Patent application number | Description | Published |
20090284730 | Substrate Handler, Lithographic Apparatus and Device Manufacturing Method - An apparatus, method, and system is provided to condition a substrate. The apparatus can include a substrate handler, an array of diodes, and a projection system. The substrate handler can include a conditioning device, a float device, and a displacing device. The array of diodes can be configured to provide a patterned radiation beam, where the projection system projects the patterned radiation beam onto a target portion of a conditioned substrate. | 11-19-2009 |
20100085553 | Lithographic Apparatus and Device Manufacturing Method Utilizing a Substrate Handler - A substrate handler is provided. The substrate handler includes a support surface configured to carry a substrate and a pre-conditioning unit configured to pre-condition the substrate. The substrate handler is configured to move the substrate relative to a substrate table. | 04-08-2010 |
20100165319 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high. | 07-01-2010 |
20110208459 | LITHOGRAPHIC APPARATUS AND METHOD FOR CORRECTING A POSITION OF A STAGE OF A LITHOGRAPHIC APPARATUS - A lithographic apparatus includes a stage to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage; a first position measurement system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measurement direction relative to the reference structure; a second position measurement system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor to correct the first measurement signal with a value dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage and/or the object relative to the reference structure in the measurement direction. | 08-25-2011 |
20130088699 | LITHOGRAPHIC APPARATUS AND METHOD - A lithographic apparatus includes a radiation source configured to produce a radiation beam, and a support configured to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern to form a patterned radiation beam. A chamber is located between the radiation source and patterning device. The chamber contains at least one optical component configured to reflect the radiation beam, and is configured to permit radiation from the radiation source to pass therethrough. A membrane is configured to permit the passage of the radiation beam, and to prevent the passage of contamination particles through the membrane. A particle trapping structure is configured to permit gas to flow along an indirect path from inside the chamber to outside the chamber. The indirect path is configured to substantially prevent the passage of contamination particles from inside the chamber to outside the chamber. | 04-11-2013 |
20140160452 | LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRAPHIC METHOD - A lithographic apparatus is disclosed that includes a modulator to modulate a plurality of beams according to a desired pattern and a donor structure on to which the modulated beams impinge. The donor structure is configured such that the impinging modulated beams cause a donor material to be transferred from the donor structure to the substrate. | 06-12-2014 |
20140192337 | LITHOGRAPHIC APPARATUS, METHOD OF SETTING UP A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus having a programmable patterning device and a projection system. The programmable patterning device is configured to provide a plurality of radiation beams. The projection system has a lens group array configured to project the plurality of radiation beams onto a substrate. The projection system further includes a focus adjuster in an optical path corresponding to a lens group of the lens group array. The focus adjuster has an optical element having substantially zero optical power. | 07-10-2014 |
20140340666 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame. | 11-20-2014 |