Van Nooten
Sebastiaan E. Van Nooten, Bilthoven NL
Patent application number | Description | Published |
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20090291209 | APPARATUS AND METHOD FOR HIGH-THROUGHPUT ATOMIC LAYER DEPOSITION - Atomic layer deposition apparatus for depositing a film in a continuous fashion. The apparatus includes a process tunnel, extending in a transport direction and bounded by at least a first and a second wall. The walls are mutually parallel and allow a flat substrate to be accommodated there between. The apparatus further includes a transport system for moving a train of substrates or a continuous substrate in tape form, through the tunnel. At least the first wall of the process tunnel is provided with a plurality of gas injection channels that, viewed in the transport direction, are connected successively to a first precursor gas source, a purge gas source, a second precursor gas source and a purge gas source respectively, so as to create a tunnel segment that—in use—comprises successive zones containing a first precursor gas, a purge gas, a second precursor gas and a purge gas, respectively. | 11-26-2009 |
20110124199 | APPARATUS AND METHOD FOR HIGH-THROUGHPUT ATOMIC LAYER DEPOSITION - Atomic layer deposition apparatus for depositing a film in a continuous fashion. The apparatus includes a process tunnel, extending in a transport direction and bounded by at least a first and a second wall. The walls are mutually parallel and allow a flat substrate to be accommodated there between. The apparatus further includes a transport system for moving a train of substrates or a continuous substrate in tape form, through the tunnel. At least the first wall of the process tunnel is provided with a plurality of gas injection channels that, viewed in the transport direction, are connected successively to a first precursor gas source, a purgegas source, a second precursor gas source and a purge gas source respectively, so as to create a tunnel segment that—in use—comprises successive zones containing a first precursor gas, a purge gas, a second precursor gas and a purge gas, respectively. | 05-26-2011 |
Sebastian E. Van Nooten, Bilthoven NL
Patent application number | Description | Published |
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20100022099 | METHOD OF FORMING NON-CONFORMAL LAYERS - In one aspect, non-conformal layers are formed by variations of plasma enhanced atomic layer deposition, where one or more of pulse duration, separation, RF power on-time, reactant concentration, pressure and electrode spacing are varied from true self-saturating reactions to operate in a depletion-effect mode. Deposition thus takes place close to the substrate surface but is controlled to terminate after reaching a specified distance into openings (e.g., deep DRAM trenches, pores, etc.). Reactor configurations that are suited to such modulation include showerhead, in situ plasma reactors, particularly with adjustable electrode spacing. In another aspect, alternately and sequentially contacting a substrate, the substrate including openings, with at least two different reactants, wherein an under-saturated dose of at least one of the reactants has been predetermined and the under-saturated dose is provided uniformly across the substrate surface, deposits a film that less than fully covers surfaces of the openings, leading to depletion effects in less accessible regions on the substrate surface | 01-28-2010 |
Thomas Van Nooten, Ravels BE
Patent application number | Description | Published |
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20130118993 | LIGHT EXPANDED CLAY AGGREGATES FOR REMOVAL OF HALOGENATED CONTAMINANTS FROM WATER - Light expanded clay aggregates are described that are prepared by firing and expanding a clay-based material, wherein metals such as palladium, copper or nickel are added to the clay together with iron prior to expansion and firing. The expanded clay aggregates can be used for cleaning of water contaminated with halogenated organic compounds. The latter are chemically degraded to harmless compounds in proximity of the added metals. The aggregates can be used as a reactive medium for treatment of contaminated groundwater, wastewater and landfill leachate. | 05-16-2013 |
20130134105 | LIGHT EXPANDED CLAY AGGREGATES FOR REMOVAL OF HALOGENATED CONTAMINANTS FROM WATER - Light expanded clay aggregates are described that are prepared by firing and expanding a clay-based material, wherein metals such as palladium, copper or nickel are added to the clay together with iron prior to expansion and firing. The expanded clay aggregates can be used for cleaning of water contaminated with halogenated organic compounds. The latter are chemically degraded to harmless compounds in proximity of the added metals. The aggregates can be used as a reactive medium for treatment of contaminated groundwater, wastewater and landfill leachate. | 05-30-2013 |