Yokoya
Hirokaza Yokoya, Tokyo JP
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20130146594 | THREE-PIECE RESEALABLE CAN FOR ACIDIC LIQUID - A three-piece resealable can for acidic liquid includes, a cylindrical can body member that includes a screw portion at one end; and a can bottom member that contacts the can body member so as to close an opening portion of the other end of the can body member. The can body member includes a cylindrical first steel sheet, Ni plating that is formed on an inner circumferential surface of the first steel sheet, a polyester film that is formed so as to be disposed on the outermost surface of the inner circumference of the can body member, and a chromate film that is formed between the first steel sheet and the polyester film. The can bottom member includes a second steel sheet, and Sn plating that is formed on the can body member side of the can bottom member. | 06-13-2013 |
Hirokazu Yokoya, Tokyo JP
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20110300402 | Steel sheet for container use and method of production of same - Steel sheet for container use able to realize superior corrosion resistance and canmaking ability, wherein at least one side of the steel sheet is provided with a chemical conversion coating film including a mixture of a zirconium oxide compound and a zirconium phosphate compound, the zirconium oxide compound is segregated at part or all of a region of 40 to 100% from the surface with respect to the total thickness of the chemical conversion coating film, and the zirconium phosphate compound is segregated at part or all of a region of 0 to 40% from the surface with respect to the total thickness of the chemical conversion coating film. | 12-08-2011 |
20120064369 | STEEL SHEET FOR CONTAINER USE WITH EXCELLENT ORGANIC FILM PERFORMANCE AND METHOD OF PRODUCTION OF SAME - Steel sheet for container use with excellent canmaking workability and with excellent drawability and ironability, weldability, corrosion resistance, coating adhesion, film adhesion, and wettability characterized in that a surface of the steel sheet has a Zr film which contains, by amount of metal Zr, 1 to 100 mg/m | 03-15-2012 |
20120121749 | LASER PROCESSING APPARATUS AND CONTAINER MANUFACTURING APPARATUS - A laser processing apparatus includes: a reflection mirror ( | 05-17-2012 |
20120183753 | Steel sheet for container having excellent organic film performance and process for producing the same - A surface-treated steel sheet for a container, comprising: a steel sheet, and a Zr compound film disposed on the steel sheet, wherein the Zr compound film being formed by a dipping or electrolytic treatment in a solution containing Zr ion, F ion, ammonium ion and nitrate ion; and the coating weight of the Zr compound film is 1 to 100 mg/m | 07-19-2012 |
20130034745 | STEEL SHEET FOR CONTAINER AND METHOD OF MANUFACTURING THE SAME - The present invention provides a steel sheet for a container including: a plated layer containing an adhesion amount of 300 to 1000 mg/m | 02-07-2013 |
20130089751 | STEEL SHEET FOR CONTAINER AND METHOD OF MANUFACTURING THE SAME - The present invention provides a steel sheet for a container including a cold-rolled steel sheet and a composite film formed on the cold-rolled steel sheet through an electrolysis process in a solution containing: at least one metal ion of an Sn ion, an Fe ion, and an Ni ion; Zr ion; a nitric acid ion: and an ammonium ion, in which the composite film contains at least one element of: Zr of 0.1 to 100 mg/m | 04-11-2013 |
20130248054 | STEEL SHEET FOR BOTTOM COVERS OF AEROSOL CANS AND METHOD FOR PRODUCING SAME - A steel sheet for bottom covers of aerosol cans includes, as chemical composition, C: 0.025 to 0.065mass %, Mn: 0.10 to 0.28mass %, P: 0.005 to 0.03mass %, Al: 0.01 to 0.04mass %, N: 0.0075 to 0.013mass %, Si: limited to 0.05mass % or less, S: limited to 0.009mass % or less, and balance consisting of Fe and unavoidable impurities, wherein yield point YP in rolling direction after aging treatment is in range of 460 to 540 MPa, total elongation in the rolling direction after the aging treatment is 15% or more, yield point elongation EL | 09-26-2013 |
20140183086 | THREE-PIECE RESEALABLE CAN - A three-piece resealable can for acidic liquid includes, a cylindrical can body member that includes a screw portion at one end; and a can bottom member that contacts the can body member so as to close an opening portion of the other end of the can body member. The can body member includes a cylindrical first steel sheet, Ni plating that is formed on an inner circumferential surface of the first steel sheet, a polyester film that is formed so as to be disposed on the outermost surface of the inner circumference of the can body member, and a Zr-containing film that is formed between the first steel sheet and the polyester film. The can bottom member includes a second steel sheet, and Sn plating that is formed on the can body member side of the can bottom member. The Zr-containing film contains Zr compounds. | 07-03-2014 |
