Patent application number | Description | Published |
20080220612 | PROTECTION OF POLYMER SURFACES DURING MICRO-FABRICATION - A method of protecting a polymeric layer from contamination by a photoresist layer. The method includes: (a) forming a polymeric layer over a substrate; (b) forming a non-photoactive protection layer over the polymeric layer; (c) forming a photoresist layer over the protection layer; (d) exposing the photoresist layer to actinic radiation and developing the photoresist layer to form a patterned photoresist layer, thereby exposing regions of the protection layer; (e) etching through the protection layer and the polymeric layer where the protection layer is not protected by the patterned photoresist layer; (f) removing the patterned photoresist layer in a first removal process; and (g) removing the protection layer in a second removal process different from the first removal process. | 09-11-2008 |
20080220613 | PROTECTION OF POLYMER SURFACES DURING MICRO-FABRICATION - A method of protecting a polymeric layer from contamination by a photoresist layer. The method includes: (a) forming a polymeric layer over a substrate; (b) forming a non-photoactive protection layer over the polymeric layer; (c) forming a photoresist layer over the protection layer; (d) exposing the photoresist layer to actinic radiation and developing the photoresist layer to form a patterned photoresist layer, thereby exposing regions of the protection layer; (e) etching through the protection layer and the polymeric layer where the protection layer is not protected by the patterned photoresist layer; (f) removing the patterned photoresist layer in a first removal process; and (g) removing the protection layer in a second removal process different from the first removal process. | 09-11-2008 |
20090155727 | METHOD OF FORMING A FLAT MEDIA TABLE FOR PROBE STORAGE DEVICE - A method of forming a flat media table for a probe-based storage device includes applying a first-photo-resistive coating to one side of a silicon wafer and a second photo-resistive coating to an opposite side of the silicon wafer. The silicon wafer includes a table layer, a suspension layer and a spacer layer sandwiched therebetween. The first photoresistive coating is applied to the table layer and the second photoresistive coating is applied to the suspension layer. A first pattern is formed through photolithography in the second photoresistive coating and etched into the suspension layer. A second pattern is formed through photolithography in the first photoresistive coating and etched into the table layer. A portion of the table layer is released from the suspension layer though selective etching of the spacer layer so as to form a plurality of stand-offs defined by remaining portions of the spacer layer. | 06-18-2009 |
20100077516 | PLATINUM SILICIDE TIP APICES FOR PROBE-BASED TECHNOLOGIES - Tips including a platinum silicide at an apex of a single crystal silicon tip are provided herein. Also, techniques for creating a tip are provided. The techniques include depositing an amount of platinum (Pt) on a single crystal silicon tip, annealing the platinum and single crystal silicon tip to form a platinum silicide, and selectively etching the platinum with respect to the formed platinum silicide. | 03-25-2010 |
20120222294 | METHOD FOR PRODUCING AN INTEGRATED DEVICE - An article for producing an integrated device includes a deformable layer and one or more components releasably attached on one surface of the deformable layer. | 09-06-2012 |
20120285017 | MULTILAYER MICROFLUIDIC PROBE HEAD AND METHOD OF FABRICATION THEREOF - A microfluidic probe head includes a first layer, a second layer, and a first tubing port extending from an upper face of the first layer. The first layer has a first via, enabling fluid communication between the first port and a lower face of the first layer. The second layer includes a first aperture on a face, and a first microchannel enabling fluid communication between an upper face of the second layer, facing the lower face of the first layer, and the first aperture. The head enables fluid communication between the first via and the first microchannel. At least a portion of the first microchannel is a groove open on the upper face of the second layer, closed by a portion of a lower face of a layer of the head. The probe head further comprises a second tubing port, a second via, a second aperture and a second microchannel. | 11-15-2012 |
20140059843 | FOUR TERMINAL NANO-ELECTROMECHANICAL SWITCH WITH A SINGLE MECHANICAL CONTACT - A nano-electro-mechanical switch includes an input electrode, a body electrode, an insulating layer, an actuator electrode, an output electrode, and a cantilever beam adapted to flex in response to an actuation voltage applied between the body electrode and the actuator electrode. The cantilever beam includes the input electrode, the body electrode and the insulating layer, the latter separating the body electrode from the input electrode, the cantilever beam being configured such that, upon flexion of the cantilever beam, the input electrode comes in contact with the output electrode at a single mechanical contact point at the level of an end of the cantilever beam. | 03-06-2014 |
20140061013 | FOUR TERMINAL NANO-ELECTROMECHANICAL SWITCH WITH A SINGLE MECHANICAL CONTACT - A nano-electro-mechanical switch includes an input electrode, a body electrode, an insulating layer, an actuator electrode, an output electrode, and a cantilever beam adapted to flex in response to an actuation voltage applied between the body electrode and the actuator electrode. The cantilever beam includes the input electrode, the body electrode and the insulating layer, the latter separating the body electrode from the input electrode, the cantilever beam being configured such that, upon flexion of the cantilever beam, the input electrode comes in contact with the output electrode at a single mechanical contact point at the level of an end of the cantilever beam. | 03-06-2014 |