Patent application number | Description | Published |
20120060168 | VIRTUALIZATION SYSTEM AND RESOURCE ALLOCATION METHOD THEREOF - A virtualization system for supporting at least two operating systems and resource allocation method of the virtualization system are provided. The method includes allocating resources to the operating systems, calculating, when one of the operating systems is running, workloads for each operating system, and adjusting resources allocated to the operating systems according to the calculated workloads. The present invention determines the workloads of a plurality of operating systems running in the virtualization system and allocates time resources dynamically according to the variation of the workloads. | 03-08-2012 |
20120075316 | METHOD AND APPARATUS FOR COMPILING AND EXECUTING AN APPLICATION USING VIRTUALIZATION IN A HETEROGENEOUS SYSTEM - A method and apparatus for compiling and executing an application including Central Processing Unit (CPU) source code and Graphic Processing Unit (GPU) source code. The apparatus includes a hardware device including a CPU and a GPU; a compiler that compiles the GPU source code into a GPU virtual instruction; and a hybrid virtualization block that executes an execution file by translating the GPU virtual instruction into GPU machine code. | 03-29-2012 |
20120079498 | METHOD AND APPARATUS FOR DYNAMIC RESOURCE ALLOCATION OF PROCESSING UNITS - A method and apparatus for dynamic resource allocation in a system having at least one processing unit are disclosed. The method of dynamic resource allocation includes receiving information on a task to which resources are allocated and partitioning the task into one or more task parallel units; converting the task into a task block having a polygonal shape according to expected execution times of the task parallel units and dependency between the task parallel units; allocating resources to the task block by placing the task block on a resource allocation plane having a horizontal axis of time and a vertical axis of processing units; and executing the task according to the resource allocation information. Hence, CPU resources and GPU resources in the system can be used in parallel at the same time, increasing overall system efficiency. | 03-29-2012 |
20140136745 | METHOD AND APPARATUS FOR ALLOCATING INTERRUPTS IN A MULTI-CORE SYSTEM - An apparatus and a method for allocating interrupts in a multi-core system are provided. According to an embodiment, an interrupt control register unit records the interrupt processing capacity of each core of a multi-core system by receiving an interrupt, and checking the interrupt control register unit when receiving the interrupt and allocating the interrupt to a core which has been checked to be in an interrupt processing enabled state in the checking step. When the core is allocating the interrupt, the core transmits, to the interrupt control register unit, a signal representing the interrupt control register corresponding to the core which is changed to an interrupt processing disabled state, and can process the interrupt. | 05-15-2014 |
20140189708 | TERMINAL AND METHOD FOR EXECUTING APPLICATION IN SAME - The present invention relates to a terminal and a method for executing an application in the same, including the steps of: confirming the weight of the application when a code of the application to be executed is inputted; calculating an allocation index using the confirmed weight; selecting a processing device for executing the application between a central processing unit and a graphics processing unit through the calculated application index; and executing the application through the selected processing device. Accordingly, the present invention determines whether the execution of the application is assigned to the central processing unit or the graphics processing unit according to the weight designated by the user. Thus, the present invention can prevent the tipping effect of the workload only to one processing unit which is caused by an increase in the degree of freedom for the workload distribution. | 07-03-2014 |
Patent application number | Description | Published |
20100149502 | Method of detecting reticle errors - A method of detecting reticle error may include using an optical source of an exposure unit to cause light to be incident on a reticle installed in the exposure unit, and detecting the reticle error using only 0 | 06-17-2010 |
20100190340 | Methods of forming fine patterns using a nanoimprint lithography - In a method of forming fine patterns, a photocurable coating layer is formed on a substrate. A first surface of a template makes contact with the photocurable coating layer. The first surface of the template includes at least two first patterns having a first dispersion degree of sizes, and at least one portion of the first surface of the template includes a photo attenuation member. A light is irradiated onto the photocurable coating layer through the template to form a cured coating layer including second patterns having a second dispersion degree of sizes. The second patterns are generated from the first patterns and the second dispersion degree is less than the first dispersion degree. The template is separate from the cured coating layer. A size dispersion degree of the patterns used in a nanoimprint lithography process may be adjusted by the light attenuation member, so that the fine patterns may be formed to have an improved size dispersion degree. | 07-29-2010 |
