Patent application number | Description | Published |
20130209645 | CONFECTIONERY PRODUCTS CONTAINING TEXTURING AGENTS - The present invention relates to a confectionery product containing 60 to 90% w/w polydextrose an edible acid selected from the group malic acid, lactic acid, acetic acid and mixtures of two or more thereof, and at least two texturing agents, preferably gelatin and xanthan gum or locust bean gum. More preferably the gummy confectionery product is comprising polydextrose, edible acid selected from the group malic acid, lactic acid, acetic acid and mixtures of two or more thereof, gelatin, xanthan gum, locust bean gum and stevia. | 08-15-2013 |
20140322419 | CONFECTIONERY PRODUCTS CONTAINING TEXTURING AGENTS - The present invention relates to a confectionery product containing 60 to 90% w/w polydextrose and at least two texturing agents, preferably gelatin and xanthan gum and/or locust bean gum. More preferably the gummy confectionery product comprises polydextrose, gelatin, xanthan gum, locust bean gum and stevia. | 10-30-2014 |
Patent application number | Description | Published |
20090262325 | Positioning System, Lithographic Apparatus and Device Manufacturing Method - A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to a balance mass constructed and arranged to absorb a reaction force of the first actuator. The controller and second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the balance mass. | 10-22-2009 |
20100002207 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber. | 01-07-2010 |
20100149516 | Lithographic Apparatus and A Method to Compensate for the Effect of Disturbances on the Projection System of a Lithographic Apparatus - Embodiments of the invention provide a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, an active air mount to support the projection system, the active air mount including at least one actuator, and a feed-forward device, the feed-forward device being configured to provide on the basis of a set-point signal of a movable object, a feed-forward signal to the at least one actuator, wherein the feed-forward signal is designed to decrease a disturbance effect on the projection system due to movement of the movable object. | 06-17-2010 |
20140333915 | Radiation Source - A radiation source (SO) suitable for providing a beam of radiation to an illuminator of a lithographic apparatus. The radiation source comprises a nozzle ( | 11-13-2014 |