Patent application number | Description | Published |
20080203297 | Specimen Inspection Equipment and How to Make the Electron Beam Absorbed Current Images - An object of the present invention is to obtain a clear absorbed current image without involving the difference in gain of amplifier between inputs, from absorbed currents detected by using a plurality of probes and to improve measurement efficiency. | 08-28-2008 |
20080204058 | Probe Storage Container, Prober Apparatus, Probe Arranging Method and Manufacturing Method of Probe Storage Container - An object of the present invention relates to an arrangement of a manufactured probe in a prober apparatus without being exposed to an atmospheric air. | 08-28-2008 |
20080237462 | Semiconductor Testing Method and Semiconductor Tester - A semiconductor testing method capable of quickly counting semiconductor cells with accuracy is achieved. Since an SEM is adjusted in a specific condition, the rotation axis of a stage and the axis of an optical system are deviated from each other in a different observation environment and a different adjustment environment. The deviation between the axes is easily adjusted in each observation environment, so that the deviation is reduced. A seemingly horizontal or vertical line is drawn with a mouse and raster rotation is performed in alignment with the closer axis. After that, the stage is horizontally moved, pattern matching is performed on an image on a position where the image should be disposed, and an angle is adjusted. The stage is moved evenly along the X-axis and the Y-axis, achieving a movement to a destination like a straight line. In synchronization with the smooth movement of the stage, a cell | 10-02-2008 |
20090045338 | Inspection method and apparatus using an electron beam - An inspection method and apparatus irradiates a sample on which a pattern is formed with an electron beam, so that an inspection image and a reference image can be generated on the basis of a secondary electron or a reflected electron emitted by the sample. An abnormal pattern is determined based on a difference in halftone values of each pixel between the inspection image and the reference image. A plurality of feature quantities of the abnormal pattern are obtained from an image of the abnormal pattern, and, based on the distribution of the plurality of feature quantities of the abnormal pattern, a range for classifying the type of the abnormal pattern is designated. Thus, a desired defect can be extracted from many defects extracted by inspection. | 02-19-2009 |
20090250610 | SAMPLE INSPECTION APPARATUS - A sample inspection apparatus in which a fault in a semiconductor sample can be measured and analyzed efficiently. A plurality of probes are brought into contact with the sample. The sample is irradiated with an electron beam while a current flowing through the probes is measured. Signals from at least two probes are supplied to an image processing unit so as to form an absorbed electron current image. A difference between images obtained in accordance with a temperature change of the sample is obtained. A faulty point is identified from the difference between the images. | 10-08-2009 |
20100019148 | INSPECTION APPARATUS FOR CIRCUIT PATTERN - In a circuit pattern inspection apparatus, while an electron beam is irradiated onto a surface of a substrate having a plurality of chips where circuit patterns have been formed, a signal produced from the irradiated substrate is detected so as to form an image, and then, the formed image is compared with another image in order to detect a defect on the circuit patterns. Before the electron beam is irradiated onto either the chip or the plurality of chips so as to acquire the image for an inspection purpose, an electron beam is previously irradiated onto the region to be irradiated, so that charging conditions of the substrate to be inspected are arbitrarily controlled. | 01-28-2010 |
20100116986 | Specimen Inspection Equipment and How to Make the Electron Beam Absorbed Current Images - An object of the present invention is to obtain a clear absorbed current image without involving the difference in gain of amplifier between inputs, from absorbed currents detected by using a plurality of probes and to improve measurement efficiency. | 05-13-2010 |
20100177954 | LOGICAL CAD NAVIGATION FOR DEVICE CHARACTERISTICS EVALUATION SYSTEM - A navigation system for easily determining defective positions is provided. In the case of CAD navigation to defective positions, logical information for indicating defective positions is created in a CAD format, instead of CAD data of physical information indicating circuit design. Specifically, by attaching marks such as rectangles, characters, or lines, to an electron microscope image with software, quick navigation is performed with required minimum information. By using created CAD data, re-navigation with the same equipment and CAD navigation to heterogeneous equipment are performed. | 07-15-2010 |
20100200749 | Semiconductor Testing Method and Semiconductor Tester - A semiconductor testing method capable of quickly counting semiconductor cells in which a seemingly horizontal or vertical line is drawn with a mouse, and raster rotation is performed in alignment with the closer axis. After that, the stage is horizontally moved, pattern matching is performed on an image on a position where the image should be disposed, and an angle is adjusted. The stage is moved evenly along the X-axis and the Y-axis, achieving a movement to a destination like a straight line. In synchronization with the smooth movement of the stage, a cell is surrounded in a rectangular frame by a ruler, and the number of cells is displayed with a numeric value. | 08-12-2010 |
20100246933 | Pattern Inspection Method And Apparatus - An apparatus for processing a defect candidate image, including: a scanning electron microscope for taking an enlarged image of a specimen by irradiating and scanning a converged electron beam onto the specimen and detecting charged particles emanated from the specimen by the irradiation; an image processor for processing the image taken by the scanning electron microscope to detect defect candidates on the specimen and classify the detected defect candidates into one of plural classes; a memory for storing output from the image processor including images of the detected defect candidates; and a display unit which displays information stored in the memory and an indicator, wherein the display unit displays a distribution of the detected and classified defect candidates in a map format by distinguishing by the classified class, and the display unit also displays an image of a defect candidate stored in the memory together with the map which is indicated on the map by the indicator. | 09-30-2010 |
20110093991 | Probe Storage Container, Prober Apparatus, Probe Arranging Method and Manufacturing Method of Probe Storage Container - An object of the present invention relates to an arrangement of a manufactured probe in a prober apparatus without being exposed to an atmospheric air. | 04-21-2011 |
20110140729 | INSPECTION DEVICE - An object of the invention is to provide an inspection device which has a function of preventing electric discharge so that an absorbed current is detected more efficiently. | 06-16-2011 |
20130112871 | Inspection Method and Device - The high magnification, high resolution and real-time property of an SEM image are realized when the electrical characteristics of an inspection object are measured, without affecting the electrical characteristics of the inspection object. A high-quality, high-magnification first image including an image of a target position in the inspection object on a sample is acquired. Next, a low-quality, low-magnification second image including the image of the target position in the inspection object on the sample and probe images is acquired. Next, data on the first image is built into the second image to generate an image for coarse-access observation which is the same in magnification as the second image. The generation of the image for coarse-access observation is repeated until a probe comes close to the target position in the inspection object. | 05-09-2013 |
20130119999 | Specimen Testing Device and Method for Creating Absorbed Current Image - Proposed is a technique of emphasizing a change in absorbed current obtained from a faulty part in a wiring section as a testing target more than in other parts of the wiring section. A specimen testing device is configured to output an image of absorbed current output from two probes during scanning of an electron beam so as to be operatively associated with the scanning of the electron beam and includes the following mechanism. When a faulty part of a wiring section on the specimen side with which two probes are in contact is irradiated with an electron beam, the resistance value at the faulty part changes more than that of irradiation of a normal wiring section with the electron beam. Such a change in resistance value is detected as a change in ratio between a resistance value of the wiring section specified by the two probes and a known resistance value. With this method, an absorbed current image corresponding to the faulty part can be made easily distinguishable from an absorbed current image of other parts of the wiring section. | 05-16-2013 |