Yatsuda, JP
Eiji Yatsuda, Wako-Shi JP
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20090096253 | FRONT VEHICLE BODY STRUCTURE - Triangular left and right load transmission members each have a first arm interconnecting a front sub frame and a left or right rear frame, a second arm interconnecting the front sub frame and a left or right side sill, and a third arm interconnecting the left or right side sill and the left or right rear frame. The transmission members each transmit an impact load from the front sub frame to the left or right rear frame via the first arm and to the left or right side sill via the second arm. A cross member spans between the side sills and fixedly connected to the rear frames. Left and right rigid areas are formed by the transmission members, cross member and right rear frames. | 04-16-2009 |
Hiroaki Yatsuda, Nagasaki JP
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20090073020 | Parallel type analog-to-digital conversion circuit, sampling circuit and comparison amplification circuit - A parallel type analog-to-digital conversion circuit, including a reference signal generating portion and a comparison amplification portion, the comparison amplification portion including a plurality of amplifiers, input resetting switches, first sampling capacitors, second sampling capacitors, first sampling switches, and second sampling switches. | 03-19-2009 |
20090102693 | Serial-parallel type analog-to-digital converter and analog-to-digital conversion method - A serial-parallel type analog-to-digital converter includes a reference voltage generator, a higher bit comparing portion and a lower bit comparing portion, and a reference voltage selecting portion, wherein the lower bit comparing portion includes the plurality of comparison stages. | 04-23-2009 |
20100271244 | A/D Converter - An analog to digital converter includes: a reference circuit adapted to generate reference voltages; differential amplifiers; normal phase circuits each of which samples a normal phase analog input signal and transfers a comparison voltage, obtained by comparison with a reference voltage generated by the reference circuit, to a first input terminal of one of the differential amplifiers when the input is differential and single-ended; and reversed phase circuits each of which samples a reversed phase analog input signal and transfers a comparison voltage, obtained by comparison with a reference voltage generated by the reference circuit, to a second input terminal of one of the differential amplifiers when the input is differential and which samples a ground level as a reference voltage of the reference circuit and supplies the reference voltage and comparison voltage to the second input terminal of the differential amplifier when the input is single-ended. | 10-28-2010 |
Kazutoshi Yatsuda, Ashigarakami-Gun JP
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20090067786 | OPTICAL WAVEGUIDE DEVICE AND LIGHT OUTPUTTING MODULE - An optical waveguide device includes: a waveguide core that guides light; a mirror surface that deflects light coming from the waveguide core by 90°; a main waveguide core that guides light deflected at the mirror surface; a waveguide core for monitoring that branches the light deflected at the mirror surface off from the main waveguide core, and guides the light in a different direction, the mirror surface being disposed at a branching portion of the waveguide core for monitoring; and a clad portion that surrounds the waveguide core, the main waveguide core and the waveguide core for monitoring. | 03-12-2009 |
20100328451 | POSITION MEASURING SYSTEM, PROCESSING DEVICE FOR POSITION MEASUREMENT, PROCESSING METHOD FOR POSITION MEASUREMENT, AND COMPUTER READABLE MEDIUM - A position measuring system includes a marker set having three or more basic markers that are known in positional relation and attached to a second area of an object which contains a first area having an acting portion and the second area continuous with the first area, an image-taking device having a two-dimensional image-taking element that takes an image of the marker set, a recording device that records the coordinate of the acting portion with respect to the marker set, and a processing device that calculates the three-dimensional position of the acting portion by using the position and angle of the marker set determined on the basis of the image of the marker set taken by the image-taking device and the coordinate of the acting portion with respect to the marker set that is recorded in the recording device. | 12-30-2010 |
20100332182 | OPERATION DETERMINING SYSTEM, OPERATION DETERMINING DEVICE AND COMPUTER READABLE MEDIUM - An operation determining system includes: a position measuring unit that measures a position of a moving object with time; and an operation determining unit that determines that there is an operation of the object in a detection area when an intersecting angle between entering and exiting vectors of the object with respect to the detection area, the intersecting angle being calculated based on the position of the object measured by the position measuring unit, is equal to or higher than a certain value. | 12-30-2010 |
Koichi Yatsuda, Nirasaki-Shi JP
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20090087990 | Manufacturing method, manufacturing apparatus, control program and program recording medium of semiconductor device - A manufacturing method of a semiconductor device, which etches a layer to be etched on a substrate into a predetermined pattern based on a first pattern of photoresist produced by exposing and developing a photoresist film, the manufacturing method including the steps of forming an SiO | 04-02-2009 |
20090087991 | Manufacturing method, manufacturing apparatus, control program and program recording medium of semicontructor device - A manufacturing method of a semiconductor device, which etches a layer to be etched on a substrate into a predetermined pattern based on a first pattern of photoresist produced by exposing and developing a photoresist film, the manufacturing method includes the steps of, patterning an organic membrane based on a first pattern of the photoresist, forming an SiO | 04-02-2009 |
20090291560 | FORMING METHOD OF ETCHING MASK, CONTROL PROGRAM AND PROGRAM STORAGE MEDIUM - A feedforward control is performed so that a line width of a mask constituted by an Si | 11-26-2009 |
Koichi Yatsuda, Nirasaki City JP
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20100144155 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - The method of manufacturing a semiconductor device comprising: forming a first hard mask layer and a second hard mask layer on the layer to be etched (S | 06-10-2010 |
