Patent application number | Description | Published |
20080231823 | Apparatus and methods for reducing the escape of immersion liquid from immersion lithography apparatus - A stage assembly includes a workpiece table that supports the workpiece adjacent to an optical assembly. An environmental system supplies and removes immersion liquid to and from a space between the workpiece and the optical assembly to form an immersion area. The environmental system has a lower surface disposed opposite from an upper surface of the workpiece and/or the workpiece table. The lower surface is spaced a first distance from the workpiece and/or the workpiece table to form a meniscus at a periphery of the immersion area. An edge member is provided on the environmental system and extends past the lower surface of the environmental system so that a lower portion of the edge member is spaced a second distance, smaller than the first distance, from the upper surface of the workpiece and/or the workpiece table at a position beyond the periphery of the immersion area. | 09-25-2008 |
20080233512 | Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method - A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system comprises: a plate that has a first surface and a second surface on the side opposite the first surface; and a liquid recovery part, at least part of which opposes the second surface with a first gap interposed therebetween. The liquid recovery system recovers the liquid on a movable object that opposes the first surface of the plate via the liquid recovery part. | 09-25-2008 |
20080284991 | Exposure apparatus, immersion system, exposing method, and device fabricating method - An exposure apparatus exposes a substrate with exposure light through a liquid. The exposure apparatus comprises: a liquid immersion member, which has a liquid contact surface that includes a liquid recovery area; and a porous member, which are disposed at a first side of the liquid contact surface; wherein, the liquid on an object, which is disposed at the first side of the liquid contact surface, is recovered from the liquid recovery area. | 11-20-2008 |
20090015808 | Exposure method, substrate stage, exposure apparatus, and device manufacturing method - An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate. | 01-15-2009 |
20090015816 | Exposure method, substrate stage, exposure apparatus, and device manufacturing method - An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate. | 01-15-2009 |
20090122282 | Exposure apparatus, liquid immersion system, exposing method, and device fabricating method - An exposure apparatus exposes a substrate with exposure light through a liquid. The exposure apparatus comprises: a first surface, which is disposed around an optical path of the exposure light; a second surface, which is disposed adjacent to an outer edge of the first surface, that includes a first area, which is inclined with respect to the first surface; and a liquid recovery surface, which is disposed at an outer side of the second surface with respect to the optical path of the exposure light; wherein, when an object is disposed at a position at which it opposes at least part of the first surface and at least part of the liquid recovery surface, a spacing between the second surface and the object is larger than a spacing between the first surface and the object, and a spacing between the object and at least part of the liquid recovery surface is larger than the spacing between the first surface and the object in a prescribed direction that is substantially perpendicular to a front surface of the object. | 05-14-2009 |
20090280436 | Immersion system, exposure apparatus, exposing method, and device fabricating method - An immersion system is used in an immersion exposure, wherein a substrate is exposed with an exposure light through an optical member and a liquid, and that fills an optical path of the exposure light between the optical member and the substrate with the liquid. The immersion system comprises: a first member, which is disposed around the optical path of the exposure light and has a first surface that faces in a first direction; a second member that has a liquid recovery port, which is disposed on the outer side of the first surface with respect to the optical path of the exposure light; a first drive apparatus that is capable of moving the first member parallel to the first direction; and a second drive apparatus that is capable of moving the second member parallel to the first direction independently of the first member; wherein, a space between the first surface and a front surface of an object can hold the liquid; and a liquid between the liquid recovery port and the front surface of the object is recovered via the liquid recovery port. | 11-12-2009 |
20100315609 | Maintenance method, maintenance device, exposure apparatus, and device manufacturing method - An exposure apparatus is provided with a nozzle member that has at least one of a supply outlet which supplies the liquid and a collection inlet which recovers the liquid. By immersing the nozzle member in cleaning liquid LK stored in container, the nozzle member is cleaned. | 12-16-2010 |
