Patent application number | Description | Published |
20110074817 | COMPOSITE PICTURE FORMING METHOD AND PICTURE FORMING APPARATUS - A composite picture forming method and picture forming apparatus forms pattern attribute information contained in an overlapping domain for the overlapping domain between a plurality of pictures to select the pictures to be targeted for a composition in accordance with the pattern attribute information and combine the selected pictures, and the composition of the pictures is also performed in plural stages by using the pattern attribute information in the overlapping domain. | 03-31-2011 |
20110110597 | IMAGE INSPECTION APPARATUS - The present invention provides a unified template matching technique which allows an adequate matching position to be provided even in an image with a distorted pattern shape and a variation in edge intensity. A correlation value contribution rate map is created for the vicinity of each of top candidate positions obtained by applying a centroid distance filter to a normalized correlation map resulting from template matching. A corrected intensity image is created from the correlation value contribution rate maps. Luminance correction is performed based on the corrected intensity image. Local matching is performed again on the vicinity of each candidate position. The candidates are then re-sorted based on candidate positions and correlation values newly obtained. Thus, even in an image with a distorted pattern shape and a variation in edge intensity, an adequate matching position can be provided in a unified manner. | 05-12-2011 |
20110142326 | PATTERN INSPECTION METHOD, PATTERN INSPECTION APPARATUS AND PATTERN PROCESSING APPARATUS - In a defect judgment operation using tolerance to allow a high-speed operation, the amount of deformation is obtained from an image pickup pattern image, and tolerance including the deformation is generated by deforming a reference pattern image as the basis of the tolerance according to the deformation, and only a disconnection or a contact is judged as an abnormality even if deformation exists in an image pickup pattern. | 06-16-2011 |
20120092482 | METHOD AND DEVICE FOR CREATING COMPOSITE IMAGE - A composite image creating method and device are provided which, when images separately captured a plurality of times are panoramically synthesized, can prevent deformation of a pattern due to multiple irradiation of the electron beam. One image is generated by overlapping joining areas of rims of two adjacent images when a plurality of images are joined to generate one image. Of two adjacent images, the joining area of an image of an earlier image capturing order is left, and the joining area of an image of a later image capturing order is removed. The joining area of the image of an earlier image capturing order is obtained with irradiation of electron beam a less number of times than the joining area of the image of a later image capturing order, and therefore deformation of a pattern due to irradiation of the electron beam is little. | 04-19-2012 |
20120106826 | PATTERN SHAPE EVALUATION METHOD AND PATTERN SHAPE EVALUATION APPARATUS - An image of the joint portion of circuit patterns manufactured using a design pattern for double patterning is read out. Target boundary lines and evaluation regions are set on the image. In the evaluation regions, image processing is performed along the directions of the target boundary lines. Furthermore, binarization processing is performed. A decision is made based on an image obtained in this way as to whether the patterns have defects. | 05-03-2012 |
20120121160 | METHOD OF CREATING TEMPLATE FOR MATCHING, AS WELL AS DEVICE FOR CREATING TEMPLATE - Disclosed is a method wherein a template for template matching is created with high accuracy and high efficiency. With respect to each individual pattern constituting a basic circuit, pattern information regarding a plurality of layers in a semiconductor device is stored in a library. On the basis of the designation of the position and the layer, pattern information regarding the designated position and layer is extracted from the pattern information stored in the library. A template is created on the basis of the extracted pattern information. | 05-17-2012 |
20120182415 | Pattern Matching Method, Pattern Matching Program, Electronic Computer, and Electronic Device Testing Apparatus - Disclosed is a pattern matching method whereby a testing point can be searched accurately while simplifying the work of presetting. An image region of a part of a captured image is extracted, and a divided image of the image region is set as a template image. A pattern matching is performed by rotating the template image. Moreover, the pattern matching determines whether a point-symmetric pattern exists inside the image region. | 07-19-2012 |
