Patent application number | Description | Published |
20140306648 | APPARATUS, SYSTEMS, AND METHODS FOR PROVIDING A HYBRID VOLTAGE REGULATOR - The present disclosure shows a hybrid regulator topology that can be more easily integrated and that can maintain high efficiency across a wide output and input voltage range, even with a small inductor. The hybrid regulator topology can include two types of regulators: a flying switched-inductor regulator and a step-down regulator that divides the input voltage into an M/N fraction of the input voltage. The disclosed embodiments of the hybrid regulator topology can reduce the capacitive loss of the flying switched-inductor regulator by limiting the voltage swing across the switches in the flying switched-inductor regulator. The disclosed embodiments of the hybrid regulator topology can reduce the inductor resistive loss of the flying switched-inductor regulator by operating the flying switched-inductor regulator at a high switching frequency and with a small amount of current flow through the inductor. | 10-16-2014 |
20140306673 | APPARATUS, SYSTEMS, AND METHODS FOR PROVIDING A HYBRID POWER REGULATOR - The present disclosure shows a hybrid regulator topology that can be more easily integrated and that can maintain high efficiency across a wide output and input voltage range, even with a small inductor. The hybrid regulator topology can include two types of regulators: a flying switched-inductor regulator and a step-down regulator that divides the input voltage into an M/N fraction of the input voltage. The disclosed embodiments of the hybrid regulator topology can reduce the capacitive loss of the flying switched-inductor regulator by limiting the voltage swing across the switches in the flying switched-inductor regulator. The disclosed embodiments of the hybrid regulator topology can reduce the inductor resistive loss of the flying switched-inductor regulator by operating the flying switched-inductor regulator at a high switching frequency and with a small amount of current flow through the inductor. | 10-16-2014 |
20150022173 | RECONFIGURABLE POWER REGULATOR - The present disclosure shows ways to use multiple “integrated voltage regulator (IVR) units” to offer IVRs that can cover a wide range of specifications without having to design separate IVRs for different specifications. Instead of designing separate IVRs and paying for separate mask sets for IVRs targeting different specifications (e.g., different design and mask sets for 1 A IVR, 5 A IVR), the disclosed embodiments present ways to design and fabricate large numbers of the same unit IVRs (e.g., 1 A IVR) and decide how many of them to use post-fabrication to deliver different current specifications (e.g., use five 1 A unit IVRs for 5 A, use ten 1 A unit IVRs for 10 A). These disclosed embodiments reduce the mask cost of fabricating IVRs for different specifications and reduce design time by focusing on a single unit IVR. | 01-22-2015 |
20150097538 | FEEDBACK CONTROL IN HYBRID VOLTAGE REGULATORS - The present disclosure includes a feedback system that can control hybrid regulator topologies that have multiple converters or regulators connected in series. The hybrid regulator can include at least two regulators: a switched inductor regulator and a switched-capacitor regulator. The disclosed embodiments of the feedback system can simplify feedback design for the hybrid regulator that can include multiple converter stages. These disclosed embodiments can control the feedback to improve the efficiency of a hybrid regulator. | 04-09-2015 |
Patent application number | Description | Published |
20090238990 | SAM oxidative removal for controlled nanofabrication - Improved tip-patterned atomic layer deposition (ALD) is provided by using a scanning probe microscope (SPM) tip to define an oxide pattern in a self-assembled monolayer deposited on a substrate. The oxide pattern can directly define the ALD deposition pattern. Alternatively, the oxide pattern can be removed (e.g., with a chemical etch), and the resulting exposed substrate pattern can be used to define the ALD deposition pattern. | 09-24-2009 |
20090241232 | Prototyping station for atomic force microscope-assisted deposition of nanostructures - A localized nanostructure growth apparatus that has a partitioned chamber is provided, where a first partition includes a scanning probe microscope (SPM) and a second partition includes an atomic layer deposition (ALD) chamber, where the first partition is hermetically isolated from the second partition, and at least one SPM probe tip of the SPM is disposed proximal to a sample in the ALD chamber. According to the invention, the hermetic isolation between the chambers prevents precursor vapor from damaging critical microscope components and ensuring that contaminants in the ALD chamber can be minimized. | 09-24-2009 |
20090258157 | Field-aided preferential deposition of precursors - Lateral nano-scale pattern control for atomic layer deposition can be provided by using a scanning tunneling microscope (SPM) tip to locally influence chemical reaction rates. An electric field and/or charge transfer can significantly reduce the potential energy barrier that affects reaction kinetics, and thereby significantly enhance reaction rates. By operating the ALD growth system in a regime where reaction rates without an electric field and/or charge transfer are negligible, deposition can be precisely controlled to occur only at locations defined by the SPM tip. Alternatively, the SPM tip can be used to locally inhibit ALD growth. | 10-15-2009 |
20100240167 | Quantum confinement solar cell fabricated by atomic layer deposition - The current invention provides a method of fabricating quantum confinement (QC) in a solar cell that includes using atomic layer deposition (ALD) for providing at least one QC structure embedded into an intrinsic region of a p-i-n diode in the solar cell, where optical and electrical properties of the confinement structure are adjusted according to at least one dimension of the confinement structure. The QC structures can include quantum wells, quantum wires, quantum tubes, and quantum dots. | 09-23-2010 |
20120284882 | Prototyping Station for Atomic Force Microscope-Assisted Deposition of Nanostructures - A localized nanostructure growth apparatus that has a partitioned chamber is provided, where a first partition includes a scanning probe microscope (SPM) and a second partition includes an atomic layer deposition (ALD) chamber, where the first partition is hermetically isolated from the second partition, and at least one SPM probe tip of the SPM is disposed proximal to a sample in the ALD chamber. According to the invention, the hermetic isolation between the chambers prevents precursor vapor from damaging critical microscope components and ensuring that contaminants in the ALD chamber can be minimized. | 11-08-2012 |