| Patent application number | Description | Published |
|---|
| 20090000942 | PULSE PLASMA MATCHING SYSTEMS AND METHODS INCLUDING IMPEDANCE MATCHING COMPENSATION - A pulse plasma matching system includes an RF matching box configured to receive an RF power pulse generated by an RF power source, configured to perform a plasma impedance matching, and configured to apply the RF power pulse to a process chamber, and a network analyzer configured to measure an impedance of plasma generated in a process chamber. A controller is configured to generate a capacitance control signal corresponding to a plasma impedance value measured by the network analyzer, configured to supply the capacitance control signal to the RF matching box, and configured to generate an impedance matching compensation pulse, and a phase shifter is configured to receive the impedance matching compensation pulse and to shift a phase of the impedance matching compensation pulse to synchronize the impedance matching compensation pulse to the RF power pulse. | 01-01-2009 |
| 20090105853 | PROCESS-PARAMETER PROGNOSTIC SYSTEM FOR PREDICTING SHAPE OF SEMICONDUCTOR STRUCTURE, SEMICONDUCTOR FABRICATION APPARATUS HAVING THE SYSTEM, AND METHOD OF USING THE APPARATUS - Provided are a process-parameter prognostic system for predicting the shape of a semiconductor structure, a semiconductor fabrication apparatus having the process-parameter prognostic system, and a method of using the same. The process-parameter prognostic system may have a process prediction unit and a process-change point corresponding unit. The process prediction unit and the process-change point corresponding unit may obtain predicted parameters using measured parameters of semiconductor structures and sensor parameters of plasmas corresponding to the semiconductor structures. | 04-23-2009 |
| 20090140132 | APPARATUS AND METHOD FOR PROCESSING SUBSTRATE USING NEUTRALIZED BEAMS INCLUDING APPLYING A VOLTAGE TO A SUBSTRATE SUPPORT - An apparatus and method for processing a substrate using neutralized beams are provided. A substrate processing apparatus includes an ion source generating device configured to form an ion source. An ion extraction device is configured to extract and accelerate ions from the ion source. An ion neutralizing device is configured to convert the ions extracted and accelerated from the ion extraction device into neutralized beams. A remaining portion of the ions extracted and accelerated from the ion extraction device is not converted into the neutralized beams. A substrate support is configured to support a substrate such that the neutralized beams are directed towards the substrate support. A substrate power supply is configured to apply a voltage to the substrate support such that the remaining portion of the ions that is not converted into the neutralized beams is directed away from the substrate support by the applied voltage of the substrate. | 06-04-2009 |
| 20100124774 | METHOD OF PRODUCING BIOFUEL USING SEA ALGAE - The present invention relates to a method of producing biofuel, more specifically a method of producing biofuel comprising the steps of generating monosugars from marine algae, or from polysaccharides extracted from marine algae by treating the marine algae or the polysaccharides with a hydrolytic enzyme and/or a hydrolytic catalyst; and fermenting the monosugars using a microorganism to produce biofuel. The method of producing biofuel of the present invention solve the problem of raw material suppliance since it uses marine algae as a raw material for biomass, and reduce the production costs by excluding lignin eliminating process that has been required by the conventional method using wood-based raw materials, resulting in economic and environmental advantages. | 05-20-2010 |
| 20110320027 | METHOD OF USING PROCESS-PARAMETER PROGNOSTIC SYSTEM FOR PREDICTING SHAPE OF SEMICONDUCTOR STRUCTURE - Provided are a process-parameter prognostic system for predicting the shape of a semiconductor structure, a semiconductor fabrication apparatus having the process-parameter prognostic system, and a method of using the same. The process-parameter prognostic system may have a process prediction unit and a process-change point corresponding unit. The process prediction unit and the process-change point corresponding unit may obtain predicted parameters using measured parameters of semiconductor structures and sensor parameters of plasmas corresponding to the semiconductor structures. | 12-29-2011 |
| 20120055464 | PORTABLE COMPOSITE ROASTER - The present invention relates to a portable composite roaster that is small in size, enables a user to selectively use gas, charcoal or the like as a heating means, and is simple and convenient to use for anyone. The roaster has primary, secondary and tertiary heat-isolating screens arranged outside the heating means to effectively isolate heat and to protect a table on which the portable composite roaster is placed or users from heat generated by the heating means such that the users may use the roaster in accordance with the needs thereof. The portable composite roaster of the present invention enables users preferring charcoal-cooked food to roast food using charcoal, and enables users inconvenienced by charcoal to easily use gas instead of charcoal and enjoy delicious food. | 03-08-2012 |
| 20120068058 | Apparatus and Method for Processing Substrate Using Neutralized Beams Including Applying a Voltage to a Substrate Support - An apparatus and method for processing a substrate using neutralized beams are provided. A substrate processing apparatus includes an ion source generating device configured to form an ion source. An ion extraction device is configured to extract and accelerate ions from the ion source. An ion neutralizing device is configured to convert the ions extracted and accelerated from the ion extraction device into neutralized beams. A remaining portion of the ions extracted and accelerated from the ion extraction device is not converted into the neutralized beams. A substrate support is configured to support a substrate such that the neutralized beams are directed towards the substrate support. A substrate power supply is configured to apply a voltage to the substrate support such that the remaining portion of the ions that is not converted into the neutralized beams is directed away from the substrate support by the applied voltage of the substrate. | 03-22-2012 |
| 20120087845 | STEAM STERILIZATION SYSTEM FOR A WATER PURIFIER - The present invention relates to a sterilization system for a water purifier, i.e., a system which can sterilize, using hot water and steam, the interiors of a filter, a water tank, a cooling tank, a hot water tank, lines connected to each unit, and a water nozzle of the water purifier, which are vulnerable to bacteria. The system of the present invention effectively sterilizes the water purifier to enable users to use a highly clean water purifier. | 04-12-2012 |
