Patent application number | Description | Published |
20090304327 | METHOD AND APPARATUS FOR IMPLEMENTING OPTICAL DEFLECTION SWITCHING USING COUPLED RESONATORS - A method of implementing optical deflection switching includes directing a tuning operation at a specific region of coupled optical resonators coupled to an input port, a first output port and a second output port, the coupled optical resonator including a plurality of cascaded unit cells; wherein the tuning operation interrupts a resonant coupling between one or more of the unit cells of the coupled resonators so as to cause an input optical signal from the input port to be directed from the first output port to the second output port. | 12-10-2009 |
20100038736 | SUSPENDED GERMANIUM PHOTODETECTOR FOR SILICON WAVEGUIDE - A vertical stack of a first silicon germanium alloy layer, a second epitaxial silicon layer, a second silicon germanium layer, and a germanium layer are formed epitaxially on a top surface of a first epitaxial silicon layer. The second epitaxial silicon layer, the second silicon germanium layer, and the germanium layer are patterned and encapsulated by a dielectric cap portion, a dielectric spacer, and the first silicon germanium layer. The silicon germanium layer is removed between the first and second silicon layers to form a silicon germanium mesa structure that structurally support an overhanging structure comprising a stack of a silicon portion, a silicon germanium alloy portion, a germanium photodetector, and a dielectric cap portion. The germanium photodetector is suspended by the silicon germanium mesa structure and does not abut a silicon waveguide. Germanium diffusion into the silicon waveguide and defect density in the germanium detector are minimized. | 02-18-2010 |
20100111470 | LOW-LOSS LOW-CROSSTALK INTEGRATED DIGITAL OPTICAL SWITCH - An optical switch includes a plurality of optical interferometric structures is serially connected between at least one optical input node and two optical output nodes. A primary waveguide directly connects an optical input node and a first optical output node. A complementary waveguide, which is directly connected to a second optical output node, is evanescently coupled with the primary waveguide in a pair of optically coupled sections provided in each optical interferometric structure. Each optical interferometric structure also includes a pair of decoupled sections, which includes a primary decoupled section embedding a portion of the primary waveguide and a complementary decoupled section which includes a portion of the complementary waveguide. The complementary decoupled section is embedded in a phase tuning structure that allows modulation of the phase of the optical signal passing through. The optical switch provides less insertion loss, less crosstalk, and wider bandwidth than prior art optical switches. | 05-06-2010 |
20110002576 | Silicide Thermal Heaters for Silicon-on-Insulator Nanophotonic Devices - A thermally switched Silicon-On-Insulator (SOI) photo electronic device includes a silicon layer including an optical waveguide and a silicide heating element horizontally adjacent to the waveguide. The waveguide has a refractive index that changes with heat applied to the waveguide. | 01-06-2011 |
20110143482 | SUSPENDED GERMANIUM PHOTODETECTOR FOR SILICON WAVEGUIDE - A vertical stack of a first silicon germanium alloy layer, a second epitaxial silicon layer, a second silicon germanium layer, and a germanium layer are formed epitaxially on a top surface of a first epitaxial silicon layer. The second epitaxial silicon layer, the second silicon germanium layer, and the germanium layer are patterned and encapsulated by a dielectric cap portion, a dielectric spacer, and the first silicon germanium layer. The silicon germanium layer is removed between the first and second silicon layers to form a silicon germanium mesa structure that structurally support an overhanging structure comprising a stack of a silicon portion, a silicon germanium alloy portion, a germanium photodetector, and a dielectric cap portion. The germanium photodetector is suspended by the silicon germanium mesa structure and does not abut a silicon waveguide. Germanium diffusion into the silicon waveguide and defect density in the germanium detector are minimized. | 06-16-2011 |
20110298561 | LOW DISTORTION HIGH BANDWIDTH ADAPTIVE TRANSMISSION LINE FOR INTEGRATED PHOTONICS APPLICATIONS - A transmission line and method for implementing includes a plurality of segments forming an electrical path and a continuous optical path passing through the segments. Discrete inductors are formed between and connect adjacent segments. The inductors are formed in a plurality of metal layers of an integrated circuit to balance capacitance of an optical modulator which includes the transmission line to achieve a characteristic impedance for the transmission line. | 12-08-2011 |
