Patent application number | Description | Published |
20090022891 | METHOD OF FORMING METAL FILM - A method of forming a metal film, comprising the steps of:
| 01-22-2009 |
20090142617 | COMPOSITION FOR FORMING SILICON-ALUMINUM FILM, SILICON-ALUMINUM FILM AND METHOD FOR FORMING THE SAME - A composition for forming a silicon.aluminum film, containing a silicon compound and an aluminum compound. The silicon.aluminum film is obtained by forming a coating film of the above composition and treating it with heat and/or light. | 06-04-2009 |
20090215920 | SILANE POLYMER AND METHOD FOR FORMING SILICON FILM - There are provided a silane polymer having a higher molecular weight from the viewpoints of wettability when applied to a substrate, a boiling point and safety, a composition which can form a high-quality silicon film easily, a silicon film forming composition which comprises a silane polymer obtained by irradiating a photopolymerizable silane compound with light of specific wavelength range to photopolymerize it, and a method for forming a silicon film which comprises applying the composition to a substrate and subjecting the coating film to a heat treatment and/or a light treatment. | 08-27-2009 |
20100029057 | SILICONE RESIN COMPOSITION AND METHOD OF FORMING A TRENCH ISOLATION - A silicone resin which is represented by the following rational formula (1) and solid at 120° C.: | 02-04-2010 |
20110158886 | POLYSILANE PRODUCTION PROCESS - A polysilane production process comprising reacting a specific silane compound typified by a cyclic silane compound represented by the following formula (2) in the presence of a binuclear metal complex represented by the following formula (4). | 06-30-2011 |
20110184141 | POLYMER PRODUCTION PROCESS - A polymer production process comprising reacting a compound represented by the following formula (1) in the presence of a binuclear metal complex represented by the following formula (2). | 07-28-2011 |
20110229654 | COMPOSITION AND METHOD FOR FORMING AN ALUMINUM FILM - A composition for forming an aluminum film, comprising a complex represented by the following formula (1) and a complex represented by the following formula (2), the molar ratio of the complex represented by the following formula (1) and the complex represented by the following formula (2) being 40:60 to 85:15: | 09-22-2011 |
20110236583 | CONTAINER CONTAINING A COBALT CARBONYL COMPLEX AND COBALT CARBONYL COMPLEX COMPOSITION - A container containing a cobalt carbonyl complex and a gas that contains carbon monoxide, and a cobalt carbonyl complex composition comprising a cobalt carbonyl complex and a solvent, wherein the concentration of carbon monoxide dissolved in the solvent is 0.001 to 1 wt %. | 09-29-2011 |
20110318939 | HIGH ORDER SILANE COMPOSITION AND METHOD OF MANUFACTURING A FILM-COATED SUBSTRATE - A composition comprising a high order silane compound and a solvent, wherein the solvent contains a cyclic hydrocarbon which has one or two double bonds and no alkyl group, is composed of only carbon and hydrogen and has a refractive index of 1.40 to 1.51, a specific permittivity of not more than 3.0 and a molecular weight of not more than 180. | 12-29-2011 |
20120064302 | PATTERNING METHOD - A patterning method comprising the steps of: | 03-15-2012 |
20120301731 | METHOD FOR FORMING CRYSTALLINE COBALT SILICIDE FILM - The present invention is directed to a method for forming a crystalline cobalt silicide film, comprising the steps of:
| 11-29-2012 |
20130224889 | CHARGED PARTICLE BEAM APPARATUS, THIN FILM FORMING METHOD, DEFECT CORRECTION METHOD AND DEVICE FORMING METHOD - A charged particle beam apparatus is provided that enables faster semiconductor film deposition than the conventional deposition that uses silicon hydrides and halides as source gases. The charged particle beam apparatus includes a charged particle source | 08-29-2013 |
20150050205 | CONTAINER CONTAINING A COBALT CARBONYL COMPLEX AND COBALT CARBONYL COMPLEX COMPOSITION - A container containing a cobalt carbonyl complex and a gas that contains carbon monoxide, and a cobalt carbonyl complex composition comprising a cobalt carbonyl complex and a solvent, wherein the concentration of carbon monoxide dissolved in the solvent is 0.001 to 1 wt %. | 02-19-2015 |