20150086720 | STEEL SHEET FOR CONTAINER HAVING EXCELLENT ORGANIC FILM PERFORMANCE AND PROCESS FOR PRODUCING THE SAME - A surface-treated steel sheet for a container, comprising: a steel sheet, and a Zr compound film disposed on the steel sheet, wherein the Zr compound film being formed by a dipping or electrolytic treatment in a solution containing Zr ion, F ion, ammonium ion and nitrate ion; and the coating weight of the Zr compound film is 1 to 100 mg/m | 03-26-2015 |
Hirokazu Yokoya, Onga-Gun JP
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20160102414 | Ni-PLATED STEEL SHEET, AND METHOD FOR PRODUCING Ni-PLATED STEEL SHEET - A Ni-plated steel sheet according to the present invention includes a steel sheet, a first Ni-plated layer which is formed at least on a one-sided surface of the steel sheet and contains Ni, and a second Ni-plated layer which is formed on the first Ni-plated layer and contains Ni. An average central-line roughness Ra at an interface between the first Ni-plated layer and the second Ni-plated layer is less than 0.1 μm, an average central-line roughness Ra of a surface of the second Ni-plated layer is 0.1 μm to 100 μm, and a coating amount of Ni in the entirety of the first Ni-plated layer and the second Ni-plated layer is 20 mg/m | 04-14-2016 |
Hirokazu Yokoya, Kitakyushu-Shi JP
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20130039722 | METAL STRIPS WITH METALLIC-APPEARANCE EXCELLENT IN FORMING STABILITY AND SEAMLESSLY-FORMED CAN BODY AND MANUFACTURING METHOD THEREOF - A metal band having metallic appearance and being excellent in forming stability is provided. The metal band includes a coating film containing not less than 20 mass % in the coated and dried state, of filler of aluminum or aluminum alloys on the side thereof corresponding to the outside of a can. The metal band also has a resin-rich portion containing not more than approximately 5 mass % of the filler, approximately 0.1 to 20 μm in thickness in the coated surface far from the metal strip surface, seamlessly-formed can bodies made of such strips. Methods for manufacturing such strips and can bodies are also provided. | 02-14-2013 |
Jiro Yokoya, Kawasaki-Shi JP
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20100190108 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A positive resist composition including: | 07-29-2010 |
20110008728 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A resist composition including: a base component which exhibits changed solubility in an alkali developing solution under the action of acid; and an acid-generator component containing an acid generator (B1) consisting of a compound represented by general formula (b1); dissolved in an organic solvent containing an alcohol-based organic solvent having a boiling point of at least 150° C., wherein R | 01-13-2011 |
20110061678 | Cleaning liquid for lithography and a cleaning method using it for photoexposure devices - Problem: To provide a cleaning liquid for lithography and a cleaning method using it for photoexposure devices. In a process of liquid immersion lithography, the cleaning liquid may efficiently clean the photoexposure device site (especially optical lens member) contaminated with the component released from photoresist and remove the contaminant, and in addition, the waste treatment for the cleaning liquid is easy, the efficiency in substitution with the cleaning liquid for the medium for liquid immersion lithography is high, and the cleaning liquid does not detract from the throughput in semiconductor production. | 03-17-2011 |
20110262872 | METHOD OF FORMING RESIST PATTERN AND RESIST COMPOSITION - There are provided a method of forming a resist pattern in which a resist pattern is formed on top of a substrate by using a chemically amplified resist composition and conducting patterning two or more times, the method being capable of reducing the extent of damage, caused by the second patterning, imposed upon the first resist pattern that is formed by the first patterning; as well as a resist composition that is useful for forming the first resist pattern in this method of forming a resist pattern. The method includes forming of a first resist pattern using a resist composition containing a thermal base generator as a chemically amplified resist composition during first patterning, and then conducting a hard bake for baking the first resist pattern under a bake condition such that a base is generated from the thermal base generator, prior to the second patterning. | 10-27-2011 |