20100190350 | PLASMA ETCHING APPARATUS, PLASMA ETCHING METHOD AND STORAGE MEDIUM - A plasma etching method for forming a hole in an etching target film by a plasma processing apparatus is provided. The apparatus includes an RF power supply for applying RF power for plasma generation to at least one of upper and lower electrodes, and a DC power supply for applying minus DC voltage to the upper electrode. A first condition that plasma is generated by turning on the RF power supply and minus DC voltage is applied to the upper electrode and a second condition that the plasma is extinguished by turning off the RF power supply and minus DC voltage is applied to the upper electrode are alternately repeated. Etching is performed by positive ions in the plasma under the first condition and negative ions are supplied into the hole by the DC voltage to neutralize positive ions in the hole under the second condition. | 07-29-2010 |
Koichi Yatsuda, Yamanashi JP
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20090081565 | METHOD FOR FORMING ETCHING MASK, CONTROL PROGRAM AND PROGRAM STORAGE MEDIUM - Disclosed is a method for forming an etching mask, capable of precisely and easily forming an etching mask having a microscopic pattern of a non-straight-line shape. An exposure pattern of a straight-line shape is transferred to a photoresist by using a first reticle and developed, and after a trimming process, a SiO | 03-26-2009 |
20110104901 | SEMICONDUCTOR DEVICE MANUFACTURING METHOD - A semiconductor device manufacturing method includes a process of forming a first organic film pattern on a to-be-etched layer on a substrate, a process of forming a silicon oxide film coating the first organic film pattern in an isotropic manner, a process of etching the silicon oxide film to form a first mask pattern in such a manner to cause the width of the line part of the first organic film pattern to have a fixed proportion with respect to a thickness of the silicon oxide film that coats a surface of the line part in the isotropic manner, a process of forming a second organic film pattern coating the silicon oxide film, a process of forming a second mask pattern that includes the silicon oxide film on a side face part in an area that is coated by the second organic film pattern, and a process of, in an area other than the area that is coated by the second organic film pattern, forming a third mask pattern in which an even number of the silicon oxide films are arranged. | 05-05-2011 |
20120190206 | SEMICONDUCTOR DEVICE MANUFACTURING METHOD - A semiconductor device manufacturing method includes forming a first organic film pattern on a to-be-etched layer on a substrate, forming a silicon oxide film coating the first organic film pattern-etching the silicon oxide film to form a first mask pattern to cause the width of the line part of the first organic film pattern to have a fixed proportion with respect forming a second organic film pattern coating the silicon oxide film, forming a second mask pattern including the silicon oxide film on a side face part in an area coated by the second organic film pattern, and forming, in an area other than the area coated by the second organic film pattern, a third mask pattern in which an even number of the silicon oxide films are arranged. | 07-26-2012 |
Kouichi Yatsuda, Isahaya-Shi JP
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20100230386 | PROCESSING DEVICE, ELECTRODE, ELECTRODE PLATE, AND PROCESSING METHOD - A processing gas fed from a gas feed pipe ( | 09-16-2010 |
Naruki Yatsuda, Yokohama-Shi JP
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20090298608 | Golf club shaft, production method therefor, and golf club therewith - A golf club shaft includes a base made of a metal material, a nickel plated layer formed on the base, a chrome plated layer formed on the nickel layer, and a coating layer formed on the chrome plated layer. The chrome plated layer has a surface roughness Ra of 0.1 to 0.3 μm and a thickness of 0.2 to 1 μm. | 12-03-2009 |
20140045605 | SHAFT FOR GOLF CLUB HAVING RIGIDITY IMPROVED AT INTERMEDIATE PART - A shaft for a golf club is capable of hitting a higher ball and reducing a spin on the ball. The shaft has a distal part that is provided with a clubhead, a proximal part that is provided with a grip, an intermediate part arranged between the distal and proximal parts, and a thick part set to thicken a wall thickness of the intermediate part relative to the distal part, a reinforcing part set at the intermediate part, or a combination of the thick part and the reinforcing part. With this, the shaft improves a rigidity at the intermediate part so that a change in rigidity between the distal part and the intermediate part has an inflection point. | 02-13-2014 |
Senichiro Yatsuda, Chuo-Ku JP
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20100052747 | PLL FREQUENCY SYNTHESIZER - A PLL frequency synthesizer | 03-04-2010 |
Tomoko Yatsuda, Kyoto JP
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20140344115 | PRODUCT SEARCH SYSTEM - A product search system includes a product data storage portion for storing product data, an axis item data storage portion for storing settability information for axis items and axis division numbers, a product ID storage portion for storing unique identification information of products, a two-dimensional coordinate space defining portion for defining a two-dimensional coordinate space, a distribution diagram generating portion for generating data for a distribution diagram in which product images are arranged in the coordinate space, and a product extracting portion for extracting unique identification information of products within an area of a section selected by a user, and storing the information in the product ID storage portion. Once the unique identification information is stored in the product ID storage portion, the distribution diagram generating portion generates data for a post-refinement distribution diagram in which product images for products corresponding to the stored unique identification information are relatively highlighted. | 11-20-2014 |
Yasushi Yatsuda, Yokohama-Shi JP
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20110170306 | PROJECTOR-TYPE HEADLIGHT AND CONFIGURATION STRUCTURE OF RESIN PROJECTOR LENS THEREOF - Disclosed is a projector-type headlight that can include a light emitting device, a reflector having a reflection surface to reflect a light from the light emitting device forward, a projector lens to project the reflected light from the reflection surface forward, the projector lens being a resin molding, and a shade to form a light distribution pattern having a light-dark border line by blocking a part of the reflected light heading from the reflection surface to the projector lens. A gate trace can be formed in a circumference portion of the projector lens. The gate trace can be provided lower than a horizontal surface on which a light axis of the projector lens passes through, and at the same time can be provided in a state of being shifted either leftward or rightward from a vertical surface on which the light axis of the projector lens passes through. | 07-14-2011 |