20100230864 | Nanoimprint Lithography Template and Method of Fabricating Semiconductor Device Using the Same - Nanoimprint lithography templates and methods of fabricating semiconductor devices using the nanoimprint lithography templates are provided. The nanoimprint lithography template includes a transparent substrate having a first refractive index, a stamp pattern on a surface on the transparent substrate and having inclined sidewalls, and a coating layer formed on the inclined sidewalls of the stamp pattern, the coating layer having a second refractive index higher than the first refractive index. | 09-16-2010 |
20110007329 | Methods of inspecting structures - A method of inspecting a structure. The method includes preparing preliminary spectrums of reference diffraction intensities according to critical dimensions of reference structures, obtaining a linear spectrum from the preliminary spectrums in a set critical dimension range, radiating light to respective measurement structures formed on a substrate, measuring measurement diffraction intensities of the light diffracted by the measurement structures, and obtaining respective critical dimensions of the measurement structures from the measurement diffraction intensities using the linear spectrum. | 01-13-2011 |
20110116705 | METHOD OF MEASURING FOCAL VARIATIONS OF A PHOTOLITHOGRAPHY APPARATUS AND A METHOD OF FABRICATING A SEMICONDUCTOR DEVICE USING THE FOCAL VARIATIONS MEASURING METHOD - Provided are a method of measuring focal variations of a photolithography apparatus and a method of fabricating a semiconductor device using the method. The method of measuring the focal variations of the photolithography apparatus includes loading a photomask and a wafer into the photolithography apparatus. The photomask has an optical pattern, and the wafer has a photoresist layer on a top surface thereof. An image of the optical pattern is transferred to the photoresist layer using ultraviolet (UV) light. The photoresist layer is baked. The photoresist layer is inspected. Inspection results of the photoresist layer are analyzed. The inspection of the photoresist layer includes irradiating light for measurement to the entire surface of the wafer. Light reflected and diffracted by the wafer is collected to form an optical image. The analysis of the inspection results of the photoresist layer includes analyzing optical information on the optical image. | 05-19-2011 |
20110119644 | METHODS OF ARRANGING MASK PATTERNS AND ASSOCIATED APPARATUS - Methods and apparatus are disclosed that arrange mask patterns in response to the contribution of a second pattern to image intensity. In some methods of arranging mask patterns, a distribution of functions h(ξ−x) is obtained which represents the contribution of a second pattern to image intensity on a first pattern. Neighboring regions of the first pattern are discretized into finite regions, and the distribution of the functions h(ξ−x) is replaced with representative values | 05-19-2011 |
20110128518 | REFLECTIVE RETICLE CHUCK, REFLECTIVE ILLUMINATION SYSTEM INCLUDING THE SAME, METHOD OF CONTROLLING FLATNESS OF REFLECTIVE RETICLE USING THE CHUCK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE CHUCK - Provided are a reflective reticle chuck, a reflective illumination system including the chuck, a method of controlling the flatness of a reflective reticle using the chuck, and a method of manufacturing a semiconductor device using the chuck. The reflective reticle chuck includes a fixed portion and a mobile portion that together provide a securing surface for the reflective reticle. The mobile portion may alter a height of the securing surface relative to the fixed portion. | 06-02-2011 |
20110183239 | Photolithography Mask, Blank Photomask, Reflective Photomask, and Methods of Manufacturing the Same - Photolithography masks include an optically transparent substrate having a plurality of fiducial position aligning marks on sidewalls thereof. A reflective layer is also provided on an upper surface of the optically transparent substrate. The reflective layer includes a composite of a lower reflective layer of a first material and an upper reflective layer of a second material different from the first material, on the lower reflective layer. The lower reflective layer may include molybdenum and the upper reflective layer may include silicon. An anti-reflective layer is provided on the reflective layer. | 07-28-2011 |
20110193263 | NANO IMPRINT APPARATUS AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME - A nano imprint apparatus comprising: a nano imprint template; and a deformation correction unit arranged on the nano imprint template to correct deformation of the nano imprint template. | 08-11-2011 |
20110294074 | EXPOSURE APPARATUS AND EXPOSING METHOD USING THE APPARATUS - An exposure apparatus and an exposing method using the apparatus. The exposure apparatus includes a photomask having a plurality of optical sources attached to a substrate. | 12-01-2011 |
