Patent application number | Description | Published |
20100171037 | COMPACT SCANNING ELECTRON MICROSCOPE - A compact electron microscope uses a removable sample holder having walls that form a part of the vacuum region in which the sample resides. By using the removable sample holder to contain the vacuum, the volume of air requiring evacuation before imaging is greatly reduced and the microscope can be evacuated rapidly. In a preferred embodiment, a sliding vacuum seal allows the sample holder to be positioned under the electron column, and the sample holder is first passed under a vacuum buffer to remove air in the sample holder. | 07-08-2010 |
20100194874 | User Interface for an Electron Microscope - A user interface for operation of a scanning electron microscope device that combines lower magnification reference images and higher magnification images on the same screen to make it easier for a user who is not used to the high magnification of electron microscopes to readily determine where on the sample an image is being obtained and to understand the relationship between that image and the rest of the sample. Additionally, other screens, such as, for example, an archive screen and a settings screen allow the user to compare saved images and adjust the settings of the system, respectively. | 08-05-2010 |
20100230590 | Compact Scanning Electron Microscope - A compact electron microscope is robust, simple to operate, and preferably requires no special utilities. Imaging can begin shortly after a sample is inserted. A preferred simplified design includes permanent magnets for focusing, lack a vacuum controller and vacuum gauge, and uses a backscattered electron detector and no secondary electron detector. | 09-16-2010 |
20110133083 | COMPACT SCANNING ELECTRON MICROSCOPE - A compact electron microscope uses a removable sample holder having walls that form a part of the vacuum region in which the sample resides. By using the removable sample holder to contain the vacuum, the volume of air requiring evacuation before imaging is greatly reduced and the microscope can be evacuated rapidly. In a preferred embodiment, a sliding vacuum seal allows the sample holder to be positioned under the electron column, and the sample holder is first passed under a vacuum buffer to remove air in the sample holder. | 06-09-2011 |
Patent application number | Description | Published |
20090158197 | TWO PANEL NAVIGATION - A graphical user interface for navigating through content is provided. The graphical user interface comprises a history panel wherein navigation history data is displayed so as to represent past selections, and furthermore comprises at least a first panel displaying a first menu of a content structure. The first menu comprises one or more selectable items. A further at least second panel for displaying a first sub-menu of a currently highlighted item of the first menu may be provided. By providing information about navigation history data to the user in a history panel, the user is provided with a general overview of the content and also of the current navigation process and/or the overall navigation structure. By providing navigation history information in a history panel, the past dialog boxes may be closed without loosing any information regarding the current navigation process. | 06-18-2009 |
20090177994 | DOUBLE SCROLLING - A method of providing screen scrolling in content, such as hierarchically ordered content, is provided, wherein at least one level in the content comprises a page level comprising pages of objects and an object level comprising the objects, the method comprises the steps of: scrolling the objects page-by-page in the page level, and scrolling the objects object-by-object in the object level. Especially when scrolling in larger amounts of content, such as hierarchically ordered content, it is an advantage of interweaving a page by page level with an object by object level, so that the user may choose a specific level to navigate either page-wise or object-wise. | 07-09-2009 |
Patent application number | Description | Published |
20080218718 | Lithographic apparatus and device manufacturing method - A lithographic apparatus is provided. The lithographic apparatus includes a radiation source configured to provide radiation, an array of optical light engines, and a substrate table that supports a substrate. Each of the optical light engines includes an array of individually controllable elements arranged and constructed to receive and to pattern the radiation and projection optics configured to receive the patterned radiation and to project the patterned radiation onto the substrate. The substrate table is arranged and constructed to move relative to the array of optical light engines during exposure of the substrate to the patterned radiation. | 09-11-2008 |
20090237634 | ENCODER-TYPE MEASUREMENT SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD TO DETECT AN ERROR ON OR IN A GRID OR GRATING OF AN ENCODER-TYPE MEASUREMENT SYSTEM - An encoder-type measurement system is configured to measure a position dependent signal of a movable object. The measurement system includes a light source and a sensor. The light source and the sensor are mounted on one of the movable object or a substantially stationary frame. The measurement system also includes a reference object that includes a grating or grid mounted on the other of the movable object or the substantially stationary frame. The light source is configured to emit a light beam towards the reference object. The sensor is configured to detect light of the light source reflected by the reference object. The measurement system also includes an error detector capable of detecting errors in or on the grating or grid of the sensor target object during a continuous production process. | 09-24-2009 |
20090284720 | Lithographic Apparatus and Device Manufacturing Method - A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam. | 11-19-2009 |
20120327386 | LITHOGRAPHIC APPARATUS, METHOD OF DEFORMING A SUBSTRATE TABLE AND DEVICE MANUFACTURING METHOD - A lithographic apparatus includes a projection system, a substrate table, a plurality of sensors, an actuator and a controller. The projection system is configured to project a patterned beam of radiation onto a substrate. The substrate table is configured to support the substrate and to move relative to the projection system. The plurality of sensors is configured to measure a deformation of the substrate table. The actuator is configured to deform the substrate table. The controller is configured to control the actuator to deform the substrate table based on measurements made by the sensors. The plurality of sensors is located on a first side of the substrate table opposite to a second side of the substrate table facing the projection system. The plurality of sensors is substantially stationary relative to the projection system. | 12-27-2012 |
20130050670 | POSITION MEASUREMENT SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A position measurement system includes a first part and a second part for determining a position of a first member relative to a second member by providing a position signal representing a position of the first part relative to the second part, and a computational unit comprising an input terminal for receiving the position signal. The computational unit is configured to, in use, apply a conversion to the position signal to obtain a signal representing a position of the first member relative to the second member; and apply an adjustment to the conversion to at least partly compensate for a drift of the first part or the second part or both. The adjustment is based on a predetermined drift characteristic of the first part or the second part or both respectively. The predetermined drift characteristic includes one or more base shapes of the first part and/or the second part. | 02-28-2013 |
20130201466 | Lithographic Apparatus and Device Manufacturing Method - A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam. | 08-08-2013 |