Patent application number | Description | Published |
20090219499 | SURFACE SHAPE MEASURING APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - A surface shape measuring apparatus includes an illumination system and a light receiving system. The illumination system splits wide-band light from a light source into measurement light and reference light, illuminates the measurement light to obliquely enter a surface of the film, and illuminates the reference light to obliquely enter a reference mirror. The light receiving system combines the measurement light reflected by the surface of the film and the reference light reflected by the reference mirror with each other and introduces the combined light to a photoelectric conversion element. An incident angle of the measurement light upon the surface of the film and an incident angle of the reference light upon the reference mirror are each larger than the Brewster's angle. S-polarized light and p-polarized light included in the measurement light entering a surface of the substrate have equal intensity on the photoelectric conversion element. | 09-03-2009 |
20110141451 | DISPLACEMENT MEASUREMENT DEVICE, EXPOSURE APPARATUS, AND WORKING DEVICE - A device has a scale on which a grating pattern is formed, a light source to irradiate light on the scale, a wavelength plate to transform multiple diffracted lights from the light source into circular polarized light, respectively, an optical element to superposition and cause interference of the multiple diffracted lights, and a photodetector to receive the interfered light. Also, a generating unit to generate linearly polarized light by the light from the light source, so that the multiple diffracted lights input to the wavelength plate become linearly polarized light with a same mutual polarization direction. | 06-16-2011 |
20110176139 | MEASURING APPARATUS AND EXPOSURE DEVICE - An apparatus includes a system configured to split a light emitted from a light source into reference light and subject light, cause the subject light to enter into an object, and combine the subject light reflected by the object with the reference light, a detection unit configured to detect coherent light between the combined subject and reference lights, an element, provided within a light path of the reference light or the subject light, configured to change a path length difference between the reference light and the subject light and a relative position between the reference light and the subject light in a light receiving surface of the detection unit, and a position-variable mechanism configured to cause a position of the optical element to be changeable, wherein, by changing a position of the element, the optical path length difference and the relative position are independently adjusted. | 07-21-2011 |
20110253892 | ELECTRON-BEAM EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE - An electron-beam exposure apparatus includes a first measurement device which irradiates a mark formed on a substrate with light to detect reflected light of the light, thereby measuring the position of the mark, a second measurement device which detects a secondary electron generated by the electron beam guided from an electron source onto the mark, thereby measuring the position of the mark, and a controller. The controller performs measurements for the mark using the first and second measurement devices without interposing drawing of a pattern on the substrate with the electron beam between the measurements, calculates a shift in irradiated point of the electron beam based on the difference between the measurement results obtained by the first and second measurement devices, and controls at least one of a stage and the electron optical system to correct the calculated shift. | 10-20-2011 |
20120164583 | DRAWING APPARATUS AND METHOD OF MANUFACTURING ARTICLE - A drawing apparatus performs drawing on a substrate with a plurality of charged particle beams. The apparatus comprises a stage configured to hold the substrate and to be moved; a projection system configured to project the plurality of charged particle beams onto the substrate; a measurement device configured to detect a charged particle beam that reaches the measurement device due to a charged particle beam incident, via the projection system, on a mark formed on the substrate, to measure a position of the mark; and a controller. The controller is configured to control operations of the projection system and the measurement device so that the position of the mark is measured with at least one of the plurality of charged particle beams, in parallel with drawing on the substrate with a part of the plurality of charged particle beams. | 06-28-2012 |
20130021588 | MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE - A measurement apparatus includes a beam splitter that splits light from a light source into measurement light to be directed to an object to be measured and reference light to be directed to a reference surface, a beam combiner that combines the measurement light reflected by the object and the reference light reflected by the reference surface to generate combined light, and obtains physical information of the object based on the combined light. The measurement apparatus further includes a coherence controller which changes spatial coherences of the measurement light and the reference light. | 01-24-2013 |
