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| 20090092946 | Method of generating a digital supplementary device for dental implant planning - A method of generating a digital supplementary device for dental implantation by: preparing a mouth model based on the internal shape of the oral cavity of the patient; performing a 3D scan to obtain digital model of the mouth model, the digital model of the patient's oral cavity and the digital model of the tooth model; defining the digital models as the “positioning object,” “the reference object” and the “attached positioning object”; obtaining characteristic points after joining the positioning object and the attached positioning object and positioning the positioning object and the reference object based on the characteristic points; and then outputting the attached positioning object with the positioning data obtained after positioning of the attached positioning object. The output thus obtained is the desired digital supplementary device for dental implant planning. | 04-09-2009 |
| 20090104583 | Method for Designing an Abutment - A method for designing an abutment tooth which mainly comprises the steps of: setting a reference abutment device with a feature on an analog of a mouth model; positioning a digital abutment with the same configuration as the reference abutment device on the analog to obtain the configuration data of the positioning of the digital abutment on the analog; optimally adjusting the digital abutment by using as a reference the configuration digital data without affecting the configuration of the digital abutment and the analog, thus finishing the design of the abutment. | 04-23-2009 |
| 20090111071 | Method for designing a digital abutment for dental implant - A method for designing a digital abutment for a dental implant includes the steps of: a) implant planning where implant planning is initiated based on digital data obtained from the patient and loaded into a computer system to enable an implant fixture to be implanted at the implant site in the best position, b) establishment of digital reference abutment where a digital reference abutment is established at the implant site and positioned on the implant fixture, c) adjustment of the digital reference abutment where the digital reference abutment has a subgingival part and a supragingival part at the top side of the subgingival part, and the angle between the subgingival part and the supragingival part is adjusted based on the best prosthesis position, and d) finish of digital abutment where the digital reference abutment becomes a digital abutment for placement after the adjustment. | 04-30-2009 |
| 20100266985 | ABUTMENT ASSEMBLY FOR DENTAL IMPLANT - An abutment assembly for use with a dental implant unit includes a metal pedestal unit which has a fitting bushing adapted to fittingly engage a tubular fitted wall of an implant member, a ceramic abutment body which has an annular cut-out in a bottom wall thereof to be mounted on the pedestal unit, and a tubular packing member which has a bearing ledge on an inner peripheral surface to be pressed by a bolt member when the bolt member is threadedly engaged with the implant member, and a pressing region on an outer peripheral surface to be brought to intimately abut against a pressed region of an inner tubular wall surface of the abutment wall so as to place the abutment body in a tightened position. | 10-21-2010 |
| 20100316974 | METHOD OF MAKING A SURGICAL TEMPLATE USED FOR A COMPUTER-GUIDED DENTAL IMPLANT SURGERY - A method of making a surgical template comprises: producing a 3-D geometrical image by a CT scanning performed on a patient's jaw and establishing corresponding implant planning data to obtain a 3-D first digital image, making a positive plaster model of the patient's jaw, scanning the plaster model to obtain a 3-D second digital image, overlapping the second digital image on the first digital image to obtain a computer representation of the plaster model and at least one implant to be mounted according to the implant planning data, drilling the plaster model to form at least one pinhole according to the implant planning data, inserting a pin into the pinhole, producing a negative template body from an assembly of the plaster model and the pin with a thermoplastic dental material so that the negative template body has at least one implant guide hole and constitutes the surgical template. | 12-16-2010 |
| 20110123954 | Method of designing dental-implant prosthesis - A method of designing a dental-implant prosthesis includes the steps of arranging a referential jig and combining the referential jig into a fixture installed in a patient's oral cavity, the referential jig having at least one feature point, the fixture having a connection interface, the referential jig having an opposite-joint interface; scanning the patient's oral cavity to acquire an oral digital data and a referential-jig digital data having at least one feature-point digital data; selecting one digital dental-implant prosthesis from a prosthetic database in a computer, a digital positioning jig overlapping the digital dental-implant prosthesis for combination with the connection interface, and proceeding with overlapping and localization of the digital positioning jig and the referential jig digital data to combine the referential jig digital data into the connection interface; and adjusting the position, size, and angle of the digital dental-implant prosthesis to acquire the digital dental-implant prosthesis which is most suitable to the patient. | 05-26-2011 |
