Yanagida, Tokyo
Akihito Yanagida, Tokyo JP
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20100005815 | Liquid discharge method and liquid discharger in temperature controlller - There is disclosed a liquid discharge method in a temperature controller having a refrigerant circulation line circulating a refrigerant to a target of temperature control and a heater heating the target, wherein the refrigerant is circulated so as to control the temperature of the target with the refrigerant and the heater in the case where the temperature of the target is controlled to be a first temperature lower than or equal to a room temperature, wherein the circulation of the refrigerant is stopped so as to control the temperature of the target with the heater in the case where the temperature of the target is controlled to be a second temperature higher than the room temperature, wherein in the case of changing the setpoint of the target from the first temperature to the second temperature, when the temperature of the refrigerant rises to reach a first predetermined temperature lower than or equal to the boiling point of the refrigerant, the circulation of the refrigerant is stopped, one of air and an inert gas is fed to the refrigerant circulation line so as to discharge the refrigerant in the target, and simultaneously, the temperature of the target continues to be raised with the heater; and when the temperature of the target rises to reach a second predetermined temperature higher than the boiling point of the refrigerant, the one of the air and the inert gas is again fed to the refrigerant circulation line so as to discharge the refrigerant remaining in the target. | 01-14-2010 |
Atsushi Yanagida, Tokyo JP
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20130011856 | CARTRIDGE FOR AUTOMATIC MEASUREMENT AND MEASURING DEVICE USING THE SAME - An object of the present invention is to provide a cartridge for automatic measurement used in an automatic measuring device, capable of automatically performing measurement including heat treatment of a sample, and a measuring device using the cartridge. | 01-10-2013 |
Hiroyuki Yanagida, Tokyo JP
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20090255078 | Cleaning Implement - A cleaning implement | 10-15-2009 |
Keiichiro Yanagida, Tokyo JP
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20110134263 | IMAGING APPARATUS, IMAGE PROCESSING APPARATUS, AND IMAGE PROCESSING METHOD - According to one embodiment, an imaging apparatus includes an imaging unit, a focusing quantity calculating unit, a detail compensation amount calculating unit, and a detail adding unit. The focusing quantity calculating unit calculates a focusing quantity for every position in the subject image from a detail component. The compensation amount calculating unit calculates the detail compensation amount from the focusing quantity. The detail adding unit adds the detail component, which is compensated according to the detail compensation amount, to a low-frequency component of the image data. | 06-09-2011 |
20110273583 | IMAGE PROCESSING APPARATUS, CAMERA MODULE AND ELECTRONIC DEVICE - According to one embodiment, a false color mask signal generation circuit generates a false color pixel mask signal to exclude false color component pixels based on an edge component signal from an edge component extraction circuit. A white balance gain calculation circuit calculates a white balance gain from an integrated value calculated by the false color component pixels being excluded based on the false color pixel mask signal. | 11-10-2011 |
20120147211 | AUTO WHITE BALANCE ADJUSTMENT SYSTEM, AUTO WHITE BALANCE ADJUSTMENT METHOD, AND CAMERA MODULE - According to one embodiment, an auto white balance adjustment system includes a first color judgment gate generation unit and a second color judgment gate generation unit. The second color judgment gate generation unit defines a color-temperature range subject to a white balance adjustment for each light source. The color judgment gate switch unit switches between the first color judgment gate and the second color judgment gate, as a reference for selecting pixel data used for calculating the white balance gain. | 06-14-2012 |
20120288144 | IMAGE PROCESSING APPARATUS, IMAGE PROCESSING METHOD, AND MOTION DETECTION SYSTEM - According to one embodiment, an image processing apparatus includes an integrator and a motion determination unit. The motion determination unit determines movement of an object. The integrator integrates information on a first frame in a unit domain in the image of each frame, and integrates information on a second frame while inverting a sign of a signal level in the integration of the first frame. The motion determination unit makes the motion determination in the unit domain according to the integration result of the integrator. | 11-15-2012 |
20130155274 | AUTO WHITE BALANCE ADJUSTMENT SYSTEM, AUTO WHITE BALANCE ADJUSTMENT METHOD, AND CAMERA MODULE - According to one embodiment, a white balance fine adjustment starting instruction unit determines whether to start fine adjustment in white balance using a first threshold value. The white balance fine adjustment starting instruction unit determines whether to keep on performing the fine adjustment using a second threshold value. The second threshold value is set for the fine adjustment based on a second color judgment gate. The second color judgment gate defines the range of a target color temperature in white balance adjustment for each light source. | 06-20-2013 |
Koichiro Yanagida, Tokyo JP
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20110166326 | FILTRATION METHOD - Provided is a filtration method for the step of removing viruses in a process of producing a protein preparation during which an intermediate protein preparation with a high protein concentration flows at high pressure to a virus removal filter. The filtration method employs a virus removal filter which has a close fitting nozzle of which the inlet at least has a pressure resistance of 600 kPa or more, and an effective area of the virus removal membrane of at least 0.0001 m | 07-07-2011 |
Mitsuaki Yanagida, Tokyo JP
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20080216658 | Wet-type electrostatic precipitator - The present invention provides a wet-type electrostatic precipitator that can prevent the corrosion of a discharge electrode even if a gas to be treated containing a corrosive mist is treated. In a wet-type electrostatic precipitator having a discharge electrode | 09-11-2008 |