20120125916 | TEMPERATURE CONTROL DEVICE FOR OPTOELECTRONIC DEVICES - Current may be passed through an n-doped semiconductor region, a recessed metal semiconductor alloy portion, and a p-doped semiconductor region so that the diffusion of majority charge carriers in the doped semiconductor regions transfers heat from or into the semiconductor waveguide through Peltier-Seebeck effect. Further, a temperature control device may be configured to include a metal semiconductor alloy region located in proximity to an optoelectronic device, a first semiconductor region having a p-type doping, and a second semiconductor region having an n-type doping. The temperature of the optoelectronic device may thus be controlled to stabilize the performance of the optoelectronic device. | 05-24-2012 |
20120319805 | LOW DISTORTION HIGH BANDWIDTH ADAPTIVE TRANSMISSION LINE FOR INTEGRATED PHOTONIC APPLICATIONS - A transmission line and method for implementing includes a plurality of segments forming an electrical path and a continuous optical path passing through the segments. Discrete inductors are formed between and connect adjacent segments. The inductors are formed in a plurality of metal layers of an integrated circuit to balance capacitance of an optical modulator which includes the transmission line to achieve a characteristic impedance for the transmission line. | 12-20-2012 |
20130344634 | Double Layer Interleaved P-N Diode Modulator - A method for fabricating an optical modulator includes forming n-type layer, a first oxide portion on a portion of the n-type layer, and a second oxide portion on a second portion of the n-type layer, patterning a first masking layer over the first oxide portion, portions of a planar surface of the n-type layer, and portions of the second oxide portion, implanting p-type dopants in the n-type layer to form a first p-type region and a second p-type region, removing the first masking layer, patterning a second masking layer over the first oxide portion, a portion of the first p-type region, and a portion of the n-type layer, and implanting p-type dopants in exposed portions of the n-type layer, exposed portions of the first p-type region, and regions of the n-type layer and the second p-type region disposed between the substrate and the second oxide portion. | 12-26-2013 |
20140007030 | INTEGRATED DESIGN ENVIRONMENT FOR NANOPHOTONICS | 01-02-2014 |
20140007032 | INTEGRATED DESIGN ENVIRONMENT FOR NANOPHOTONICS | 01-02-2014 |
20140061450 | ELECTRO-OPTIC MODULATOR - A method for controlling an electro-optic modulator device includes measuring a performance metric of the device to define a first measured performance value, and changing a state of a first tuning portion of the device to connect the first tuning portion to ground. | 03-06-2014 |
20140064653 | ELECTRO-OPTIC MODULATOR - An electro-optical modulator device includes an optical signal path partially defined by a waveguide portion, a radio frequency (RF) signal path partially defined by a conductive line portion, an interaction region where an RF signal propagating in the RF signal path interacts with an optical signal propagating in the optical signal path to modulate the optical signal, and a first tuning portion arranged proximate to the conductive line portion, the first tuning portion including a conductive portion and a switch portion operative to connect the conductive portion to ground. | 03-06-2014 |
20140064656 | POLARIZATION DIVERSE DEMULTIPLEXING - A method for demultiplexing an optical signal includes receiving a multi polarization optical signal, separating the multi polarization optical signal into a first polarization optical signal and a second polarization optical signal, rotating a polarization of the first polarization optical signal to match a polarization of the second polarization optical signal, routing the first polarization optical signal and the second polarization optical signal to a common demultiplexing device, outputting a channel of the first polarization optical signal and the second polarization optical signal to a common photodetector. | 03-06-2014 |
20140064729 | POLARIZATION DIVERSE DEMULTIPLEXING - An optical demultiplexing device includes a first portion operative to receive an input optical signal having a first polarization, a second polarization and multiple channels, and split the input optical signal into a first optical signal having the first polarization and a second optical signal having the first polarization, and an optical demultiplexing portion communicatively connected to the polarization splitter portion, the optical demultiplexing portion operative to receive a combination of the first optical signal and the second optical signal, and output each channel of the first optical signal and the second optical signal to a photodetector device corresponding to each channel. | 03-06-2014 |
20140127877 | FABRICATION OF LOCALIZED SOI ON LOCALIZED THICK BOX LATERAL EPITAXIAL REALIGNMENT OF DEPOSITED NON-CRYSTALLINE FILM ON BULK SEMICONDUCTOR SUBSTRATES FOR PHOTONICS DEVICE INTEGRATION - Photonic SOI devices are formed by lateral epitaxy of a deposited non-crystalline semiconductor layer over a localized buried oxide created by a trench isolation process or by thermal oxidation. Specifically, and after forming a trench into a semiconductor substrate, the trench can be filled with an oxide by a deposition process or a thermal oxidation can be performed to form a localized buried oxide within the semiconductor substrate. In some embodiments, the oxide can be recessed to expose sidewall surfaces of the semiconductor substrate. Next, a non-crystalline semiconductor layer is formed and then a solid state crystallization is preformed which forms a localized semiconductor-on-insulator layer. During the solid state crystallization process portions of the non-crystalline semiconductor layer that are adjacent exposed sidewall surfaces of the substrate are crystallized. | 05-08-2014 |
