Patent application number | Description | Published |
20090254841 | APPARATUS, METHOD, AND COMPUTER PROGRAM PRODUCT FOR CHARACTERIZING USER-DEFINED AREAS - A method of specifying a boundary for an area is provided, which includes receiving a first input from a first user regarding a first configuration of a boundary of an area. The first input may serve to establish an area of arbitrary and possibly irregular configuration, such as an area that is apolitical or otherwise legally undetermined. A second input may be received from a second user regarding a second boundary configuration. The second input may serve to modify the boundary of an area established by the first input. A particular configuration of the boundary based at least partially on the first and second inputs can then be determined. For example, the particular configuration of the boundary may be determined, in part, by spatially averaging the first and second configurations. In some embodiments, demographic data for an area defined by the particular configuration of the boundary may be compiled. | 10-08-2009 |
20090265323 | APPARATUS, METHOD, AND COMPUTER PROGRAM PRODUCT FOR CHARACTERIZING USER-DEFINED AREAS - A method of specifying a boundary for an area is provided, which includes receiving a first input from a first user regarding a first configuration of a boundary of an area. The first input may serve to establish an area of arbitrary and possibly irregular configuration, such as an area that is apolitical or otherwise legally undetermined. A second input may be received from a second user regarding a second boundary configuration. The second input may serve to modify the boundary of an area established by the first input. A particular configuration of the boundary based at least partially on the first and second inputs can then be determined. For example, the particular configuration of the boundary may be determined, in part, by spatially averaging the first and second configurations. In some embodiments, demographic data for an area defined by the particular configuration of the boundary may be compiled. | 10-22-2009 |
20090265452 | APPARATUS, METHOD, AND COMPUTER PROGRAM PRODUCT FOR CHARACTERIZING USER-DEFINED AREAS - A method of specifying a boundary for an area is provided, which includes receiving a first input from a first user regarding a first configuration of a boundary of an area. The first input may serve to establish an area of arbitrary and possibly irregular configuration, such as an area that is apolitical or otherwise legally undetermined. A second input may be received from a second user regarding a second boundary configuration. The second input may serve to modify the boundary of an area established by the first input. A particular configuration of the boundary based at least partially on the first and second inputs can then be determined. For example, the particular configuration of the boundary may be determined, in part, by spatially averaging the first and second configurations. In some embodiments, demographic data for an area defined by the particular configuration of the boundary may be compiled. | 10-22-2009 |
20090271718 | APPARATUS, METHOD, AND COMPUTER PROGRAM PRODUCT FOR CHARACTERIZING USER-DEFINED AREAS - A method of specifying a boundary for an area is provided, which includes receiving a first input from a first user regarding a first configuration of a boundary of an area. The first input may serve to establish an area of arbitrary and possibly irregular configuration, such as an area that is apolitical or otherwise legally undetermined. A second input may be received from a second user regarding a second boundary configuration. The second input may serve to modify the boundary of an area established by the first input. A particular configuration of the boundary based at least partially on the first and second inputs can then be determined. For example, the particular configuration of the boundary may be determined, in part, by spatially averaging the first and second configurations. In some embodiments, demographic data for an area defined by the particular configuration of the boundary may be compiled. | 10-29-2009 |
20140143713 | METHOD FOR LOCATNG REGIONS OF INTEREST IN A USER INTERFACE - The present disclosure is directed towards having a user interface that displays a number of cards or windows. A user can implement a command where the user interface will automatically change the position of the displayed cards to show regions of interest which are the parts of the cards that a user may have interested in. The user interest can be determined in accordance with user preference information. Optionally, cards which do not have regions of interest are removed from a display area and such cards are replaced with new cards that do have regions of interest. | 05-22-2014 |
20140150023 | CONTEXTUAL USER INTERFACE - The present disclosure is directed towards having a user interface being selected for display on an input device to control the playback of a media asset or media service. A determination is made of the media asset or media service to be played and a lookup operation is performed to select the corresponding user interface for the input device. The user interface will change depending on the media asset or media service being selected for playback. | 05-29-2014 |