20130107279 | OPTICAL APPARATUS, POSITION DETECTION APPARATUS, MICROSCOPE APPARATUS, AND EXPOSURE APPARATUS | 05-02-2013 |
20130168569 | DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE - The present invention provides a drawing apparatus which performs drawing on a substrate with a plurality of charged particle beams, the apparatus including a stage configured to hold the substrate and to be moved, a charged particle optical system including a deflector configured to deflect the plurality of charged particle beams, a detector configured to detect a charged particle arrived thereat by causing a charged particle beam to impinge on a mark including a plurality of mark elements formed on one of the substrate and the stage, and a processor configured to perform a process of obtaining a position of the mark. | 07-04-2013 |
20130171570 | DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE - The present invention provides a drawing apparatus including a stage having a reference mark, and configured to hold a substrate and to be moved, a charged particle optical system, a first measuring device having an optical axis spaced apart from an axis of the charged particle optical system by a first distance and configured to measure a position of an alignment mark formed on the substrate, a second measuring device having an optical axis spaced apart from the axis of the charged particle optical system by a second distance and configured to measure a position of the reference mark, and a processor configured to obtain a baseline of the first measuring device based on positions of the reference mark respectively measured by the first measuring device and the second measuring device. | 07-04-2013 |
20130216954 | DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE - A drawing apparatus, which draws a pattern on a substrate with a plurality of charged particle beams, includes: a charged particle optical system configured to emit the plurality of charged particle beams onto the substrate; and a controller configured to control an operation of the charged particle optical system. The controller is configured to control the operation so as to compensate for a distortion of the pattern that is determined based on first data of an undulation of a surface of the substrate and second data of an inclination of each of the plurality of charged particle beams with respect to an axis of the charged particle optical system. | 08-22-2013 |
20130230805 | DRAWING APPARATUS, REFERENCE MEMBER, AND METHOD OF MANUFACTURING ARTICLE - A drawing apparatus includes a charged particle optical system, a first measurement device including an image taking optical system and configured to measure a position of a reference mark in a first direction, a second measurement device configured to measure a position of the reference mark in the first direction based on an amount of charged particle beams that arrives thereat from the reference mark on which the charged particle beam are incident. The reference mark includes a first region having a first edge inclined with respect to a second direction perpendicular to the first direction and a second region having a second edge parallel to the second direction. A processor obtains a baseline based on measurement result with respect to the first region obtained by the first measurement device and measurement result with respect to the second region obtained by the second measurement device. | 09-05-2013 |
20130258095 | OPTICAL APPARATUS, MEASURING APPARATUS, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE - The present invention provides an optical apparatus which detects an image of a mark on a substrate, the apparatus including an optical system configured to form an image of the mark, a detector configured to detect the image, wherein the optical system includes an aperture stop, an aperture, corresponding to a first field of view and a second field of view of the detector, being formed in the aperture stop, a light-shielding member, and a driving mechanism configured to position the light-shielding member so that one of the first field of view and the second field of view is valid, and a part of the other is invalid. | 10-03-2013 |
20130265575 | DETECTION APPARATUS, LITHOGRAPHY APPARATUS, CHARGED PARTICLE BEAM APPARATUS, AND ARTICLE MANUFACTURING METHOD - A detection apparatus includes an optical system including a polarization beam splitter and a quarter-wave plate. The optical system illuminates a mark via the polarization beam splitter and the quarter-wave plate in sequence, and directs light reflected from the mark via the quarter-wave plate and the polarization beam splitter in sequence towards a light-receiving element An airtight container configured to enclose therein at least part of the optical system includes, as a partition wall thereof, a light transmitting member arranged in an optical path between the polarization beam splitter and the quarter-wave plate. | 10-10-2013 |
20140107984 | GENERATION METHOD, DESIGN METHOD, MANUFACTURING METHOD OF OPTICAL SYSTEM, AND STORAGE MEDIUM - The present invention provides a generation method of generating, by a computer, initial data to be used when designing an optical system in which a plurality of lenses are arranged in an optical axis direction, wherein in an optical system model in which a thickness of each lens and intervals between the plurality of lenses are set to 0, letting m be the number of lenses, r | 04-17-2014 |