20120183899 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A resist composition containing a base component (A) which exhibits changed solubility in a developing solution under the action of acid, and an acid generator component (B) which generates acid upon exposure, dissolved in an organic solvent (S) which contains an alcohol-based solvent, wherein the base component (A) contains a copolymer (A1) that exhibits increased polarity under the action of acid, and the copolymer (A1) is a copolymer in which a structural unit (a2), which is derived from an acrylate ester in which the hydrogen atom bonded to the carbon atom on the α-position may be substituted with a substituent, and includes a lactone-containing cyclic group, is dispersed uniformly within the copolymer molecule. | 07-19-2012 |
20130017500 | METHOD OF FORMING RESIST PATTERNAANM Yokoya; JiroAACI Kawasaki-shiAACO JPAAGP Yokoya; Jiro Kawasaki-shi JPAANM Nakamura; TsuyoshiAACI Kawasaki-shiAACO JPAAGP Nakamura; Tsuyoshi Kawasaki-shi JPAANM Shimizu; HiroakiAACI Kawasaki-shiAACO JPAAGP Shimizu; Hiroaki Kawasaki-shi JPAANM Takeshita; MasaruAACI Kawasaki-shiAACO JPAAGP Takeshita; Masaru Kawasaki-shi JPAANM Nito; HidetoAACI Kawasaki-shiAACO JPAAGP Nito; Hideto Kawasaki-shi JPAANM Saito; HirokuniAACI Kawasaki-shiAACO JPAAGP Saito; Hirokuni Kawasaki-shi JP - A method of forming a resist pattern, including forming a resist film on a substrate using a resist composition comprising a base component that exhibits increased solubility in an alkali developing solution and a photo-base generator component; exposing the resist film; baking the exposed resist film, such that, at an exposed portion thereof, the base generated from the photo-base generator component upon the exposure and an acid provided to the resist film are neutralized, and at an unexposed portion of the resist film, the solubility of the base component in an alkali developing solution is increased by the acid provided to the resist film; and subjecting the resist film to alkali development, thereby forming a negative-tone resist pattern in which the unexposed portion of the resist film has been dissolved and removed. | 01-17-2013 |
20130078572 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A resist composition used in a method of forming a resist pattern including applying a resist composition comprising a base component that exhibits increased solubility in an alkali developing solution and a photo-base generator component to a substrate to form a resist film; subjecting the resist film to exposure; baking after subjecting the resist film to exposure, wherein at an exposed portion of the resist film, the base generated from the photo-base generator component upon exposure and an acid provided to the resist film in advance are neutralized, and at an unexposed portion of the resist film, the solubility of the base component in an alkali developing solution is increased by the action of acid provided to the resist film in advance; and subjecting the resist film to alkali development, thereby forming a negative-tone resist pattern. | 03-28-2013 |
20130084523 | RESIST COMPOSITIOIN AND METHOD OF FORMING RESIST PATTERN - A method of forming a resist pattern, including: a step (1) in which a resist film is formed by coating a resist composition including a base component (A) that exhibits increased solubility in an alkali developing solution, a photo-base generator component (C) that generates a base upon exposure, an acid supply component (Z) and a compound (F) containing at least one selected from the group consisting of a fluorine atom and a silicon atom and containing no acid decomposable group which exhibits increased polarity by the action of acid on a substrate; a step (2) in which the resist film is subjected to exposure; a step (3) in which baking is conducted after the step (2); and a step (4) in which the resist film is subjected to an alkali development, thereby forming a negative-tone resist pattern, and a resist composition used in the step (1). | 04-04-2013 |
20130115555 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - There are provided a method of forming a resist pattern includes: a step ( | 05-09-2013 |
20130137047 | METHOD OF FORMING RESIST PATTERN - A method of forming a resist pattern including: step (1) in which a resist composition including a base component and a photobase generator component is applied to a substrate to form a resist film; step (2) in which the resist film is subjected to immersion exposure; step (3) in which baking is conducted after step (2), such that, at an exposed portion of the resist film, the base generated from the photobase generator component and an acid provided to the resist film in advance are neutralized, and at an unexposed portion of the resist film, the solubility of the base component in an alkali developing solution is increased by the action of the acid; and step (4) in which the resist film is subjected to an alkali development, thereby forming a negative-tone resist pattern, wherein a receding angle of water on the resist film is 65° or more. | 05-30-2013 |
