Wakata
Daisuke Wakata, Tokyo JP
Patent application number | Description | Published |
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20110140428 | MONITORING AND CONTROL APPARATUS AND METHOD AND WIND POWER PLANT EQUIPPED WITH THE SAME - It is an object to reduce influence on a utility grid by reducing a rapid change in active power, and to extend the life of a wind power plant while controlling active power output in response to a request from the utility grid. A monitoring and control apparatus applied to a wind power plant including a plurality of wind turbine generators includes an electric power control unit that controls the wind turbine generators so as to reduce output of the wind power plant in a stepwise manner, when an active power reduction request from a utility grid side is output. | 06-16-2011 |
Syuji Wakata, Toyama JP
Patent application number | Description | Published |
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20130022778 | Fastener Tape and Fastener Stringer - A fastener tape according to the invention includes a tape main body portion and an element attachment portion in which a core thread is knitted. The tape main body portion includes a first tape main body portion region at the element attachment portion and a second tape main body portion region. A wale interval between a wale of the element attachment portion adjacent to the first tape main body portion region and a wale constituting the first tape main body portion region is narrower than that of the second tape main body portion region. Therefore, while the flexibility of the second tape main body portion region is ensured, a tape strength and an abrasion resistance are improved, and further, when a fastener element is formed, this prevents resin leakage through knitted loops of the element attachment portion. | 01-24-2013 |
Yuichi Wakata, Shizuoka JP
Patent application number | Description | Published |
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20080268374 | Photosensitive Composition, Pattern Forming Material, Photosensitive Laminate, Pattern Forming Apparatus, and Pattern Forming Process - A photosensitive composition having an extremely constant photosensitivity distribution relative to an exposure light having a wavelength of 400 nm to 410 nm, and excelling in pattern reproductivity, suppressing variations in pattern formation; a pattern forming material and a photosensitive laminate with the photosensitive composition laminated thereon; and a pattern forming apparatus and a pattern forming process. | 10-30-2008 |