| Patent application number | Description | Published |
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| 20090219500 | Lithographic Apparatus and Device Manufacturing Method with Radiation Beam Inspection - A lithographic apparatus can include the following devices: a patterning system, a projection system, and a radiation beam inspection device. The patterning system can be configured to provide a patterned radiation beam. The projection system can be configured to project the patterned radiation beam onto a target portion of a substrate. Further, the radiation beam inspection device can be configured to inspect at least a part of the patterned radiation beam. In a substrate exposure position, the projection system is configured to expose a pattern of radiation on the substrate using the patterned radiation beam and the radiation beam device is configured to move the reflecting device away from a light path of the patterned radiation beam. In a radiation beam inspection position, the radiation beam inspection device is configured to move the reflecting device into the light path of the patterned radiation beam. | 09-03-2009 |
| 20090268182 | METHOD OF MEASURING A LITHOGRAPHIC PROJECTION APPARATUS - A method of measuring a lithographic projection apparatus is described. The method includes imaging a verification mark of a patterning device onto a radiation-sensitive layer held by a substrate table of a lithographic apparatus, wherein the verification mark includes at least a first, a second and a third verification structure that have a mutually different sensitivity profile for a dose setting, a focus setting and a contrast setting. | 10-29-2009 |
| 20100141918 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus includes a radiation system having reflective optical elements constructed and arranged to condition a beam of radiation. The reflective optical elements include a first faceted mirror constructed and arranged to generate a plurality of source images on a second mirror. The lithographic apparatus also includes a facet mask constructed and arranged to selectively mask one or more of the facets of the first faceted mirror. The facet mask includes a masking blade selectively interposable into the beam. | 06-10-2010 |
| 20100321657 | LITHOGRAPHIC PROJECTION APPARATUS AND METHOD OF COMPENSATING PERTURBATION FACTORS - A lithographic projection apparatus including a support structure configured to support a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a substrate holder configured to hold a substrate; a projection system configured to expose the patterned beam of radiation on a target portion of the substrate; and a system configured to compensate one or more perturbation factors by providing an additional beam of radiation to be exposed on the target portion of the substrate, the additional beam of radiation being imparted in its cross-section with an additional pattern which is based on the pattern of the patterning device and on lithographic projection apparatus property data, the lithographic projection apparatus property data characterizing a level and nature of one or more systematic perturbation factors of different lithographic apparatus. | 12-23-2010 |
| 20110153265 | METHOD OF MEASURING PROPERTIES OF DYNAMIC POSITIONING ERRORS IN A LITHOGRAPHIC APPARATUS, DATA PROCESSING APPARATUS, AND COMPUTER PROGRAM PRODUCT - Movements of a lithographic apparatus include dynamic positioning errors on one or more axes which cause corresponding errors which can be measured in the applied pattern. A test method includes operating the apparatus several times while deliberately imposing a relatively large dynamic positioning error at different specific frequencies and axes. Variations in the error in the applied pattern are measured for different frequencies and amplitudes of the injected error across a frequency band of interest for a given axis or axes. Calculation using said measurements and knowledge of the frequencies injected allows analysis of dynamic positioning error variations in frequency bands correlated with each injected error frequency. | 06-23-2011 |
| Patent application number | Description | Published |
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| 20080274886 | TALAROMYCES XYLANASES - Novel polypeptides possessing (endo) xylanase activity are disclosed which can degrade cellulose implant extracts and plant materials. The polypeptides can cleave β-D-xylan polymers at internal (1-4) bonds between adjacent xylopyranosyl units. The amino acid sequence and encoding DNA sequence is given and the polypeptide was used to treat cellulose in the preparation of edible foodstuffs and animal feed. The polypeptides have both arabinoxylanase and xylosidase activity. | 11-06-2008 |
| 20090053362 | NOVEL UPASES AND USES THEREOF - The present invention to newly identified polynucleotide sequences comprising genes that encode novel lipolytic enzymes LIP01-LIP03. The LIP01 enzyme may be isolated from | 02-26-2009 |
| 20100009404 | PRODUCTION OF BETA-LACTAM ANTIBIOTICS - The present invention describes a process for the production of an N-α-amino-hydroxyphenylacetyl or an N-α-aminophenylacetyl β-lactam antibiotic comprising an IPNS-catalysed conversion of a precursor tripeptide hydroxyphenylglycyl-cysteinyl-valine (HpgCV) or phenylglycyl-cysteinyl-valine (PgCV), respectively, to the N-hydroxyphenylglycyl or the N-phenylglycyl β-lactam antibiotic, respectively. The tripeptide HpgCV or the tripeptide PgCV may further be prepared by contacting the amino acids hydroxyphenylglycine (Hpg) or phenylglycine (Pg), cystein (C) and valine (V) with a non-ribosomal peptide synthetase (NRPS) to effect formation of the tripeptide HpgCV or the tripeptide PgCV, the NRPS comprising a first module M1 specific for Hpg or Pg, a second module M2 specific for C and a third module M3 specific for V An IPNS is further provided having an improved activity in this conversion, as well as an NRPS catalysing the formation of the tripeptides. Also a host cell is provided capable of fermentatively producing β-lactam antibiotics with N-α-amino-hydroxyphenylacetyl or an N-α-aminophenylacetyl side chains. | 01-14-2010 |
| 20100136169 | NOVEL ASPARAGINASES AND USES THEREOF - The present invention relates to an asparaginase having the width of the pH activity profile which is at least 3.5. Furthermore the invention relates to newly identified asparaginase polypeptide according to any one of SEQ ID NO: 2 or SEQ ID NO: 4 and to variants thereof and to polynucleotide sequences that encode such novel asparaginase variants. Furthermore the invention relates to the use of these novel asparaginase variants in industrial processes. | 06-03-2010 |
| 20100217032 | PROCESS FOR PREPARING PRAVASTATIN - The present invention provides a polypeptide having an amino acid sequence according to SEQ ID NO 3, SEQ ID NO 6 or SEQ ID NO 43-59. The present invention also provides a polynucleotide comprising a DNA sequence encoding these polypeptides and a method for isolating polynucleotides encoding polypeptides capable of improving the compactin into pravastatin conversion. Furthermore, the present invention provides a method for producing pravastatin and a pharmaceutical composition comprising pravastatin. | 08-26-2010 |