| 20110123955 | Method of preparing digital model and artificial tooth applied to dental implant - A method of preparing a digital model and an artificial tooth applied to dental implant includes the steps of a) combining a jig into a fixture in a patient's oral cavity and scanning the patient's oral cavity by an oral scanner to acquire a first oral digital data and saving it in a computer; b) operating the computer to select one of digital prostheses from a prosthetic database in the computer, arranging a digital positioning jig to correspond to the jig in the first oral digital data, and then combining the selected digital prosthesis with the first oral digital data to generate a second oral data; c) generating a digital oral model based on the second oral digital data; and d) creating a solid oral model. | 05-26-2011 |
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| 20090107954 | METHOD FOR CONTROLLING ADI-AEI CD DIFFERENCE RATIO OF OPENINGS HAVING DIFFERENT SIZES - A method for controlling ADI-AEI CD difference ratios of openings having different sizes is provided. First, a first etching step using a patterned photoresist layer as a mask is performed to form a patterned Si-containing material layer and a polymer layer on sidewalls thereof. Next, a second etching step is performed with the patterned photoresist layer, the patterned Si-containing material layer and the polymer layer as masks to at least remove an exposed portion of a etching resistive layer to form a patterned etching resistive layer. A portion of a target material layer is removed by using the patterned etching resistive layer as an etching mask to form a first and a second openings in the target material layer. The method is characterized by controlling etching parameters of the first and second etching steps to obtain predetermined ADI-AEI CD difference ratios. | 04-30-2009 |
| 20100018944 | PATTERNING METHOD - A patterning method is provided. A patterned photoresist layer is formed on a bottom anti-reflective coating (BARC), having therein an opening exposing a portion of the BARC. The patterned photoresist layer is treated with a first plasma-generating gas including a fluorocarbon species to form a polymer layer on the surface of the PR layer and the sidewall of the opening. The patterned photoresist layer is used as a mask to etch the BARC with a second plasma-generating gas, which includes Ar and H | 01-28-2010 |
| 20100105205 | CLEANING SOLUTION AND SEMICONDCUTOR PROCESS USING THE SAME - A semiconductor process is provided. First, a metal layer, a dielectric layer and a patterned hard mask layer are sequentially formed on a substrate. Thereafter, a portion of the dielectric layer is removed to form an opening exposing the metal layer. Afterwards, a cleaning solution is used to clean the opening. The cleaning solution includes a triazole compound with a content of 0.00275 to 3 wt %, sulfuric acid with a content of 1 to 10 wt %, hydrofluoric acid with a content of 1 to 200 ppm and water. | 04-29-2010 |
| 20110244678 | SEMICONDUCTOR PROCESS - A semiconductor process is provided. First, a metal layer, a dielectric layer and a patterned hard mask layer are sequentially formed on a substrate. Thereafter, a portion of the dielectric layer is removed to form an opening exposing the metal layer. Afterwards, a cleaning solution is used to clean the opening. The cleaning solution includes a triazole compound with a content of 0.00275 to 3 wt %, sulfuric acid with a content of 1 to 10 wt %, hydrofluoric acid with a content of 1 to 200 ppm and water. The semiconductor process can reduce the possibility of having an incomplete turning on, a leakage or a short, so that the yield of the product is increased. | 10-06-2011 |
| Patent application number | Description | Published |
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| 20090142931 | Cleaning method following opening etch - A cleaning method following an opening etching is provided. First, a semiconductor substrate having a dielectric layer is provided. The hard mask layer includes at least a metal layer. The opening etch is then carried out to form at least an opening in the dielectric layer. A nitrogen (N2) treatment process is performed to clean polymer residues having carbon-fluorine (C—F) bonds remained in the opening. Finally, a wet cleaning process is performed. | 06-04-2009 |
| 20100258941 | DAMASCENE INTERCONNECTION STRUCTURE AND DUAL DAMASCENE PROCESS THEREOF - A dual damascene process is disclosed. A substrate having a base dielectric layer, a lower wiring layer inlaid in the base dielectric layer, and a cap layer capping the lower wiring layer is provided. A dielectric layer is deposited on the cap layer. A silicon oxide layer is deposited on the dielectric layer. A metal hard mask is formed on the silicon oxide layer. A trench opening is etched into the metal hard mask. A partial via feature is etched into the dielectric layer within the trench opening. The trench opening and the partial via feature are etch transferred into the dielectric layer, thereby forming a dual damascene opening, which exposes a portion of the cap layer. A liner removal step is performed to selectively remove the exposed cap layer from the dual damascene opening by employing CF | 10-14-2010 |
| 20110130008 | METHOD TO CONTROL CRITICAL DIMENSION - A method to control a critical dimension is disclosed. First, a material layer and a composite patterned layer covering the material layer are provided. The composite patterned layer has a pattern defining a first critical dimension. Later, an etching gas is used to perform an etching step to etch the composite patterned layer and a pattern-transferring step is carried out so that thereby the underlying material layer has a transferred pattern with a second critical dimension which is substantially smaller than the first critical dimension. | 06-02-2011 |