20130177853 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A method of forming a resist pattern, including: step (1) in which a resist composition containing a base component (A) that exhibits increased solubility in an alkali developing solution and a compound represented by general formula (C1) is applied to a substrate to form a resist film, step (2) in which the resist film is subjected to exposure, step (3) in which baking is conducted after step (2), and step (4) in which the resist film is subjected to an alkali development, thereby forming a negative-tone resist pattern; and the resist composition used in step (1): | 07-11-2013 |
20130177854 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND NOVEL COMPOUND - A resist composition including a base component (A) which exhibits changed solubility in a developing solution, and an acidic compound component (J) which is decomposed by exposure to exhibit decreased acidity, wherein the acidic compound component (J) contains a compound represented by formula (J1) [in the formula, R | 07-11-2013 |
20130189618 | METHOD OF FORMING RESIST PATTERN - A method of forming a resist pattern, including: step (1) in which a resist composition including a base component, a photobase generator component and an acid supply component is applied to a substrate to form a resist film; step (2) in which the resist film is subjected to exposure without being subjected to prebaking; step (3) in which baking is conducted after step (2), such that, at an exposed portion of the resist film, the base generated from the photobase generator component upon the exposure and an acid derived from the acid supply component are neutralized, and at an unexposed portion of the resist film, the solubility of the base component in an alkali developing solution is increased by the action of the acid derived from the acid supply component; and step (4) in which the resist film is subjected to an alkali development, thereby forming a negative-tone resist pattern. | 07-25-2013 |
20130260314 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND POLYMERIC COMPOUND - There is provided a resist composition including a polymeric compound (A1) containing a structural unit derived from a compound represented by general formula (a0-m), and a method of forming a resist pattern using the resist composition. In the formula, R | 10-03-2013 |
20130344436 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A resist composition which generates a base upon exposure and exhibits increased solubility in an alkali developing solution under the action of acid, and the resist composition including: a base component (A) that exhibits increased solubility in an alkali developing solution under the action of acid; an acidic compound component (G1) including a nitrogen-containing cation having a pKa value of 7 or less and a counteranion; and a buffer component (K) including a nitrogen-containing cation and a counteranion being a conjugate base for the acid having a pKa value of 0 to 5. | 12-26-2013 |
20140363770 | NEGATIVE TONE RESIST COMPOSITION FOR SOLVENT DEVELOPING AND METHOD OF FORMING RESIST PATTERN - A negative tone resist composition for solvent developing including: a base component (A) which exhibits decreased solubility in an organic solvent under the action of acid; a photodecomposable quencher (D0) which generates acid having a pKa of 2.0 or more; and a fluorine additive (F) containing a fluorine-containing polymeric compound (f) which has a structural unit (f0-1) represented by general formula (f0-1) shown below or a structural unit (f0-2) represented by general formula (f0-2) shown below. In the formulae, R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; and R | 12-11-2014 |
20150111155 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND POLYMERIC COMPOUND - A resist composition including a polymeric compound containing a structural unit derived from a compound represented by general formula (a0-m), and a method of forming a resist pattern using the resist composition. R | 04-23-2015 |
20150147702 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A method of forming a resist pattern, including forming a resist film by coating a resist composition including a base component (A) that exhibits increased solubility in an alkali developing solution, a photo-base generator component (C) that generates a base upon exposure, an acid supply component (Z) and a compound (F) containing at least one selected from the group consisting of a fluorine atom and a silicon atom and containing no acid decomposable group which exhibits increased polarity by the action of acid on a substrate; subjecting the resist film to exposure baking the exposed resist film; and subjecting the resist film to alkali development, thereby forming a negative-tone resist pattern. | 05-28-2015 |
Jiro Yokoya, Kanagawa JP
