Whitener, US
Benjamin G. Whitener, Newton, NC US
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20130223808 | CABLE CLAMP ASSEMBLY AND METHOD FOR A FLAT FIBER OPTIC CABLE - A cable clamp assembly and a cable clamp method for a flat fiber optic cable are disclosed. The assembly includes a wedge-shaped outer shell with a bottom wall having a friction inner surface with a longitudinal central recess formed therein. The flat fiber optic cable resides within the interior of the outer shell and is supported by the friction inner surface. A shim having two parallel rows of protrusions fits within the interior of the outer shell with the protrusions being in contact with the fiber optic cable. The assembly includes a wedge insert having two outer ridges that substantially align with the two rows of protrusions. When the wedge insert matingly engages the outer shell, the outer ridges press down on the protrusions, which in turn press down on the fiber optic cable mainly at the locations where longitudinal dielectric strength members reside. | 08-29-2013 |
Benjamin Gray Whitener, Newton, NC US
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20150160424 | BRANCH DISTRIBUTION CABLE CONNECTORIZATION SYSTEM - An optic fiber branch distribution cable and system is provided. The branch distribution cable is pre-connectorized. The pre-connectorized branch distribution cable is configured for use in outdoor optical network installations. The branch distribution cable includes a pre-formed, head-end connectorized access point and a pre-formed, rear-end connectorized access point. Each access point includes one or more optical fiber tethers optically coupled at one end to an optical fiber of branch distribution cable and each includes an optical connector at the other end of the tether. | 06-11-2015 |
Glenn Whitener, Batavia, IL US
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20130072021 | COMPOSITION AND METHOD FOR POLISHING ALUMINUM SEMICONDUCTOR SUBSTRATES - The invention provides a chemical-mechanical polishing composition comprising coated α-alumina particles, an organic carboxylic acid, and water. The invention also provides a chemical-mechanical polishing composition comprising an abrasive having a negative zeta potential in the polishing composition, an organic carboxylic acid, at least one alkyldiphenyloxide disulfonate surfactant, and water, wherein the polishing composition does not further comprise a heterocyclic compound. The abrasive is colloidally stable in the polishing composition. The invention further provides methods of polishing a substrate with the aforesaid polishing compositions. | 03-21-2013 |
20130244433 | CMP COMPOSITIONS SELECTIVE FOR OXIDE AND NITRIDE WITH HIGH REMOVAL RATE AND LOW DEFECTIVITY - The invention provides a chemical-mechanical polishing composition containing a ceria abrasive, one or more nonionic polymers, optionally one or more phosphonic acids, optionally one or more nitrogen-containing zwitterionic compounds, optionally one or more sulfonic acid copolymers, optionally one or more anionic copolymers, optionally one or more polymers comprising quaternary amines, optionally one or more compounds that adjust the pH of the polishing compositions, water, and optionally one or more additives. The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrate contains silicon oxide, silicon nitride, and/or polysilicon. | 09-19-2013 |
20140024216 | GST CMP SLURRIES - The present invention provides chemical-mechanical polishing (CMP) compositions suitable for polishing a substrate comprising a germanium-antimony-tellurium (GST) alloy. The CMP compositions of the present invention are aqueous slurries comprising a particulate abrasive, a water-soluble surface active agent, a complexing agent, and a corrosion inhibitor. The ionic character of the surface active material (e.g., cationic, anionic, or nonionic) is selected based on the zeta potential of the particulate abrasive. A CMP method for polishing a GST alloy-containing substrate utilizing the composition is also disclosed. | 01-23-2014 |
20140103250 | COMPOSITION AND METHOD FOR POLISHING ALUMINUM SEMICONDUCTOR SUBSTRATES - The invention provides a chemical-mechanical polishing composition comprising coated α-alumina particles, an organic carboxylic acid, and water. The invention also provides a chemical-mechanical polishing composition comprising an abrasive having a negative zeta potential in the polishing composition, an organic carboxylic acid, at least one alkyls disulfonate surfactant, and water, wherein the polishing composition does not further comprise a heterocyclic compound. The abrasive is colloidally stable in the polishing composition. The invention further provides methods of polishing a substrate with the aforesaid polishing compositions. | 04-17-2014 |
20150259572 | COMPOSITION FOR TUNGSTEN CMP - A chemical mechanical polishing composition for polishing a substrate having a tungsten layer includes a water based liquid carrier, a colloidal silica abrasive dispersed in the liquid carrier and having a permanent positive charge of at least 6 mV, an amine compound in solution in the liquid carrier, and an iron containing accelerator. A method for chemical mechanical polishing a substrate including a tungsten layer includes contacting the substrate with the above described polishing composition, moving the polishing composition relative to the substrate, and abrading the substrate to remove a portion of the tungsten from the substrate and thereby polish the substrate. | 09-17-2015 |
