Voronin
Anton Stanislavovich Voronin, Krasnoyarsk RU
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20160090488 | MESH-LIKE MICRO- AND NANOSTRUCTURE FOR OPTICALLY TRANSPARENT CONDUCTIVE COATINGS AND METHOD FOR PRODUCING SAME - Described is a method for producing a mesh structure involving forming a substantially uniform layer of a material on a surface of a substrate, wherein upon occurrence of a predetermined chemical or a physical reaction, the material of the uniform layer mechanically contracts and wherein the material of the uniform layer has a sufficiently high adhesion to the surface of the substrate and causing the uniform layer of material to break into clusters separated by gaps by facilitating the occurrence of the predetermined chemical or physical reaction in the uniform layer of the material formed on the surface of the substrate, wherein the uniform layer of material breaks into the clusters due to appearance of mechanical stresses, sufficient to break the uniform layer of material into the clusters, the mechanical stresses being caused by the occurrence of the predetermined chemical or physical reaction in the uniform layer of the material. | 03-31-2016 |
Evgeny Ivanovich Voronin, Balashikha RU
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20100007494 | A SECURITY ALARM DEVICE - The invention relates to security alarm devices and can be used for warning about the modification of the position of monitored objects with respect to a user monitoring said objects. The inventive device comprises an object device which is arranged on each guarded object and is used for inquiring and emitting a signal about the presence of a corresponding object device in a monitored area, a control system used for switching on an alarm device and an information display device. | 01-14-2010 |
Igor Pavlovich Voronin, Moscow RU
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20140146587 | POWER MODULE WITH A MULTI-RESONANCE CIRCUIT (EMBODIMENTS) - The invention relates to power electronics. The use of said invention in autonomous inverter and pulse regulator circuits makes it possible to reduce dynamic losses and additional losses of conductivity in mains switches and to prevent high-frequency interference during switching of said switches. The power module has a positive, a negative and an output power terminal and comprises a first and a second switch, each having an antiparallel diode of the same type, and an LC series circuit. The technical result is achieved by the introduction of a capacitor, the first and second plates of which are respectively connected to the output power terminal of the module and to the positive or negative power terminal of the module. | 05-29-2014 |
Kimberly Nguyen Voronin, Hillsborough, NJ US
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20120214845 | ACTIVE METABOLITE OF A THROMBIN RECEPTOR ANTAGONIST - Disclosed herein is an active metabolite (“M20”) of a molecule that is useful as a thrombin receptor antagonist: Also disclosed are formulations of this compound, synthetic routes to this compound, and methods of treating a variety of cardiovascular conditions, including acute coronary syndrome and peripheral arterial disease, and of effecting secondary prevention, by orally administering the active metabolilte. | 08-23-2012 |
Pavel Anatolievich Voronin, Moscow RU
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20140146587 | POWER MODULE WITH A MULTI-RESONANCE CIRCUIT (EMBODIMENTS) - The invention relates to power electronics. The use of said invention in autonomous inverter and pulse regulator circuits makes it possible to reduce dynamic losses and additional losses of conductivity in mains switches and to prevent high-frequency interference during switching of said switches. The power module has a positive, a negative and an output power terminal and comprises a first and a second switch, each having an antiparallel diode of the same type, and an LC series circuit. The technical result is achieved by the introduction of a capacitor, the first and second plates of which are respectively connected to the output power terminal of the module and to the positive or negative power terminal of the module. | 05-29-2014 |
Sergey Voronin, Rensselaer, NY US
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20150064918 | Method for Laterally Trimming a Hardmask - Techniques herein include methods for controllable lateral etching of dielectrics in polymerizing fluorocarbon plasmas. Methods can include dielectric stack etching that uses a mask trimming step as part of a silicon etching process. Using a fluorocarbon mixture for dielectric mask trimming provides several advantages, such as being straightforward to apply and providing additional flexibility to the process flow. Thus, techniques herein provide a method to correct or tune CDs on a hardmask. In general, this technique can include using a fluorine-based and a fluorocarbon-based, or fluorohydrocarbon-based, chemistry for creating a plasma, and controlling a ratio of the two chemistries. Without the hardmask trim method disclosed herein, if a hardmask CD is not on target, then a wafer is scrapped. With hard-mask trim capability in silicon etch as disclosed herein, a given CD can be re-targeted to eliminate wafer-scraps. | 03-05-2015 |
Sergey A. Voronin, Rensselaer, NY US
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20140028184 | CONTROL OF UNIFORMITY IN A SURFACE WAVE PLASMA SOURCE - A surface wave plasma source (SWPS) is disclosed, having an electromagnetic (EM) wave launcher including a slot antenna configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface of the SWPS adjacent the plasma. The SWPS also includes a dielectric window positioned below the slot antenna, having a lower surface and the plasma surface. The SWPS further includes an attenuation assembly disposed between the slot antenna and the plasma surface. The attenuation assembly includes a first fluid channel substantially aligned with a first arrangement of slots in the slot antenna, and is configured to receive a first flow of a first fluid at a first fluid temperature. The SWPS finally includes a power coupling system coupled to the EM wave launcher and configured to provide EM energy to the EM wave launcher for forming the plasma. | 01-30-2014 |