20140298215 | METHOD FOR GENERATING MEDIA COLLECTIONS - A user interface is used for selecting a time duration for a media collection shelf. The media shelf can be populated with graphical elements corresponding to selected media assets, where the cumulative time duration of selected media assets should not exceed the time duration of the media collection shelf. When placed within the media collection shelf, a graphical element corresponding to a media asset is scaled in proportion to the time duration of the media asset as compared to the time duration of the media collection shelf. Optionally, selected media assets within the media collection shelf are played back in a particular order specified by a user. | 10-02-2014 |
20140298221 | METHOD AND APPARATUS FOR RESTRICTING USER OPERATIONS WHEN APPLIED TO CARDS OR WINDOWS - A user interface that displays a number of cards or windows is described where a user can move the cards in a horizontal direction freely. When a card resides in a locked zone, as defined by a user, the card will be able to be manipulated in a vertical direction, while cards that reside in a regular zone will not be able to be moved vertically. In addition, only cards that are in the locked zone can be subjected to a user action such as cutting content from the card, pasting content to the card, enlarging the contents of the card, or shrinking the contents of the card. | 10-02-2014 |
Patent application number | Description | Published |
20100120262 | Amino Vinylsilane Precursors for Stressed SiN Films - The present invention is a method to increase the intrinsic compressive stress in plasma enhanced chemical vapor deposition (PECVD) silicon nitride (SiN) and silicon carbonitride (SiCN) thin films, comprising depositing the film from an amino vinylsilane-based precursor. More specifically the present invention uses the amino vinylsilane-based precursor selected from the formula: [RR | 05-13-2010 |
20100180913 | METHODS FOR IN-SITU CHAMBER CLEANING PROCESS FOR HIGH VOLUME MANUFACTURE OF SEMICONDUCTOR MATERIALS - The present invention is related to the field of semiconductor processing equipment and methods and provides, in particular, methods and apparatus for in-situ removal of undesired deposits in the interiors of reactor chambers, for example, on chamber walls and elsewhere. The invention provides methods according to which cleaning steps are integrated and incorporated into a high-throughput growth process. Preferably, the times when growth should be suspended and cleaning commenced and when cleaning should be terminated and growth resumed are automatically determined based on sensor inputs. The invention also provides reactor chamber systems for the efficient performance of the integrated cleaning/growth methods of this invention. | 07-22-2010 |
20110212546 | UV ABSORPTION BASED MONITOR AND CONTROL OF CHLORIDE GAS STREAM - A semiconductor growth system includes a chamber and a source of electromagnetic radiation. A detector is arranged to detect absorption of radiation from the source by a chloride- based chemical of the reaction chamber. A control system controls the operation of the chamber in response to the absorption of radiation by the chloride-based chemical. The control system controls the operation of the chamber by adjusting a parameter of the reaction chamber. | 09-01-2011 |
20130277332 | Plasma Etch Resistant, Highly Oriented Yttria Films, Coated Substrates and Related Methods - Included within the scope of the invention are plasma etch-resistant films for substrates. The films include a yttria material and a at least a portion of the yttria material is in a crystal phase having an orientation defined by a Miller Index notation {111}. Also included are methods of manufacturing plasma etch-resistant films on a substrate. Such methods include applying a yttria material-containing composition onto at least a portion of a surface of a substrate to form a film. The film includes a yttria material and at least a portion of the yttria material is in a crystal phase having an orientation defined by a Miller Index notation {111}. | 10-24-2013 |
20140065844 | Amino Vinylsilane Precursors for Stressed SiN Films - The present invention is a method to increase the intrinsic compressive stress in plasma enhanced chemical vapor deposition (PECVD) silicon nitride (SiN) and silicon carbonitride (SiCN) thin films, comprising depositing the film from an amino vinylsilane-based precursor. More specifically the present invention uses the amino vinylsilane-based precursor selected from the formula: [RR | 03-06-2014 |
20140099491 | Plasma Etch Resistant Films, Articles Bearing Plasma Etch Resistant Films and Related Methods - The invention includes a plasma etch-resistant film for a substrate comprising a yttria material wherein at least a portion of the yttria material is in a crystal phase having a crystal lattice structure, wherein at least 50% of the yttria material is in a form of a monoclinic crystal system. The film may be treated by exposure to a fluorine gas plasma. Also included are plasma etch-resistant articles that include a substrate and a film, wherein the film comprises an yttria material and at least a portion of the yttria material is present in the film in a crystal phase having a crystal lattice structure and at least 50% of the yttria material is in a form of a monoclinic crystal system. Several methods are contemplated within the scope of the invention. | 04-10-2014 |