20110317163 | Method of Aligning a Wafer and Method of Monitoring a Lithography Process Including the Same - A method of aligning a wafer includes irradiating light onto a plurality of alignment marks of a wafer, detecting signals outputted from the alignment marks to obtain alignment position offsets, selecting a set of the alignment marks corresponding to the alignment position offsets having a same or similar distribution, and aligning the wafer based the selected alignment marks. | 12-29-2011 |
20110320025 | METHOD OF MEASURING AN OVERLAY OF AN OBJECT - A method of measuring an overlay of an object is provided. In the method, first information of a first structure may be obtained. A preliminary structure may be formed on the first structure. Second information of the preliminary structure may be obtained. The first information and the second information may be processed to obtain virtual information of a second structure that would be formed on the first structure if a process is performed on the preliminary structure. A virtual overlay between the first structure and the second structure may be measured using the virtual information. | 12-29-2011 |
20120188543 | METHOD AND APPARATUS FOR MEASURING OVERLAY - A method of measuring an overlay includes generating an original signal using first and second overlay measurement keys that are spaced apart from each other, generating a first spectrum signal by performing Fourier transform of the original signal, generating a second spectrum signal by filtering the first spectrum signal, and generating a corrected signal by performing inverse Fourier transform of the second spectrum signal. | 07-26-2012 |
20120244476 | PHOTOLITHOGRAPHY METHOD INCLUDING TECHNIQUE OF DETERMINING DISTRIBUTION OF ENERGY OF EXPOSURE LIGHT PASSING THROUGH SLIT OF EXPOSURE APPARATUS - The energy distribution of exposure light directed passing through the slit of an exposure apparatus is determined. A photoresist layer on a substrate is exposed over a plurality of shots while changing the intensity of the exposure light for each shot. Then the photoresist layer is developed to form a sample photoresist layer. An image of the developed sample photoresist layer is analyzed for color intensity. Values of the color intensity across a selected one of the shots are correlated with values of the intensity of the exposure light to produce an energy distribution of the exposure light along the length of the slit. The energy distribution is used to change the slit so that a more desirable energy distribution may be realized when the slit is used in a process of manufacturing a semiconductor device. | 09-27-2012 |
20120257185 | APPARATUS FOR MANUFACTURING A MASK - A method of manufacturing a mask includes dividing an upper surface of a template having a design pattern into a plurality of regions, the template being arranged over a polymer layer on a mask substrate, correcting a distorted region among the regions, pressing the polymer layer with the template to form a mask pattern corresponding to the design pattern on the polymer layer; and curing the mask pattern. | 10-11-2012 |
20130101928 | PHOTOLITHOGRAPHY METHOD INCLUDING TECHNIQUE OF DETERMINING DISTRIBUTION OF ENERGY OF EXPOSURE LIGHT PASSING THROUGH SLIT OF EXPOSURE APPARATUS - The energy distribution of exposure light directed passing through the slit of an exposure apparatus is determined. A photoresist layer on a substrate is exposed over a plurality of shots while changing the intensity of the exposure light for each shot. Then the photoresist layer is developed to form a sample photoresist layer. An image of the developed sample photoresist layer is analyzed for color intensity. Values of the color intensity across a selected one of the shots are correlated with values of the intensity of the exposure light to produce an energy distribution of the exposure light along the length of the slit. The energy distribution is used to change the slit so that a more desirable energy distribution may be realized when the slit is used in a process of manufacturing a semiconductor device. | 04-25-2013 |
20130267095 | METHOD OF FABRICATING AND CORRECTING NANOIMPRINT LITHOGRAPHY TEMPLATES - A method of fabricating a nanoimprint lithography template includes installing a reticle on a reticle stage of scanning lithography equipment having a light source, the reticle stage and a template stage, mounting a template substrate on the template stage, and scanning the template substrate with light from the light source in an exposure process in which the light passes through the reticle and impinges the template substrate at an oblique angle of incidence. | 10-10-2013 |
20140078480 | APPARATUS FOR CREATING AN EXTREME ULTRAVIOLET LIGHT, AN EXPOSING APPARATUS INCLUDING THE SAME, AND ELECTRONIC DEVICES MANUFACTURED USING THE EXPOSING APPARATUS - An apparatus for creating an EUV light may include a droplet-supplying unit, a laser-irradiating unit, a light-concentrating unit and a guiding unit. The droplet-supplying unit may supply a droplet from which the EUV light may be created. The laser-irradiating unit may irradiate a laser to the droplet supplied from the droplet-supplying unit to create the EUV light. The light-concentrating unit may concentrate the EUV light created by the laser-irradiating unit. The guiding unit may guide the droplet to a position at which the laser may be irradiated. The guiding unit may have at least one gas-spraying hole for spraying a gas to a space between the droplet-supplying unit and the laser irradiation position to form a gas curtain configured to surround the droplet. | 03-20-2014 |