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20110056511 | Cleaning liquid and a cleaning method - Problem: To provide a cleaning liquid and a cleaning method having excellent leaning capability. In a process of liquid immersion lithography, they can preventing the damage to be caused by the component released from the photoresist to photoexposure devices; the waste treatment is easy; the efficiency in substitution with the cleaning liquid for the medium for liquid immersion lithography is high, and the production cost is reduced not detracting from the throughput in semiconductor production. | 03-10-2011 |
Juji Yokoya, Chiba JP
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20150192774 | SUPPORT DEVICE AND SYSTEM FOR ARTICLE PICKING WORK - The invention relates to a device that supports work of picking an article from a warehouse and the like, which allows the picking work to be carried out accurately and quickly. The device includes: a camera ( | 07-09-2015 |
Juji Yokoya, Koto-Ku JP
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20130213768 | ACCUMULATION CONVEYOR - With a simple structure, an accumulation conveyor can reduce the distance between articles to be conveyed, so as to improve its efficiency and conveyance efficiency. The accumulation conveyor in accordance with the present invention comprises a motor, provided for each zone, for driving a carrier roller constituting the zone to rotate; a sensor, provided for each zone, for detecting passing of an article to be conveyed; and control means for estimating according to detection information of two articles adjacent to each other detected by the sensor distance information concerning the distance between the articles and switching, when the estimated distance information falls within a predetermined range, a control input to a motor of a zone conveying the article at the back on the upstream side or a motor of a zone adjacent downstream thereto such that the zone has conveying speed faster than that of the zone. | 08-22-2013 |
Kenji Yokoya, Osaka JP
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20140296950 | THERMOREGULATION DEVICE, THERMOREGULATION SYSTEM, AND PACKAGE - A thermoregulation device which is adapted to be used for covering part of a living body, includes: a first sheet which is higher in thermal conductivity than cotton cloth; a second sheet which is higher in heat insulating and retaining properties than cotton cloth; and a gas passage which is formed between the first sheet and the second sheet. A first opening which communicates with the gas passage is formed in one of the first sheet and the second sheet. A second opening which communicates with the gas passage is formed in one of the first sheet and the second sheet. A gas which is introduced through the first opening is discharged from the second opening via the gas passage. | 10-02-2014 |
Mayu Yokoya, Osaka JP
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20160005404 | DEVICE CONTROL METHOD AND ELECTRIC DEVICE - A method for controlling an operation of a target device using a plurality of input devices is disclosed. The method comprises: receiving from one of the plurality of the input devices a first operation instruction issued to the target device, with a first data format; recognizing the first operation instruction and the first data format; determining that the one of the plurality of the input devices is a first input device corresponding to the first data format; and providing to a user of the target device a recommendation for a second input device, a type of the second input device being different from a type of the first input device, when it is determined that a type of the first operation instruction is identical to a type of a second operation instruction received from the second input device earlier than the reception of the first operation instruction. | 01-07-2016 |
Naokazu Yokoya, Tokyo JP
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20090169133 | IMAGE PROCESSING DEVICE, IMAGE PROCESSING SYSTEM, IMAGE PROCESSING METHOD AND IMAGE PROCESSING PROGRAM - [PROBLEMS] In a system for converting a low resolution image to a high resolution image, it is difficult to carry out processing to generate a high resolution image for each frame in real time using temporally continuous frame images. | 07-02-2009 |
Ryunosuke Yokoya, Tokyo JP
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20150062413 | LIGHT EMISSION CONTROL UNIT, LIGHT EMISSION CONTROL METHOD, AND IMAGE PICKUP UNIT - A light emission control unit includes: a light emission control section configured to control a light emission timing of a flash used in an image pickup unit, in which the image pickup unit has a function of variably controlling, during exposure, an aperture diaphragm between a first diaphragm position and a second diaphragm position at which the aperture diaphragm is closed more than at the first diaphragm position, and the light emission control section allows the flash to emit light at a first timing at which the aperture diaphragm is closed to the second diaphragm position in an exposure section. | 03-05-2015 |
