Patent application number | Description | Published |
20090091736 | CALCULATION METHOD, GENERATION METHOD, PROGRAM, EXPOSURE METHOD, AND MASK FABRICATION METHOD - The present invention provides a calculation method of calculating, by a computer, a light intensity distribution formed on an image plane of a projection optical system, comprising a step of dividing an effective light source formed on a pupil plane of the projection optical system into a plurality of point sources, a step of shifting a pupil function describing a pupil of the projection optical system for each of the plurality of point sources in accordance with positions thereof, thereby generating a plurality of shifted pupil functions, a step of defining a matrix including the plurality of pupil functions, a step of performing singular value decomposition of the matrix, thereby calculating an eigenvalue and an eigenfunction, and a step of calculating the light intensity distribution, based on a distribution of the light diffracted by the pattern of the mask, and the eigenvalue and the eigenfunction. | 04-09-2009 |
20090168075 | MEASUREMENT METHOD, A MEASUREMENT APPARATUS, AND A COMPUTER-READABLE RECORDING MEDIUM - A measurement method for measuring a shape of a target using an interference pattern includes the steps of converting a first interference pattern into a first shape of the target (S | 07-02-2009 |
20090296101 | MEASUREMENT METHOD - A measurement method of the present invention is a measurement method for measuring a shape of a target T from an interference pattern generated by interference between a reflected light of the target and a reference spherical surface. The measurement method includes a first measurement step which positions the target T in a first region | 12-03-2009 |
20100037199 | RECORDING MEDIUM STORING ORIGINAL DATA GENERATION PROGRAM, ORIGINAL DATA GENERATION METHOD, ORIGINAL FABRICATING METHOD, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD - To calculate data of an original, a computer is caused to execute the following steps of converting data regarding an intended pattern to be formed on a substrate into frequency-domain data, calculating a two-dimensional transmission cross coefficient using a function representing an effective light source that an illumination device forms on a pupil plane of a projection optical system when the original is absent on an object plane of the projection optical system and using a pupil function of the projection optical system, calculating a diffracted light distribution from a pattern that is formed on the object plane using both the frequency-domain data and data of at least one component of the calculated two-dimensional transmission cross coefficient, and converting data of the calculated diffracted light distribution into spatial-domain data to determine the data of the original. | 02-11-2010 |
20100053580 | COMPUTER READABLE MEDIUM AND EXPOSURE METHOD - A computer readable medium containing computer-executable instructions which cause a computer to execute processing steps that calculate a light intensity distribution formed on an image plane of a projection optical system. When executed, the medium causes a computer to execute the steps of dividing an effective light source into the plurality of areas, generating, for each of the plurality of areas, a plurality of shifted pupil functions by shifting a pupil function in accordance with a position of each of divided point sources, defining, for each of the plurality of areas, a matrix including the plurality of pupil functions, calculating, for each of the plurality of areas, eigenvalues and eigenfunctions by performing singular value decomposition of the matrix, and calculating, for each of the plurality of areas, the light intensity distribution based on a diffracted light distribution from the mask and the eigenvalues and the eigenfunctions. | 03-04-2010 |
20100178621 | DETERMINATION METHOD, EXPOSURE METHOD, DEVICE FABRICATION METHOD, AND STORAGE MEDIUM - The present invention provides a method of determining a structure of an antireflection coating formed on a substrate as an exposure target of an exposure apparatus, the method comprising steps of calculating, an intensity distribution of light diffracted by an original, based on information of an effective light source formed on a pupil plane of a projection optical system, and information of an original pattern, extracting diffracted light having an intensity of not less than a threshold from the intensity distribution calculated in the calculating step, and determining the structure of the antireflection coating, formed on the substrate, such that a reflectance of the antireflection coating falls within a target range when an incident angle of the diffracted light, which has the intensity of not less than the threshold and is extracted in the extracting step, on the antireflection coating formed on the substrate is an input. | 07-15-2010 |
20120019805 | CALCULATION METHOD, GENERATION METHOD, PROGRAM, EXPOSURE METHOD, AND MASK FABRICATION METHOD - The present invention provides a calculation method of calculating, by a computer, a light intensity distribution formed on an image plane of a projection optical system, comprising a step of dividing an effective light source formed on a pupil plane of the projection optical system into a plurality of point sources, a step of shifting a pupil function describing a pupil of the projection optical system for each of the plurality of point sources in accordance with positions thereof, thereby generating a plurality of shifted pupil functions, a step of defining a matrix including the plurality of pupil functions, a step of performing singular value decomposition of the matrix, thereby calculating an eigenvalue and an eigenfunction, and a step of calculating the light intensity distribution, based on a distribution of the light diffracted by the pattern of the mask, and the eigenvalue and the eigenfunction. | 01-26-2012 |
20140071261 | ABERRATION ESTIMATING METHOD, PROGRAM, AND IMAGE-PICKUP APPARATUS - An aberration estimating method using a steepest descent method is configured to estimate, as an aberration of a test optical system, an aberration when a predetermined evaluation function becomes less than or equal to a permissible value. The aberration estimating method comprising the step of updating the aberration with a sum of a current aberration and a first derivative of the evaluation function by the aberration when the evaluation function is larger than the permissible value. The aberration is an aberration of an entire pupil plane of the test optical system. The updating step includes calculating the first derivative by Fourier-transforming the difference instead of an integration at coordinates of respective points on an image plane of the test optical system. | 03-13-2014 |
20150070669 | CALCULATION METHOD, GENERATION METHOD, PROGRAM, EXPOSURE METHOD, AND MASK FABRICATION METHOD - A generation method of generating, by a computer, data of a pattern of a mask used for an exposure apparatus including a projection optical system. The method includes dividing an effective light source formed on a pupil plane of the projection optical system into a plurality of point sources; generating a plurality of shifted pupil functions by shifting a pupil function corresponding to each of the plurality of point sources by a shift amount in accordance with a position of each point source; defining a matrix by arranging each of the plurality of shifted pupil functions in each row or each column of the matrix; calculating an eigenvalue and an eigenfunction by performing singular value decomposition of the matrix; calculating a map representing, when elements of a target pattern are inserted on an object plane of the projection optical system, an influence the elements inflict on each other. | 03-12-2015 |