20140127878 | FABRICATION OF LOCALIZED SOI ON LOCALIZED THICK BOX USING SELECTIVE EPITAXY ON BULK SEMICONDUCTOR SUBSTRATES FOR PHOTONICS DEVICE INTEGRATION - Photonic devices are created by laterally growing a semiconductor material (i.e., a localized semiconductor-on-insulator layer) over a localized buried oxide (BOX) created in a semiconductor by either a trench isolation process or thermal oxidation. In one embodiment, and after trench formation in a semiconductor substrate, the trench is filled with oxide to create a localized BOX. The top surface of the BOX is recessed to depth below the topmost surface of the semiconductor substrate to expose sidewall surfaces of the semiconductor substrate within each trench. A semiconductor material is then epitaxially grown from the exposed sidewall surfaces of the semiconductor substrate. | 05-08-2014 |
20140197507 | BURIED WAVEGUIDE PHOTODETECTOR - A method of forming an integrated photonic semiconductor structure having a photodetector and a CMOS device may include forming the CMOS device on a first silicon-on-insulator region, forming a silicon optical waveguide on a second silicon-on-insulator region, and forming a shallow trench isolation (STI) region surrounding the silicon optical waveguide such that the shallow trench isolation electrically isolating the first and second silicon-on-insulator region. Within a first region of the STI region, a first germanium material is deposited adjacent a first side wall of the semiconductor optical waveguide. Within a second region of the STI region, a second germanium material is deposited adjacent a second side wall of the semiconductor optical waveguide, whereby the second side wall opposes the first side wall. The first and second germanium material form an active region that evanescently receives propagating optical signals from the first and second side wall of the semiconductor optical waveguide. | 07-17-2014 |
20140270622 | MATERIAL STRUCTURES FOR FRONT-END OF THE LINE INTEGRATION OF OPTICAL POLARIZATION SPLITTERS AND ROTATORS - A polarization splitter and rotator of a wafer chip, an opto-electronic device and method of use is disclosed. The first waveguide of the wafer chip is configured to receive an optical signal from an optical device and propagate a transverse electric eigenstate of the received optical signal. The second waveguide is configured to receive a transverse magnetic eigenstate of the received optical signal from the first waveguide. The second waveguide includes a splitter end, a middle section and a rotator end, wherein the splitter end includes a layer of polycrystalline silicon, a layer of silicon oxide and a layer of silicon nitride, the rotated end includes a layer single crystal silicon, a layer silicon oxide and a layer of silicon nitride, and the middle section includes layers of single crystal silicon, silicon oxide polycrystalline silicon and silicon nitride. | 09-18-2014 |
20140270628 | MATERIAL STRUCTURES FOR FRONT-END OF THE LINE INTEGRATION OF OPTICAL POLARIZATION SPLITTERS AND ROTATORS - A polarization splitter and rotator of a wafer chip, an opto-electronic device and method of use is disclosed. The first waveguide of the wafer chip is configured to receive an optical signal from an optical device and propagate a transverse electric eigenstate of the received optical signal. The second waveguide is configured to receive a transverse magnetic eigenstate of the received optical signal from the first waveguide. The second waveguide includes a splitter end, a middle section and a rotator end, wherein the splitter end includes a layer of polycrystalline silicon, a layer of silicon oxide and a layer of silicon nitride, the rotated end includes a layer single crystal silicon, a layer silicon oxide and a layer of silicon nitride, and the middle section includes layers of single crystal silicon, silicon oxide polycrystalline silicon and silicon nitride. | 09-18-2014 |
20140312443 | BUTT-COUPLED BURIED WAVEGUIDE PHOTODETECTOR - A method of forming an integrated photonic semiconductor structure having a photodetector and a CMOS device may include forming the CMOS device on a first silicon-on-insulator region, forming a silicon optical waveguide on a second silicon-on-insulator region, and forming a shallow trench isolation (STI) region surrounding the silicon optical waveguide such that the shallow trench isolation electrically isolates the first and second silicon-on-insulator region. Within the STI region, a germanium material is deposited adjacent an end facet of the semiconductor optical waveguide. The germanium material forms an active region that receives propagating optical signals from the end facet of the semiconductor optical waveguide. | 10-23-2014 |