Patent application number | Description | Published |
20130014834 | DRAINAGE DEVICE FOR CLOSED CHAMBER CONTAINING LIQUIDAANM YANG; MING-LUAACI Tu-ChengAACO TWAAGP YANG; MING-LU Tu-Cheng TWAANM ZHANG; YA-DONGAACI Shenzhen CityAACO CNAAGP ZHANG; YA-DONG Shenzhen City CNAANM ZHANG; TIAN-ENAACI Shenzhen CityAACO CNAAGP ZHANG; TIAN-EN Shenzhen City CNAANM LI; YUEAACI Shenzhen CityAACO CNAAGP LI; YUE Shenzhen City CN - A drainage device for draining liquid out of a closed chamber includes an air cylinder, a driving assembly, a first channel, a second channel, a first sealing assembly, a second sealing assembly, and a controller. The air cylinder includes a main body defining a receiving chamber, an action piston positioned in the receiving chamber of the main body, and a connecting rod connected to the action piston. The main body defines a liquid inlet and a liquid outlet, both of which communicate with the receiving chamber, and the presence of a fixed piston with a seal in each of the inlet and outlet creates a double-acting one-way valve when the action piston is moved up and down. | 01-17-2013 |
20130015116 | DRAINAGE DEVICE FOR CLOSED CHAMBER CONTAINING LIQUIDAANM YANG; MING-LUAACI Tu-ChengAACO TWAAGP YANG; MING-LU Tu-Cheng TWAANM ZHANG; YA-DONGAACI Shenzhen CityAACO CNAAGP ZHANG; YA-DONG Shenzhen City CNAANM DU; GAO-FENGAACI Shenzhen CityAACO CNAAGP DU; GAO-FENG Shenzhen City CNAANM LI; YUEAACI Shenzhen CityAACO CNAAGP LI; YUE Shenzhen City CN - A drainage device for draining liquid out of a closed chamber includes a main body, a piston assembly, and a transmission assembly. The main body defines a receiving chamber and a liquid inlet communicating with the receiving chamber to the closed chamber. The piston assembly is fixed in the receiving chamber of the main body. The transmission assembly is partially received in the receiving chamber. The transmission assembly and the piston assembly cooperatively separate the receiving chamber to a first chamber adjacent to the liquid inlet and a second chamber away from the liquid inlet. The transmission assembly is slidably received in the receiving chamber, thereby causing air pressure differences between the first chamber and the second chamber, to pump the liquid from the closed chamber to the second chamber. The main body further defines a plurality of discharge holes for draining liquid out of the second chamber. | 01-17-2013 |
20130015117 | DRAINAGE DEVICE FOR CLOSED CHAMBER CONTAINING LIQUIDAANM YANG; MING-LUAACI Tu-ChengAACO TWAAGP YANG; MING-LU Tu-Cheng TWAANM ZHANG; YA-DONGAACI Shenzhen CityAACO CNAAGP ZHANG; YA-DONG Shenzhen City CNAANM ZHANG; TIAN-ENAACI Shenzhen CityAACO CNAAGP ZHANG; TIAN-EN Shenzhen City CNAANM LI; YUEAACI Shenzhen CityAACO CNAAGP LI; YUE Shenzhen City CN - A drainage device includes a closed chamber, a liquid pumping mechanism, and a liquid discharge mechanism. The drainage device can also include a controller. The closed chamber may be filled with liquid and gas for discharge. The liquid pumping mechanism pumps the liquid in the closed chamber, and prevents the liquid in the liquid pumping mechanism from flowing back to the closed chamber. The liquid discharge mechanism discharges the liquid in the liquid pumping mechanism to the outside, and prevents outside air from flowing into the closed chamber. | 01-17-2013 |
20130019800 | WAXING DEVICE - A waxing device is used for applying a waxing treatment to a polishing wheel, and includes a supporting assembly, an adjusting assembly, a driving mechanism, a mounting assembly, a motor, a wax block and a resisting mechanism. The supporting assembly includes a sliding rail, and the adjusting assembly is slidably positioned on the sliding rail; the driving mechanism is mounted on the adjusting assembly; the mounting assembly includes a mounting member positioned on the driving mechanism; the motor is mounted on mounting member; the wax block is positioned on the motor and rotated by the motor; the resisting mechanism is positioned on the supporting assembly and resists the adjusting assembly for adjusting a pressure applied to the polishing wheel during the waxing process. | 01-24-2013 |