20110032498 | Exposure apparatus, exposure method, and method for producing device - An exposure apparatus exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which performs the projection, and a liquid supply mechanism which supplies the liquid onto the substrate to form a liquid immersion area on a part of the substrate. The liquid supply mechanism supplies the liquid onto the substrate simultaneously from a plurality of positions which are apart, in a plurality of different directions, from the projection area. The exposure apparatus is capable of forming the liquid immersion area stably and recovering the liquid satisfactorily. It is possible to perform the exposure process accurately while avoiding, for example, the outflow of the liquid to the surroundings. | 02-10-2011 |
20110080574 | Stage apparatus, exposure apparatus, and exposure method - A stage apparatus PST is provided with a holder PH, which has a substrate holding surface | 04-07-2011 |
20120133912 | LIQUID RECOVERY SYSTEM, IMMERSION EXPOSURE APPARATUS, IMMERSION EXPOSING METHOD, AND DEVICE FABRICATING METHOD - A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system comprises: a plate that has a first surface and a second surface on the side opposite the first surface; and a liquid recovery part, at least part of which opposes the second surface with a first gap interposed therebetween. The liquid recovery system recovers the liquid on a movable object that opposes the first surface of the plate via the liquid recovery part. | 05-31-2012 |
20120300181 | IMMERSION SYSTEM, EXPOSURE APPARATUS, EXPOSING METHOD, AND DEVICE FABRICATING METHOD - An immersion system is used in liquid immersion exposure. The immersion system includes: a first member, which is disposed around the optical path of the exposure light and has a first surface that faces in a first direction; a second member that has a liquid recovery port, which is disposed on the outer side of the first surface with respect to the optical path of the exposure light; a first drive apparatus that is capable of moving the first member parallel to the first direction; and a second drive apparatus that is capable of moving the second member parallel to the first direction independently of the first member; wherein, a space between the first surface and a front surface of an object can hold the liquid; and a liquid between the liquid recovery port and the front surface of the object is recovered via the liquid recovery port. | 11-29-2012 |
20130141701 | EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate. | 06-06-2013 |
20130141703 | EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate. | 06-06-2013 |
20130169944 | EXPOSURE APPARATUS, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, PROGRAM, AND RECORDING MEDIUM - An exposure apparatus that exposes a substrate with exposure light through a first liquid. The exposure apparatus includes: an optical member that has an emission surface which emits the exposure light; a first member that forms a first liquid immersion space of the first liquid in at least a part of a first space under the first lower surface and an optical path space including an optical path of the exposure light from the emission surface; and a second member that forms a second liquid immersion space of a second liquid, the second member being capable of moving in a state where the second liquid immersion space is formed separated from the first liquid immersion space. | 07-04-2013 |
20130235359 | MAINTENANCE METHOD, MAINTENANCE DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - An exposure apparatus is provided with a nozzle member that has at least one of a supply outlet which supplies the liquid and a collection inlet which recovers the liquid. By immersing the nozzle member in cleaning liquid LK stored in container, the nozzle member is cleaned. | 09-12-2013 |
20130271739 | EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus where liquid supply operation and liquid recovery operation for forming a liquid immersion region are excellently performed to form the liquid immersion region in a desired condition, enabling high exposure accuracy and measurement accuracy to be achieved. An exposure apparatus (EX) is an apparatus that exposes a substrate (P) by emitting exposure light (EL) on the substrate (P) through liquid (LQ). The exposure apparatus has a liquid supply mechanism ( | 10-17-2013 |
20140240684 | EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE - An exposure apparatus having a projection system with a final element projects exposure light to an upper surface of a substrate through liquid between the final element and the substrate upper surface. A liquid confinement member has a recovery outlet via which the liquid is removed along with gas, the recovery outlet being arranged such that the substrate upper surface faces the recovery outlet, the recovery outlet surrounding a path of the exposure light and the liquid confinement member confining the liquid to an area that is smaller than an area of the substrate upper surface by removing the liquid from a gap between the confinement member and the substrate upper surface. A first support member supports the projection system, and a second support member supports the liquid confinement member. An anti-vibration system limits vibrations from being transmitted from the second support member to the projection system. | 08-28-2014 |