20150259573 | COMPOSITION FOR TUNGSTEN CMP - A chemical mechanical polishing composition for polishing a substrate having a tungsten layer includes a water based liquid carrier, a colloidal silica abrasive dispersed in the liquid carrier and having a permanent positive charge of at least 6 mV, and a polycationic amine compound in solution in the liquid carrier. A method for chemical mechanical polishing a substrate including a tungsten layer includes contacting the substrate with the above described polishing composition, moving the polishing composition relative to the substrate, and abrading the substrate to remove a portion of the tungsten from the substrate and thereby polish the substrate. | 09-17-2015 |
20150259574 | COMPOSITION FOR TUNGSTEN CMP - A chemical mechanical polishing composition for polishing a substrate having a tungsten layer includes a water based liquid carrier, a colloidal silica abrasive dispersed in the liquid carrier and having a permanent positive charge of at least 6 mV, an amine containing polymer in solution in the liquid carrier, and an iron containing accelerator. A method for chemical mechanical polishing a substrate including a tungsten layer includes contacting the substrate with the above described polishing composition, moving the polishing composition relative to the substrate, and abrading the substrate to remove a portion of the tungsten from the substrate and thereby polish the substrate. | 09-17-2015 |
20150267083 | MIXED ABRASIVE TUNGSTEN CMP COMPOSITION - A chemical mechanical polishing composition for polishing a substrate having a tungsten layer includes a water based liquid carrier, first and second colloidal silica abrasives dispersed in the liquid carrier, and an iron containing accelerator. The first colloidal silica abrasive and the second colloidal silica abrasive each have a permanent positive charge of at least 10 mV. An average particle size of the second silica abrasive is at least 20 nanometers greater than an average particle size of the first silica abrasive. A method for chemical mechanical polishing a substrate including a tungsten layer is further disclosed. The method may include contacting the substrate with the above described polishing composition, moving the polishing composition relative to the substrate, and abrading the substrate to remove a portion of the tungsten from the substrate and thereby polish the substrate. | 09-24-2015 |
20160053381 | GERMANIUM CHEMICAL MECHANICAL POLISHING - A method of planarizing/polishing germanium is described. The method comprises the step of abrading the surface of a substrate comprising germanium with an aqueous chemical mechanical polishing (CMP) composition comprising an oxidizing agent, a particulate abrasive, and a germanium etching inhibitor. The germanium etching inhibit is selected from the group consisting of a water-soluble polymer, an amino acid having a non-acidic side chain, a bis-pyridine compound, and a combination of two or more thereof. The polymer can be a cationic or nonionic polymer that comprises basic nitrogen groups, amide groups, or a combination thereof. | 02-25-2016 |
20160089763 | COMPOSITION FOR TUNGSTEN CMP - A chemical mechanical polishing composition for polishing a substrate having a tungsten layer includes a water based liquid carrier, a colloidal silica abrasive dispersed in the liquid carrier and having a permanent positive charge of at least 6 mV, an amine compound in solution in the liquid carrier, and an iron containing accelerator. A method for chemical mechanical polishing a substrate including a tungsten layer includes contacting the substrate with the above described polishing composition, moving the polishing composition relative to the substrate, and abrading the substrate to remove a portion of the tungsten from the substrate and thereby polish the substrate. | 03-31-2016 |
20160108286 | SLURRY FOR CHEMICAL MECHANICAL POLISHING OF COBALT - The invention provides a chemical-mechanical polishing composition including (a) an abrasive comprising alumina particles, silica particles, or a combination thereof, (b) a rate accelerator comprising a phosphonic acid, an N-heterocyclic compound, or a combination thereof, (c) a corrosion inhibitor comprising an amphoteric surfactant, a sulfonate, a phosphonate, a carboxylate, a fatty acid amino acid, an amine, an amide, or a combination thereof, (d) an oxidizing agent, and (e) an aqueous carrier. The invention also provides a method of polishing a substrate, especially a substrate comprising a cobalt layer, with the polishing composition. | 04-21-2016 |
Keith E. Whitener, Washington, DC US
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20160140992 | Magnetic Graphene - A method of making magnetic graphene comprising transferring or growing a graphene film on a substrate, functionalizing the graphene film, hydrogenating the graphene film and forming fully hydrogenated graphene, manipulating the extent of the hydrogen content, and forming areas of magnetic graphene and non-magnetic graphene. A ferromagnetic graphene film comprising film that has a thickness of less than two atom layers thick. | 05-19-2016 |
Michael Whitener, Ft Myers, FL US
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20120189810 | Secondary Containment Panels and Process for Making and Installing Same - A method of manufacturing a plurality of secondary containment panels and assembling and installing the panels in a secondary containment system of an above-ground liquid storage tank or other retention facility includes forming a plurality of flexible substrate pieces. A liquid impermeable coating is applied to the upper surface of each piece such that an edge segment of the piece remains uncoated. The coating is applied to the substrate piece in an indoor enclosure using a computer controlled robotic sprayer that applies a uniform coating. Metal plates are embedded in the floor used for quality control testing of the coating thickness using magnetic gauges. At least a pair of the pieces are juxtaposed relative to one another such that a first one of the pieces overlaps the uncoated segment of the second piece to form a seam. | 07-26-2012 |