Satoshi Yokoya, Nice FR
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20110283071 | Dynamically Configurable Memory System - In a digital system with a processor coupled to a paged memory system, the memory system may be dynamically configured using a memory compaction manager in order to allow portions of the memory to be placed in a low power mode. As applications are executed by the processor, program instructions are copied from a non-volatile memory coupled to the processor into pages of the paged memory system under control of an operating system. Pages in the paged memory system that are not being used by the processor are periodically identified. The paged memory system is compacted by copying pages that are being used by the processor from a second region of the paged memory into a first region of the paged memory. The second region may be placed in a low power mode when it contains no pages that are being used by the processor. | 11-17-2011 |
20120185663 | Memory Interface Converter - A digital system is provided with a memory interface converter to couple a memory device that understands a type of command protocol to a memory controller that generates a different type of command protocol. The memory interface converter includes a first memory interface configured to couple to a host controller memory interface having a first signal protocol and a second memory interface configured to couple to one or more memory devices having a different second signal protocol. A decoder is configured to decode commands received on a command input port and to convert the received commands into commands for a command output port. A state machine is configured to emulate memory states according to the first signal protocol, and another state machine is configured to emulate memory controller states according to the second signal protocol. | 07-19-2012 |
20130016477 | Electronic Assembly Including Die on Substrate With Heat Spreader Having an Open Window on the DieAANM Yokoya; SatoshiAACI NiceAACO FRAAGP Yokoya; Satoshi Nice FRAANM Simmons-Matthews; Margaret RoseAACI RichardsonAAST TXAACO USAAGP Simmons-Matthews; Margaret Rose Richardson TX US - An electronic assembly includes a workpiece, a through substrate via (TSV) die including a substrate and a plurality of TSVs, a topside and a bottomside having TSV connectors thereon. The TSV die is attached to the workpiece with its topside on the workpiece. A heat spreader having an inner open window is on the bottomside of the TSV die. Bonding features are coupled to the TSV connectors or include the TSV connectors themselves. The bonding features protrude from the inner open window to a height above a height of the top of the heat spreader that allows a top die to be bonded thereto. | 01-17-2013 |
Shigehiro Yokoya, Yokohama-Shi JP
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20090236171 | INTAKE AIR SOUND GENERATION DEVICE - An intake air sound generation device | 09-24-2009 |
Takahiro Yokoya, Tokyo JP
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20140140710 | IMAGE FORMING APPARATUS AND IMAGE FORMING METHOD - An image forming apparatus receives setting of an object to be adjusted, on an adjustment object selection screen when selecting an adjustment mode. After the object to be adjusted is set, camera(s) photograph(s) the object to be adjusted so that the image forming apparatus obtains photographed data of current object to be adjusted. Next, the apparatus searches photographed data of the object to be adjusted in the ideal state thereof from the database. Name of the object to be adjusted and related information in the photographed data agree with those of the photographed data of current object to be adjusted. The higher ranked related information is preferentially searched and it is determined whether or not pieces of the higher ranked related information thus preferentially searched agree with each other. | 05-22-2014 |
20150286175 | FIXING DEVICE AND IMAGE FORMING APPARATUS - A fixing device includes a roller, a plurality of heaters, a temperature detection unit, and a control unit, wherein when the temperature detection unit detects that the temperature of longitudinal end portions of the roller is lower than a preset reference temperature, the control unit performs full-lighting control on the heater with the largest amount of heat supply to the end portions of the roller, out of the plurality of heaters, and performs lighting control on the heater with the second largest amount of heat supply to the end portions of the roller in a pattern at a predetermined duty ratio, or performs lighting control on the heater with the largest amount of heat supply to the end portions of the roller in a pattern at a predetermined duty ratio, and turns off the heater with the second largest amount of heat supply to the end portions of the roller. | 10-08-2015 |