20140111782 | LITHOGRAPHY APPARATUS, METHOD FOR LITHOGRAPHY AND STAGE SYSTEM - Provided are a lithography apparatus, a method for lithography and a stage system. The lithography apparatus includes a reticle stage having a reticle, at least one nozzle on at least one surface of the reticle stage and configured to allow shielding gas to flow to a surface of the reticle to form an air curtain, and a gas supply unit configured to supply the nozzle with the shielding gas. | 04-24-2014 |
20140213054 | EXPOSING METHOD AND METHOD OF FORMING A PATTERN USING THE SAME - An exposing method includes irradiating a first light having a first energy to a first exposed region of a photoresist film through a first shot region of a mask, and irradiating a second light having a second energy to the first exposed region of the photoresist film through a second shot region of the mask. | 07-31-2014 |
20160131970 | METHOD OF MANUFACTURING A MASK - A method of manufacturing a mask includes dividing an upper surface of a template having a design pattern into a plurality of regions, the template being arranged over a polymer layer on a mask substrate, correcting a distorted region among the regions, pressing the polymer layer with the template to form a mask pattern corresponding to the design pattern on the polymer layer; and curing the mask pattern. | 05-12-2016 |
Patent application number | Description | Published |
20090097534 | APPARATUS AND METHOD FOR RECEIVING MULTIPATH SIGNAL IN A WIRELESS COMMUNICATION SYSTEM - An apparatus and method for receiving a multipath signal in a wireless communication system are provided. The apparatus includes a sample buffer, a buffer index controller, a finger, and a Deskewer buffer and combiner. The sample buffer stores sample data corresponding to a defined number of chips among reception data converted into digital signals. The buffer index controller controls a position of the sample buffer to store the converted data and a position of the sample buffer to output data. The finger receives sample data from a specific position of the sample buffer and demodulates each multipath signal. The Deskewer buffer and combiner eliminates a temporal retard of each demodulated multipath signal and combines the multipath signals. | 04-16-2009 |
20090097583 | APPARATUS AND METHOD FOR SELECTING OPERATION MODE IN MIMO COMMUNICATION SYSTEM - An apparatus and a method for selecting an operation mode to improve a throughput in a mobile communication system are provided. The apparatus includes a Carrier to Interference and Noise Ratio (CINR) predictor for predicting a probable average and dispersion for a CINR measured using a preamble of a received pilot signal or radio signal, a metric calculator for calculating a throughput for each Modulation and Coding Scheme Level (MCS_Level) by using the probable average and dispersion for the predicted CINR and for selecting an MCS_Level having a maximum throughput, and an operation mode selector for selecting an operation mode of the selected MCS_Level having the maximum throughput. | 04-16-2009 |
20100104052 | AUTOMATIC GAIN CONTROL APPARATUS AND METHOD FOR COMPRESSED MODE IN MIMO SYSTEM - An automatic gain control apparatus and method for a compressed mode in a MIMO system are provided. The method includes determining power at a first frequency band using a first receiver, simultaneously determining power at a second frequency band using a second receiver in a compressed mode, if the second receiver changes a power determination frequency band into the first frequency band, correcting the power determination value of the first receiver, and applying the corrected power determination value of the first receiver to the second receiver. | 04-29-2010 |
20100303141 | APPARATUS AND METHOD FOR RECEIVING SIGNAL USING RAKE RECEIVER AND EQUALIZER IN WIRELESS COMMUNICATION SYSTEM - An apparatus and a method for selecting a receiver for demodulating a reception signal at a reception end having a plurality of receivers are provided. The method includes determining, a mean and a standard deviation of Signal-to-Noise Ratios (SNRs) of the receivers are determined, estimating a Doppler frequency, determining a statistical value of a modulation order of subframes received in advance, determining SNR estimation values of the receivers based on the determined mean and standard deviation of the receivers, the estimated Doppler frequency, and the determined statistical value of the modulation order of the received subframes, selecting one receiver having a largest SNR estimation value among the determined SNRs of the receivers, and demodulating a reception signal using the selected receiver. | 12-02-2010 |