20140028190 | ADJUSTABLE SLOT ANTENNA FOR CONTROL OF UNIFORMITY IN A SURFACE WAVE PLASMA SOURCE - The present invention provides a surface wave plasma source including an electromagnetic (EM) wave launcher comprising a slot antenna having a plurality of antenna slots configured to couple the EM energy from a first region above the slot antenna to a second region below the slot antenna, and a power coupling system is coupled to the EM wave launcher. A dielectric window is positioned in the second region and has a lower surface including the plasma surface. A slotted gate plate is arranged parallel with the slot antenna and is configured to be movable relative to the slot antenna between variable opacity positions including a first opaque position to prevent the EM energy from passing through the first arrangements of antenna slots, and a first transparent position to allow a full intensity of the EM energy to pass through the first arrangement of antenna slots. | 01-30-2014 |
Sergey A. Voronin, Delmar, NY US
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20160027620 | METHOD AND APPARATUS FOR ESC CHARGE CONTROL FOR WAFER CLAMPING - A plasma processing method and apparatus are provided in which current spikes associated with application of a voltage to an electrostatic chuck (ESC) are minimized or reduced when the processing plasma is present. According to an example, the voltage is applied to the ESC after the processing plasma is struck, however the voltage is ramped or increased in a step-wise manner to achieve the desired final ESC voltage. In an alternate embodiment, the ESC voltage is at least partially applied before striking of the plasma for processing the wafer. By reducing current spikes associated with application of the voltage to the ESC during the presence of the processing plasma, transfer or deposition of particles on the wafer can be reduced. | 01-28-2016 |
Sergey Alexandrovich Voronin, Rensselaer, NY US
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20140027411 | Plasma Torch - To lengthen the service period on DC plasma abatement devices a modified DC plasma torch is provided with an electrically conductive cathode and an electrically conductive anode spaced apart from one another to form a gap therebetween; a metal swirl bush at least partially located within the gap and comprising a channel adapted to permit, in use, a gas to flow through the gap; and a ceramic element interposed between any one or more of: the cathode and the swirl bush; and the anode and the swirl bush. | 01-30-2014 |
20140209575 | APPARATUS FOR TREATING A GAS STREAM - In order to increase the operable range of a DC plasma torch in an abatement apparatus, the apparatus comprises a power control configured for controlling the power of the plasma torch by selective control of the plasma source gas flow regulator | 07-31-2014 |
20140334982 | Apparatus for Treating a Gas Stream - An apparatus for treating a gas stream includes a plasma abatement device that has a reaction chamber and a plasma torch for generating a plasma stream for injection into the chamber for treating the gas stream. A first inlet conveys a gas stream into the plasma abatement device for treatment, and a second inlet, in a normal condition of the apparatus, is in flow communication with a source of reagent for conveying a reagent into the plasma device for improving the efficiency of the treatment. In a back-up condition of the apparatus, the second inlet is in flow communication with a gas stream source for conveying a gas stream into the device for treatment. | 11-13-2014 |
20150027369 | Apparatus for Treating a Gas Stream - In an apparatus for treating a gas stream, a plasma generator comprises an electrode for energising a source gas to generate a plasma flare by application of a high voltage. An inlet allows the gas stream into the apparatus and directs it into the generated plasma. A scraper is fitted for reciprocating movement from a first position to a second position for scraping a surface to remove solid deposits accumulated on the surface. | 01-29-2015 |
20150027373 | APPARATUS FOR TREATING A GAS STREAM - An apparatus for treating a gas stream. A plasma generator generates a plasma flare. A first inlet conveys the gas stream into the apparatus. A reaction chamber is located downstream of the plasma generator in which gas is treated. A second inlet receives a liquid into the apparatus for establishing a liquid weir over an interior surface of the reaction chamber for resisting accumulation of solid deposits on the interior surface. A weir guide has an outer annular surface for directing liquid over the interior surface and an inner annular surface in flow communication with the outer surface so that liquid flows form the outer surface to the inner surface to resist depositing on the inner surface. | 01-29-2015 |
Vladimir Voronin, Netanya IL
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20110125065 | METHOD AND DEVICE FOR DETECTING ESTRUS - The present invention provides a method and device for detecting estrus in animal by sensing along time the motion of the animal and identifying when the sensed motion is not related to eating periods of the animal. Based on the sensed motion which is not related to eating periods the estrus in the animal is identified | 05-26-2011 |
Vladimir Ivanovich Voronin, Ekaterinburg RU
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20130153090 | METHOD FOR THERMAL TREATMENT OF ARTICLES FROM IRON-BASED ALLOYS (VARIANTS) - The invention relates to the field of thermal processing of articles consisting of steel and iron-based alloys with a carbon content of up to 4.3% by weight. In order to reduce the duration of the technological processes used for producing articles consisting of iron-based alloys with a set structural state, the first variant of the method comprises heating the articles so as to form austenite and then cooling, which is performed under conditions which ensure the formation, in the structure of the alloy, of regions of austenite with a chemical composition similar to eutectoid with the subsequent formation in said regions of marinite and a set structural state so as to produce perlite with a different degree of dispersion and/or hardened structures. The second variant of the method comprises heating the article, which is performed under conditions which ensure the formation, in the structure of the alloy, of marinite and then cooling with the formation a set structural state so as to produce perlite with a different degree of dispersion and/or hardened structures. When implementing the methods, pulsed cooling and plastic deformation are used. | 06-20-2013 |