Takahiro Yokoya, Hichioji-Shi JP
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20130235622 | POWER SUPPLY DEVICE - A power supply device comprises: a rectifier circuit converting AC input voltage to DC; a smoothing capacitor connected to an output terminal of the rectifier circuit; a switching element turning on and off output from the smoothing capacitor to provide to a load; a switching controller controlling the switching of the switching element; a first signal input part generating a first signal for stopping the switching and keeping it stopped and inputting the first signal to the switching controller via a particular terminal thereof, when a trouble occurs on the power supply device; a detector detecting that the AC input voltage is a predetermined value or less; and a second signal input part generating a second signal for stopping the switching and keeping it stopped and inputting the second signal to the switching controller via the particular terminal, when the AC input voltage is the predetermined value or less. | 09-12-2013 |
Takahiro Yokoya, Hachioji-Shi JP
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20130183057 | IMAGE FORMING APPARATUS AND POWER CONTROL DEVICE - An image forming apparatus that forms a color image by overlaying toner images formed on respective first, second, and third photoreceptors, comprising: first, second, and third voltage-applied members respectively facing the first, second, and third photoreceptors; a first AC power supply generating first AC voltage, and superimposing the first AC voltage on first DC voltage to generate first voltage for causing a first electric field between the first voltage-applied member and the first photoreceptor; a second AC power supply generating second AC voltage, and superimposing the second AC voltage on second DC voltage to generate second voltage for causing a second electric field between the second voltage-applied member and the second photoreceptor; and a composite circuit superimposing a composite of the first voltage and the second voltage on third DC voltage, to generate third voltage for causing a third electric field between the third voltage-applied member and the third photoreceptor. | 07-18-2013 |
Takahiro Yokoya, Toyokawa-Shi JP
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20110187043 | SHEET TRANSPORTATION DEVICE INCLUDING ELECTROMAGNETIC COMPONENT AND CONTROL METHOD THEREOF - A sheet transportation device includes a transportation path for transportation of a sheet, a transportation unit for applying force to a sheet on the transportation path, and an electromagnetic component for driving the transportation unit by receiving supply of electric power. At the sheet transportation device, the absence/presence of a sheet is detected at a downstream side of the region where the transportation unit applies force to a sheet in the transportation path, and counter electromotive force induced in response to electric power being supplied to the electromagnetic component is supplied as the electric power for the detector. | 08-04-2011 |
20120250357 | POWER SUPPLYING DEVICE AND IMAGE FORMING APPARATUS HAVING THE SAME - A power supplying device provides power to the body of an image forming apparatus and an optional device connected to the body of the same. The power supplying device comprises: a rectifier circuit which rectifies an alternating current inputted from an alternating-current source; a booster circuit which boosts and smooths the direct-current voltage caused by the rectifier circuit; a judgment portion which judges whether or not there is an optional device connected to the body of the image forming apparatus; an identification portion which identifies the type of the optional device connected thereto; and a controller which, if there is an optional device connected thereto according to the judgment portion, adjusts the boosted voltage obtained by the booster circuit to a higher value than that if there is no optional device connected thereto, which depends on the type of the optional device identified by the identification portion. | 10-04-2012 |
Yasunori Yokoya, Shinjuku-Ku JP
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20120258388 | SURFACE TREATMENT METHOD FOR A MASK BLANK, METHOD OF MANUFACTURING A MASK BLANK, AND METHOD OF MANUFACTURING A MASK - Provided is a mask blank surface treatment method for surface-treating, using a treatment liquid, a surface of a thin film, to be formed into a transfer pattern, of a mask blank having the thin film on a substrate. The thin film is made of a material that can be etched by ion-based dry etching. The concentration of an etching inhibitor contained in the treatment liquid is 0.3 ppb or less. | 10-11-2012 |