20110051797 | Method and apparatus for receiving signal in wireless communication system - A mobile terminal includes a channel estimation module that is maintained in an active state. A controller determines an activation time point of an equalizer weight calculation module for calculating a tap coefficient. The activation time point is earlier than an activation time point of a main equalizer module, and activates the equalizer weight calculation module at the activation time point so as to calculate the tap coefficient. When the equalizer weight calculation module's operation is completed, the controller activates the main equalizer module, detects a mobile terminal ID, activates an interference cancellation module, and controls the main equalizer module to provide a data signal demodulator with the data signal compensated for by the tap coefficient. A demodulator demodulates the compensated data signal. | 03-03-2011 |
20140369215 | METHOD AND APPARATUS FOR MEASURING LINK QUALITY IN WIRELESS COMMUNICATION SYSTEM - A method and an apparatus for measuring a link quality in a wireless communication are provided. The method of a receiver for measuring the link quality in the wireless communication system includes determining a modulation type for each of at least one reception stream received through at least one antenna based on a modulation order and channel information regarding each of signals transmitted from a plurality of transmission antennas, searching for a parameter corresponding to the determined modulation type from a pre-stored parameter table in which parameters for each modulation type are stored, and calculating a channel capacity for each of the at least one reception streams received through the at least one antenna by using the searched parameter. | 12-18-2014 |
Patent application number | Description | Published |
20120235880 | ULTRAHIGH-FREQUENCY PACKAGE MODULE - An ultrahigh-frequency package module is provided, including a first substrate having a plurality of power lines and a plurality of signal lines, and one or more second substrates provided on one surface of the first substrate and each being provided with at least one antenna. The second substrates are independently arranged one by one in a grid pattern along one surface of the first substrate. | 09-20-2012 |
20120293007 | POWER TRANSMITTING METHOD AND POWER TRANSMITTER FOR COMMUNICATION WITH POWER RECEIVER - A method and power transmitter for efficiently controlling power transmission to one or more power receivers in a wireless multi-power transmission system are provided. The method includes performing, when a predetermined measurement cycle arrives, a load measurement; comparing a current load measurement value with a previous load measurement value; determining whether the current load measurement value is increased over the previous load measurement value by at least as much as a first predetermined threshold; gradually increasing, when the load measurement value is increased over the previous load measurement value by at least as much as the first threshold, a transmission power value until a request for a subscription to a wireless multi-power transmission network from a power reception target within a predetermined time limit; and stopping, when the request for the subscription is not received before the time limit is exceeded, power transmission to the power reception target. | 11-22-2012 |
20120293011 | POWER TRANSMITTING AND RECEIVING APPARATUS AND METHOD FOR PERFORMING A WIRELESS MULTI-POWER TRANSMISSION - An apparatus and method are provided for transmitting and receiving power for wireless power transmission. A power transmitting apparatus includes a power supplier for generating power; a resonator for transmitting the power generated by the power supplier to a plurality of power receiving apparatuses; and a controller for determining whether a power transmission to a new power receiving apparatus is possible using a power receiving apparatus management table, when the new power receiving apparatus is detected while the power transmissions of the plurality of power receiving apparatuses are being performed, and controlling the resonator to transmit power to the new power receiving apparatus, when the power transmission to the new receiving apparatus is possible. The power transmitting apparatus stably supplies power to a plurality of power receiving apparatuses by determining power transmission states of the plurality of power receiving apparatuses. | 11-22-2012 |
20130043737 | WIRELESS POWER RECEIVER FOR CONTROLLING WIRELESS POWER BY USING SWITCH - A wireless power receiver for wirelessly receiving a supply of power from a wireless power supplier is disclosed. The wireless power receiver includes a power reception unit for wirelessly receiving wireless power from the wireless power supplier; a rectifier for rectifying the wireless power into power including a DC waveform; a power adjustor for configuring a closed loop with the power reception unit for a first period and transferring the wireless power to the rectifier for a second period to adjust a size of the wireless power; and a controller for determining the first period and the second period, wherein the power adjustor is electrically connected to the power reception unit and the rectifier. | 02-21-2013 |