound having an isocyanate group in the molecule by preventing a polymerization, a multimerization reaction and a discoloration reaction of the ethylenically unsaturated compound. The present invention relates to a stabilizing composition for an isocyanate group-containing ethylenically unsaturated compound, comprising: an isocyanate group-containing ethylenically unsaturated compound (A) which comprises one or more isocyanate groups and one or more ethylenically unsaturated groups in the molecule; and a stabilizing agent (B) which is a compound in which at least one of the ethylenically unsaturated groups in the compound (A) is replaced with an alkyl halide group or an amino alkyl group which may have a substituent. | 11-28-2013 |
Shunichi Yorozuya, Utsunomiya-Shi JP
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20110168094 | PLASMA FILM FORMING APPARATUS - The present invention relates to a plasma film forming apparatus. In the plasma film forming apparatus, a flow control jig is disposed between a plasma nozzle and a film formation region of a substrate. The flow control jig has a plasma supply path, a raw material supply path, a film formation joined path formed by combining the plasma supply path and the raw material supply path, an exhaust path for discharging a plasma discharge gas and an unreacted raw material transported from the film formation region, and a recovery path for returning the unreacted raw material in the exhaust path to the plasma supply path. | 07-14-2011 |
20110300309 | PLASMA FILM DEPOSITION METHOD - A plasma nozzle supplies a plasmatized electric discharge gas, and a first supply section in a flow regulator which is interposed between the plasma nozzle and a base member supplies a first liquid-phase raw material. A second supply section which is separate from the first supply section supplies a second liquid-phase raw material. The first liquid-phase raw material which is activated by a plasmatized electric discharge gas and deposited on the base member while in a liquid phase is caused to interact with the second liquid-phase raw material which is activated by the plasmatized electric discharge gas, and solidified into a film on the base member. | 12-08-2011 |