20120290990 | Pattern Measuring Condition Setting Device - When setting a measurement position, on the basis of a defect coordinate, on a sample, which is arranged with a complex pattern or a plurality of patterns and which has a pattern in which the influence of the optical proximity effect needs to be evaluated, the measurement position is set so as to improve work efficiency. Provided is a device for setting a first measurement position and a second measurement position, wherein: a reference line comprising a plurality of line segments is superimposed on a two-dimensional region set by a pattern layout data; the first measurement position is set on the inside of a contour which indicates a pattern in which a defect coordinate on the layout data exists, and between the intersecting points of the reference line and said contour; and a second measurement position is set outside of said contour, and either on said contour and another portion of said contour or between the intersecting points of said contour and another portion of said contour. | 11-15-2012 |
20120305767 | Pattern Inspection Method, Pattern Inspection Program, and Electronic Device Inspection System - It is an object of the present invention to provide a technique capable of accurately inspecting a circuit pattern in which the contrast of an observation image is not clear, like a circuit pattern having a multilayer structure. A pattern inspection method according to the present invention divides a circuit pattern using the brightness of a reflection electron image and associates the region in the reflection electron image belonging to each division with the region in a secondary electron image (see FIG. | 12-06-2012 |
20130011080 | Image Processing Apparatus, Image Processing Method, and Image Processing Program - It is an object of the present invention is to provide an image processing technique that can detect the rotation of an observation image of a specimen with high accuracy. An image processing apparatus according to the present invention indirectly corrects a rotation gap between measurement image data and reference image data through wide-angle image data including a measurement part of a specimen (FIG. | 01-10-2013 |
20130013223 | Fracture Surface Analysis System and Method of Fracture Surface Analysis - Provided is a fracture surface analysis system and method featuring excellent accuracy and reproducibility and designed to estimate fracture mechanics data in a simplified manner. A surface irregularities waveform that includes fracture surface irregularities forming a steplike shape of a fracture surface is acquired, and after an overall gradient of the surface irregularities waveform has been corrected and noise eliminated from this waveform, positions of uneven portions present on any measuring line are identified from the surface irregularities waveform and the number of uneven portions on the measuring line is counted, whereby an average distance between the uneven portions on the measuring line is then calculated, and next the fracture mechanics data relating to a stress intensity factor, crack growth rate, or stress exerted during formation of the fracture surface, is estimated from the average distance between the uneven portions. | 01-10-2013 |
20130170757 | METHOD FOR CREATING TEMPLATE FOR PATTERNMATCHING, AND IMAGE PROCESSING APPARATUS - Disclosed is a method for creating a template for the purpose of performing pattern matching on the basis of a template image having high contrast. Also disclosed is an image processing apparatus. In the method for creating the template, design data is partially extracted, and on the basis of the extracted partial region, the template for template matching is created. In the image processing apparatus, such method is performed. In the method and the apparatus, a density of edges that belong to a predetermined region in the design data equivalent to the region to be searched for in the template matching is obtained. | 07-04-2013 |
20130216141 | PATTERN MATCHING METHOD, IMAGE PROCESSING DEVICE, AND COMPUTER PROGRAM - In order to provide a computer program, an image processing device, and a pattern matching method that perform pattern matching at a high level of accuracy without relying on edge deformation, contrast fluctuations, etc., in one embodiment, the disclosed pattern matching method and device perform pattern matching over an image using a template produced on the basis of the below mentioned design data. The pattern matching method and device determine the characteristic quantities of the image for an inner region and/or an outer region that are divided by a line that defines the contour of a pattern, and determine positions at which said characteristic quantities satisfy predetermined conditions to be matching positions, matching position candidates, or erroneous matching positions. | 08-22-2013 |
20130279793 | IMAGE PROCESSING APPARATUS AND COMPUTER PROGRAM - An object of the present invention is to provide an image processing apparatus and a computer program which detects a defect such as a scum at high speed and with high precision. In order to accomplish the above-described object, the present invention proposes an image processing apparatus and a computer program which acquires image data, and detects edge branch points from this image data. Here, at each of the edge branch points, an edge associated therewith branches off in at least three or more directions. According to this configuration, it becomes possible to detect a defect such as a scum without utilizing the reference-pattern image. As a consequence, it becomes possible to detect the scum at high speed and with high precision. | 10-24-2013 |