20080216659 | Water-flowing mechanism of wet type electrostatic precipitator - The present invention provides a water-flowing mechanism in a wet type electrostatic precipitator that can stably and quickly form a water film on a dust-collecting plate even at the beginning of the operation and that has an excellent adjusting function of a supplying flow-rate of washing liquid. The present invention includes a dust-collecting plate, a washing liquid supplying source to wet the dust-collecting plate, and a cylindrical member that is opened according to the shape of the upper end face of the dust-collecting plate and into which the washing liquid supplying source is inserted, wherein the horizontal cross-section of the dust-collecting plate is formed in a corrugated shape, and the lower opening of the cylindrical member is formed in a corrugated shape according to the dust-collecting plate. | 09-11-2008 |
20100058929 | Electric dust collector, discharge electrode, method for producing the discharge electrode, and method for producing discharge needle - To improve anti-corrosion property in a wet-type electric dust collector while ensuring discharge function. | 03-11-2010 |
Shigeki Yanagida, Tokyo JP
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20120280167 | FERRITE MAGNETIC MATERIAL, FERRITE MAGNET, AND FERRITE SINTERED MAGNET - A ferrite magnet and a ferrite sintered magnet including a ferrite magnetic material are provided. A main phase of the ferrite magnetic material includes a ferrite phase having a hexagonal crystal structure, and metal element composition expressed by Ca1-w-x-yR wSr xBayFezMm wherein 0.2511-08-2012 | |
20140097378 | FERRITE MAGNETIC MATERIAL, FERRITE MAGNET, AND FERRITE SINTERED MAGNET - A ferrite magnet and a ferrite sintered magnet including a ferrite magnetic material are provided. A main phase of the ferrite magnetic material includes a ferrite phase having a hexagonal crystal structure, and metal element composition expressed by Ca1-w-x-yR wSr xBayFezMm wherein 0.2504-10-2014 | |
Takatsune Yanagida, Tokyo JP
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20090186168 | Polycarbonate Resin Film and Manufacturing Process Thereof - A polycarbonate resin film which has an average thickness of 10 to 150 μm, a thickness nonuniformity of 2% or less, a retardation R(589) in the plane of the film measured at a wavelength of 589 nm of 12 nm or less, a retardation Rth(589) in the thickness direction of the film measured at a wavelength of 589 nm of 35 nm or less and is used for optical purposes. | 07-23-2009 |
Tomoaki Yanagida, Tokyo JP
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20100093970 | PROCESS OF PRODUCING PLASTIC LENS AND PLASTIC LENS - A process of producing a plastic lens having a high refractive index, a high Abbe's number and good mechanical strength and a plastic lens obtained by that process. A process of producing a plastic lens including a step of polymerizing a mixture of (1) a prepolymer obtained by mixing and reacting from 0.1% by weight to 10% by weight, based on the whole amount of the mixture, of sulfur and an epithio group-containing compound, (2) a polyisocyanate compound, and (3) a polythiol compound; and a plastic lens obtained by this process. | 04-15-2010 |
Toshiharu Yanagida, Tokyo JP
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20100159645 | SEMICONDUCTOR APPARATUS AND PROCESS OF PRODUCTION THEREOF - A method of producing a semiconductor apparatus, the method including forming metal ball bumps in direct contact with a circuit pattern of a semiconductor device, forming a resin film to seal spaces between the metal ball bumps, cleaning the surfaces of the metal ball bumps projecting out from the resin film using plasma cleaning by removing components inviting a rise in a connection resistance and a decline in a joint strength, forming eutectic solder layers different in composition from the metal ball bumps on the surfaces of the metal ball bumps, cutting the semiconductor substrate into unit semiconductor chips, and mounting at least one of the chips on a mounting board from a bump forming surface side of the chip so as to connect the eutectic solder layers to the mounting board with the resin film directly contacting the chip and not directly contacting the mounting board. | 06-24-2010 |
Toshiro Yanagida, Tokyo JP
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20090113592 | Shock absorber for sports - A shock absorber for sports (ballgames) | 05-07-2009 |
Yohei Yanagida, Tokyo JP
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20140015049 | SEMICONDUCTOR DEVICE - An LDMOSFET includes a semiconductor substrate having a first semiconductor region formed of a feeding region of a first conduction type at a position where a field oxide film is not present on a surface layer of a semiconductor region in which the field oxide film is selectively formed, and a second semiconductor region formed of a well region of a second conduction type which is an opposite conduction type, and feeding regions of the first and second conduction types formed on an upper layer of the well region, and a gate electrode that faces the well region through a gate oxide film. The feeding region is formed at a distance from the field oxide film in an end portion in a longitudinal direction, and desirably the feeding region is intermittently formed at given intervals in the longitudinal direction, and the feeding region is applied to the first semiconductor region. | 01-16-2014 |
Youhei Yanagida, Tokyo JP
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20140284714 | SEMICONDUCTOR DEVICE - Disclosed is a semiconductor device that includes a first MOS transistor having a predetermined size and a second MOS transistor having a lager size than the first MOS transistor. The first MOS transistor is divided into two or more sections, each paired with a corresponding section of the second MOS transistor to form a unit cell. As the unit cell is cyclically formed on a substrate, the current mirror ratio between the total size of the first MOS transistor and the total size of the second MOS transistor remains unaffected by the nonuniformity of position-dependent temperature distribution. | 09-25-2014 |
20150028385 | LATERAL BIPOLAR TRANSISTOR AND ITS MANUFACTURING METHOD - The disclosed lateral bipolar transistor is manufactured by a manufacturing process of self-alignedly implanting an impurity to a gate electrode and thermally diffusing the impurity to form a base layer and an emitter layer. The gate electrode is utilized as an independent fourth terminal in addition to base, emitter, and collector terminals, whereby hfe can be controlled and enhanced by a gate potential. Accordingly, the present invention can provide a bipolar transistor that is hardly affected by a manufacturing variation, or that can be corrected by the gate terminal, and that has a high gain. | 01-29-2015 |
20150041883 | SEMICONDUCTOR DEVICE - An object of the present invention is to improve the ESD resistance of an electrostatic protection element. | 02-12-2015 |