Patent application number | Description | Published |
20090314435 | PLASMA PROCESSING UNIT - A plasma processing unit of the present invention includes: a processing chamber having a dielectric wall; and a stage provided in the processing chamber, the stage having a placement surface onto which an object to be processed is placed. An induction plasma is generated in the processing chamber via the dielectric wall. The plasma processing unit is provided with a dielectric member capable of detachably covering at least the placement surface of the stage. | 12-24-2009 |
20100210115 | SUBSTRATE MOUNTING MECHANISM, SUBSTRATE PROCESSING APPARATUS, METHOD FOR SUPPRESSING FILM DEPOSITION ON SUBSTRATE MOUNTING MECHANISM, AND STORAGE MEDIUM - A substrate mounting mechanism on which a target substrate is placed is provided. The substrate mounting mechanism includes a heater plate, which has a substrate mounting surface on which the target substrate is placed and has a heater embedded therein to heat the substrate to a deposition temperature at which a film is deposited. The substrate mounting mechanism also includes a temperature control jacket, which is formed to cover at least a surface of the heater plate other than the substrate mounting surface and adjusts the temperature to a non-deposition temperature below the deposition temperature. | 08-19-2010 |
20120055403 | MOUNTING TABLE STRUCTURE, FILM FORMING APPARATUS AND RAW MATERIAL RECOVERY METHOD - Provided is a mounting table structure for use in forming a thin film on a surface of a target object mounted on the mounting table structure by using a raw material gas including an organic metal compound in a processing chamber. The mounting table structure includes: a mounting table main body which mounts thereon the target object and has therein a heater; and a base which supports the mounting table main body while surrounding a side surface and a bottom surface of the mounting table main body, the base having therein a coolant path where a coolant flows therethrough and being maintained at a temperature higher than the solidification temperature or the liquefaction temperature of the raw material gas, but lower than the decomposition temperature of the raw material gas. | 03-08-2012 |
20120199573 | SUBSTRATE MOUNTING MECHANISM, AND SUBSTRATE PROCESSING - A substrate mounting mechanism on which a target substrate is placed is provided. The substrate mounting mechanism includes a heater plate, which has a substrate mounting surface on which the target substrate is placed and has a heater embedded therein to heat the substrate to a deposition temperature at which a film is deposited. The substrate mounting mechanism also includes a temperature control jacket, which is formed to cover at least a surface of the heater plate other than the substrate mounting surface and adjusts the temperature to a non-deposition temperature below the deposition temperature. | 08-09-2012 |
Patent application number | Description | Published |
20080231301 | INSPECTION APPARATUS - An inspection apparatus includes a mounting table movable in X and Y directions and an alignment mechanism which performs an alignment of a target object placed on the mounting table. Further, the alignment mechanism includes an image pickup device which is movable in either one of the X and Y directions and is capable of being stopped at a desired position and a controller for performing a preliminary alignment of the target object by moving the image pickup device and the mounting table in respectively movable directions. | 09-25-2008 |
20080290886 | PROBE APPARATUS - A prove apparatus includes a first and a second loading port for mounting therein two carriers facing each other, a wafer transfer mechanism having a rotation center between the loading ports, and a first and a second inspection unit being symmetrical to each other and disposed in accordance with the arrangement of the loading ports. In this configuration, wafers are directly transferred between the carrier and a wafer chuck of the inspection unit by the wafer transfer mechanism. The wafer transfer mechanism has three arms for unloading two wafers from the carrier. The prove apparatus has a compact size and achieves a high throughput. | 11-27-2008 |
20090058446 | INSPECTION APPARATUS AND INSPECTION METHOD - An inspection apparatus for inspecting electric characteristics of a plurality of devices formed on a target object includes a vertical drive mechanism for lifting and lowering a movable mounting table and a control unit for controlling the vertical drive mechanism. The vertical drive mechanism includes an elevation shaft connected to the mounting table and a servo motor for driving the elevation shaft to lift and lower the mounting table. Further, the control unit has a servo driver which includes a position control part for controlling a position of the servo motor, a torque control part for controlling a torque of the servo motor as a probe card is expanded or contracted by a change in temperature and a switching part for switching the position control part and the torque control part. | 03-05-2009 |
20090085594 | PROBE APPARATUS AND PROBING METHOD - A probe apparatus includes an imaging unit imaging probes and a first and a second imaging unit imaging the wafer surface. The apparatus further includes a control unit obtaining positions of a mounting table at which focuses of the imaging unit and the first imaging unit are made to coincide with each other and then the focuses of the image unit and the second imaging unit are made to coincide with each other by moving the mounting table; obtaining positions of the mounting table at which the images of the wafer are sequentially taken by the first and the second imaging unit by moving the mounting table; obtaining a position of the mounting table at which the probes are imaged by the imaging unit, and calculating a position of the mounting table at which the wafer contacts with the probes based on the obtained positions of the mounting table. | 04-02-2009 |
20090096475 | TEST DEVICE - A test device includes a movable mounting table having a temperature controlling mechanism therein; a probe card provided with a plurality of probes positioned above the mounting table; and a first temperature control unit for controlling the temperature controlling mechanism so that a target object on the mounting table can be heated to a predetermined temperature to test electrical characteristics of the target object. The mounting table is provided with a heater facing a plurality of probes protruding from the mounting table in the high-temperature test on the target object. | 04-16-2009 |
20110309849 | INSPECTION METHOD FOR INSPECTING ELECTRIC CHARACTERISTICS OF DEVICES FORMED ON TARGET OBJECT - An inspection method for inspecting electric characteristics of devices formed on a target object using an apparatus including a vertical drive mechanism for lifting and lowering a movable mounting table and a control unit for controlling the vertical drive mechanism. The vertical drive mechanism includes an elevation shaft connected to the mounting table and a servo motor for driving the elevation shaft to lift and lower the mounting table. The control unit has a servo driver including a position control part for controlling a position of the motor, a torque control part for controlling a torque of the motor as a probe card is expanded or contracted by a change in temperature and a switching part for switching the position control part and the torque control part. The method includes heating or cooling the target object, controlling a position of the motor, and controlling a torque of the motor. | 12-22-2011 |