20150284924 | RETENTION TANK STORAGE COVER - The disclosure teaches a polyrurea coated water storage floatation cover comprising a layer of buoyant closed cell foam coated with polyurea, a upper layer of polyurea coated textile attached to the buoyant closed cell foam coated with polyurea, and attachment components affixed to the upper layer of the polyurea coated textile. The cover can be rolled up for storage and transportation. The cover can be reused. The cover can be made in sections that can be attached together to cover a large area of water surface such as in a retention pond or open top tank. | 10-08-2015 |
20160136675 | Secondary Containment Panels And Process For Making And Installing Same - A method of manufacturing a plurality of secondary containment panels and assembling and installing the panels in a secondary containment system of an above-ground liquid storage tank or other retention facility includes forming a plurality of flexible substrate pieces. A liquid impermeable coating is applied to the upper surface of each piece such that an edge segment of the piece remains uncoated. The coating is applied to the substrate piece in an indoor enclosure using a computer controlled robotic sprayer that applies a uniform coating. A system for coating secondary containment panels. An apparatus for spraying a coating on a secondary containment panels. The apparatus may be computer controlled and operate automatically to coat the surface of the panel. | 05-19-2016 |
Michael Whitener, Loveland, CO US
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20100058846 | Signal Coupling System For Scanning Microwave Microscope - A signal coupling system interposed between a scanning probe and a measurement instrument provides signal communication between the scanning probe and the measurement instrument. The signal coupling system has a pre-stressed shape when the scanning probe is in a neutral position. The pre-stressed shape is designated to provide a characteristic impedance of the signal coupling system that varies linearly as a function of displacement of the scanning probe from the neutral position when the scanning probe is displaced, relative to the neutral position, over a designated range of displacements. | 03-11-2010 |
Michael Whitener, Fort Myers, FL US
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20090324335 | Secondary containment system for an above-ground petroleum storage tank - A secondary containment system for an above-ground petroleum storage tank includes a berm rising above the ground surrounding the tank and spaced apart from the tank for defining a petroleum retention basin about the tank. An impermeable liner covers the ground between the tank and the berm. At least one drain is formed through the liner and into the underlying ground. A hydrocarbon sensor monitors the presence of petroleum in the drain. A control device responds to the presence of petroleum in the drain by closing a containment valve to prevent discharge of petroleum from the basin. An indicator device provides at least one of an audible and visible signal indicating that petroleum is sensed in the drain. | 12-31-2009 |
20090324336 | Secondary Containment System for an Above-Ground Petroleum Storage Tank - A secondary containment system for an above-ground petroleum storage tank includes a berm rising above the ground surrounding the tank and spaced apart from the tank for defining a petroleum retention basin about the tank. An impermeable liner covers the ground between the tank and the berm. At least one drain is formed through the liner and into the underlying ground. A hydrocarbon sensor monitors the presence of petroleum in the drain. A control device responds to the presence of petroleum in the drain by closing a containment valve to prevent discharge of petroleum from the basin. An indicator device provides at least one of an audible and visible signal indicating that petroleum is sensed in the drain. | 12-31-2009 |
20100140262 | Secondary containment panels and process for making and installing same - A method of manufacturing a plurality of secondary containment panels and assembling and installing the panels in a secondary containment system of an above-ground liquid storage tank or other retention facility includes forming a plurality of flexible substrate pieces. A liquid impermeable coating is applied to the upper surface of each piece such that an edge segment of the piece remains uncoated. The coating is applied to the substrate piece in an indoor enclosure. The coated pieces are delivered to the site of the tank and extended across the ground adjacent to the tank. At least a pair of the pieces are juxtaposed relative to one another such that a first one of the pieces overlaps the uncoated segment of the second piece to form a seam. An adhesive substance is then applied to the seam to fasten the first and second pieces together. | 06-10-2010 |
