Van Abeelen, NL
Frank Anton Van Abeelen, Eindhoven NL
Patent application number | Description | Published |
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20090213568 | MULTI VIEW DISPLAY DEVICE - A multi view display comprising a light emitting element having an optical cavity formed by a first and a second reflecting layer, at least said second reflecting layer being semi-transparent, and a light emitting layer arranged between said reflecting layers, wherein said optical cavity is designed so that light emitted in at least two preferred viewing directions has a higher intensity than light emitted in other directions. The invention is based on interference phenomena in the optical cavity, making it possible to realize a light emitting element that intrinsically emits more light in the preferential viewing directions than in other directions. This emission profile makes the light emitting element very useful in a multi view display, reducing the problems of cross talk. | 08-27-2009 |
20100118383 | REFLECTIVE DISPLAY AND METHOD FOR MANUFACTURING SUCH A DISPLAY - The invention relates to a reflective display ( | 05-13-2010 |
20120098663 | TAMPER PROTECTION SYSTEM FOR PREVENTING THEFT OF CARGO - A tamper protection system ( | 04-26-2012 |
20130131762 | Phototherapy Method and Device - A method of biostimulating phototherapy is provided. The method comprises illuminating a subject's body portion ( | 05-23-2013 |
20130170158 | Knitted textile substrate with different stitch patterns and electronic textile - A knitted substrate ( | 07-04-2013 |
20130176737 | ELECTRONIC TEXTILE AND METHOD OF MANUFACTURING AN ELECTRONIC TEXTILE - A method of manufacturing an electronic textile ( | 07-11-2013 |
20140094879 | LIGHT-EMITTING DEVICE AND PHOTO-THERAPY DEVICE COMPRISING A LIGHT-EMITTING DEVICE - A light-emitting device ( | 04-03-2014 |
20140334113 | ELECTRONIC TEXTILE WITH MEANS FOR FACILITATING WASTE SORTING - According to the present invention, an electronic textile ( | 11-13-2014 |
Hendrikus Johannes Marinus Van Abeelen, Moergestel NL
Patent application number | Description | Published |
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20090279061 | LITHOGRAPHIC APPARATUS AND METHOD - A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table. | 11-12-2009 |
20100085551 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a mirror block provided with a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the mirror block is constructed and arranged to reduce slip between the mirror block and the substrate table. Slip can occur if the acceleration of the mirror block is high and the substrate table slips locally with respect to the mirror block. Slip may lead to exposure errors since the position of the substrate is no longer determined with the desired accuracy. | 04-08-2010 |
20130094005 | SUPPORT TABLE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate. | 04-18-2013 |