20140204357 | DETECTION APPARATUS, MEASUREMENT APPARATUS, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE - The present invention provides a detection apparatus including a detector configured to detect a mark including a plurality of patterns arrayed on an object in a first direction, the apparatus comprising a support configured to support at least a part of the detector, wherein the support is configured to support the at least the part such that a displacement of the at least the part in a second direction corresponding to the first direction is smaller than a displacement of the at least the part in a third direction perpendicular to the second direction. | 07-24-2014 |
20140320836 | LITHOGRAPHY APPARATUS, LITHOGRAPHY METHOD, AND METHOD FOR MANUFACTURING DEVICE - An apparatus includes an optical system configured to irradiate a surface of a substrate with a beam, a control unit configured to control a position of the irradiation of the beam, and a first measurement unit and a second measurement unit each configured to measure a position of a mark formed on the substrate. The second measurement unit is placed at a position closer to an optical axis of the optical system than the first measurement unit is. Based on a position measurement value measured by the first measurement unit and position measurement values measured at different timings by the second measurement unit, the control unit controls the position of the beam irradiated to the substrate. The position measurement values measured at the different timings are values obtained from the same mark or values obtained from two marks adjacent to a common shot area. | 10-30-2014 |
20140322655 | STAGE APPARATUS, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE - A stage apparatus includes first, second, third, and fourth stages arranged along a plane defined by first and second axes orthogonal to each other, each of the first to fourth stages holding an article and being subjected to scanning along the plane, and a controller configured to control the scanning of the first to fourth stages in synchronization such that a pair of the first and second stages and a pair of the third and fourth stages are respectively positioned symmetrically to each other with respect to the first axis and a pair of the first and third stages and a pair of the second and fourth stages are respectively positioned symmetrically to each other with respect to the second axis. | 10-30-2014 |
20140322833 | IRRADIATION APPARATUS FOR IRRADIATING CHARGED PARTICLE BEAM, METHOD FOR IRRADIATION OF CHARGED PARTICLE BEAM, AND METHOD FOR MANUFACTURING ARTICLE - An apparatus includes an optical system configured to irradiate a substrate with a charged particle beam, a control unit configured to control an irradiation position of the charged particle beam, and a first measurement unit and a second measurement unit each configured to measure a surface position of the substrate. The first measurement unit and the second measurement unit have different characteristics in terms of charging. The control unit controls the irradiation position of the charged particle beam based on values measured by the first measurement unit and the second measurement unit. | 10-30-2014 |
20140377891 | CHARGED PARTICLE BEAM IRRADIATION APPARATUS AND METHODS RELATED THERETO - A charged particle beam irradiation apparatus, which irradiates a substrate with a charged particle beam, includes a capacitance sensor and an optical sensor configured to measure a surface position of the substrate, a storage unit configured to store respective measurement values of the surface position of the substrate measured by the optical sensor and the capacitance sensor, and a calculation unit configured to obtain surface position data of the substrate, in which the calculation unit obtains a correction amount by using respective measurement values of the surface position measured by the capacitance sensor and the optical sensor in a region within a scribe line formed on the substrate, which are stored in the stored unit, and applies the correction amount to the measurement value of the surface position measured by the capacitance sensor, to obtain the surface position data of the substrate. | 12-25-2014 |
20150022796 | INTERFEROMETER, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE - An interferometer includes: an optical system configured to generate interfering light by dividing light from a light source, and combining reference light and measurement light; a detector configured to detect the interfering light generated by the optical system; and an optical member configured to give spatial coherence to the light from the light source before the detector detects the light from the light source. The optical member gives higher spatial coherence in a second direction serving as a direction of a line of intersection of a cross section of a beam of the light incident on the optical member, and a plane including optical paths of the light from the light source before being divided by the optical system, the reference light, the measurement light, and the interfering light, than in a first direction perpendicular to the plane. | 01-22-2015 |