20130294836 | Secondary Containment Panels and Process for Making and Installing Same - A method of manufacturing a plurality of secondary containment panels and assembling and installing the panels in a secondary containment system of an above-ground liquid storage tank or other retention facility includes forming at least one flexible substrate. A liquid impermeable coating is applied by a robotic applicator to the upper surface of the substrate such that an edge segment of the substrate remains uncoated. The coating is applied to the substrate in an indoor enclosure having a flat surface. The coated substrate is delivered to the site of the tank and extended across the ground adjacent to the tank. At least a pair of the substrates are juxtaposed relative to one another such that a first one of the substrate overlaps the uncoated segment of the second substrate to form a seam. An adhesive substance is then applied to the seam to fasten the first and second substrate together. | 11-07-2013 |
Michael B. Whitener, Santa Rosa, CA US
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20090079042 | Center Conductor to Integrated Circuit for High Frequency Applications - A microcircuit has a node thereon. A center conductor is electrically connected to the node and the center conductor has a length to minimum radius ratio of at least 50. A method of for providing electrical interconnections in a microcircuit, comprises the steps of depositing conductive bumps on the microcircuit; and aligning and bonding a center conductor to the conductive bumps, the center conductor having a first end and a second end, and the center conductor having a length to minimum radius ratio of at least 50. | 03-26-2009 |
Philip C. Whitener, Silverdale, WA US
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20130106100 | Quick Tube Connector | 05-02-2013 |
20140203536 | RIDING WALKERS HAVING PEDAL DRIVE ASSEMBLIES - In at least some embodiments, a riding walker assembly includes a support assembly and a drive assembly. The support assembly may include a frame work supporting a seat assembly, and a plurality of wheels operatively coupled to the frame work and configured to rollably engage a floor surface. The drive assembly may include a drive wheel configured to engage the floor surface, and a pedal assembly operatively coupled to the drive wheel such that rotation of the pedal assembly rotates the drive wheel. The riding walker assembly may further include a coupling assembly operatively coupling the drive assembly to the support assembly, the coupling assembly being configured to selectively engage and disengage the drive wheel from the floor surface. | 07-24-2014 |
Philip C. Whitener, Bainbridge Island, WA US
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20100297895 | Marine propulsion system - Illustrative marine propulsion systems are disclosed. In a non-limiting, illustrative embodiment, a marine propulsion system includes a pump housing that is configured to be disposed below a waterline of a marine vessel and a centrifugal pump assembly that is disposed in the pump housing. The centrifugal pump assembly includes an inlet pump stage configured to receive inlet water and to discharge impulse water. The centrifugal pump assembly also includes an outlet pump stage that includes an impulse turbine wheel configured to rotate about an axis responsive to the impulse water and an outlet pump stage impeller integral with the impulse turbine wheel. The outlet pump stage impeller is configured to rotate about the axis. | 11-25-2010 |
Randy E. Whitener, Oviedo, FL US
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20100299913 | ROTOR POLE CROSSOVER CONNECTION - A rotor pole crossover connection joint for use in a rotating electrical machine is disclosed. The connection joint integrally couples a bottom rotor coil strap to a rotor pole crossover connector with a single piece connector that reduces, distributes or otherwise tolerates stress concentrations in the connector. A corresponding method of forming a rotor pole crossover connection and a rotor assembly including a rotor pole crossover connection joint are also disclosed | 12-02-2010 |
20100313435 | METHOD AND SYSTEM FOR ADJUSTING A TURBOMACHINE GLAND SEAL - A method of determining an alignment of a floating seal for a turbo machine, including establishing a reference surface on a rotor of the turbomachine that is essentially perpendicular to an instantaneous centerline of the rotor, establishing a control surface that radially aligns a floating seal member that surrounds the rotor, providing an inflatable member arranged between a stationary portion of the turbomachine and a surface of the floating seal, inflating the inflatable member such that the inflatable member urges the floating seal firmly against the control surface, measuring an axial distance between the floating seal and the reference surface at a plurality of locations, determining a parallelism between the facing surfaces of the floating seal and the rotor based upon the plurality of measured axial distances, comparing the determined parallelism with a predetermined threshold, and adjusting an orientation of the control surface based upon the comparison. | 12-16-2010 |
20110148231 | Nut Securing Arrangement for Electrical Generator - A system for securing a nut ( | 06-23-2011 |
Randy Edward Whitener, Oviedo, FL US
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20150028702 | ROTOR WINDING HAVING A BRAZE JOINT SPACED APART FROM STRESS CONCENTRATION - A winding for a rotor for use in an electrical generator utilized in the power generation industry. The winding includes a plurality of axial sections and a plurality of transversely oriented end arc sections. An integrated leg section extends from each end arc section to form an associated corner section at an intersection of each leg section and associated end arc section. Each leg section is affixed to an associated axial section at a joint that is spaced apart from an associated corner section such that the joint is not subjected to stress concentration which occurs at the associated corner section. | 01-29-2015 |