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Ui, Tokyo
Akio Ui, Tokyo JP
| Patent application number | Description | Published |
|---|---|---|
| 20090078678 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD - A plasma processing apparatus for processing a substrate using plasma includes a first electrode configured to mount the substrate, a second electrode disposed to face the first electrode with a predetermined space, a chamber containing the first electrode and the second electrode, the chamber being capable of adjusting an inside atmosphere, a first electric power source device configured to apply a first RF voltage for controlling a self-bias voltage generated on the substrate to the first electrode, the first electric power source device applying a substantially constant width and a substantially constant value in a peak-to-peak voltage of an RF voltage of a first frequency at intervals, and a second electric power source device configured to apply a second RF voltage of a second frequency for generating plasma between the first and second electrodes to one of the first electrode and the second electrode. | 03-26-2009 |
| 20090194508 | SUBSTRATE PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD - A substrate plasma processing apparatus includes a substrate holding electrode and a counter electrode which are arranged in a chamber, a high frequency generating device which applies a high frequency of 50 MHZ or higher to the substrate holding electrode, a DC negative pulse generating device which applies a DC negative pulse voltage in a manner of superimposing on the high frequency, and a controller controlling to cause intermittent application of the high frequency and cause intermittent application of the DC negative pulse voltage according to the timing of on or off of the high frequency. | 08-06-2009 |
| 20100072172 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - There are provided a substrate processing apparatus and a substrate processing method realizing an effective reduction of a voltage change of a substrate on an electrode to reduce the variation of incident energy of ions entering the substrate. The substrate processing apparatus includes: a first electrode holding a substrate on a main surface of the first electrode; a second electrode facing the first electrode; a RF power source applying to the first electrode a RF voltage whose frequency is equal to or higher than 40 MHz; and a pulse voltage applying unit applying to the first electrode a pulse voltage decreasing in accordance with a lapse of time, by superimposing the pulse voltage on the RF voltage. | 03-25-2010 |
| 20110223750 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR MANUFACTURING APPARATUS - According to an embodiment, a method for manufacturing a semiconductor device is disclosed. The method includes: arranging a semiconductor substrate on a first electrode out of first and second electrodes arranged to be opposed to each other in a vacuum container; applying negative first pulse voltage and radio-frequency voltage to the first electrode, the negative first pulse voltage being superimposed with the radio-frequency voltage; applying negative second pulse voltage to the second electrode in an off period of the first pulse voltage; and processing the semiconductor substrate or a member on the semiconductor substrate by plasma formed between the first and second electrodes. | 09-15-2011 |
| 20120080408 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS - A substrate processing method using a substrate processing apparatus includes a first step and a second step. The first step is to apply a negative voltage pulse from a pulsed power supply to be included in the apparatus. The second step is to apply floating potential for an interval of time between the negative voltage pulse and a positive voltage pulse from the pulsed power supply subsequent to the negative voltage pulse. In addition, the apparatus includes a chamber, a first electrode, a second electrode, an RF power supply, and the pulsed power supply. The second electrode is provided so that the second electrode faces the first electrode to hold a substrate. The RF power supply applies an RF voltage having a frequency of 50 MHz or higher to the second electrode. The pulsed power supply repeatedly applies a voltage waveform with the RF voltage to the second electrode. | 04-05-2012 |
| 20120228263 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - In one embodiment, a substrate processing apparatus, includes: a chamber; a first electrode disposed in the chamber; a second electrode disposed in the chamber to face the first electrode, and to hold a substrate; an RF power supply to apply an RF voltage with a frequency of 50 MHz or more to the second electrode; and a pulse power supply to repeatedly apply a voltage waveform including a negative voltage pulse and a positive voltage pulse of which delay time from the negative voltage pulse is 50 nano-seconds or less to the second electrode while superposing on the RF voltage. | 09-13-2012 |
Kazuhisa Ui, Tokyo JP
| Patent application number | Description | Published |
|---|---|---|
| 20090027887 | LIGHTING FIXTURE - Multiple light emitting device modules can be configured to illuminate in multiple different directions, while avoiding deterioration of radiation efficiency by use of fins. In a lighting fixture, multiple light emitting device modules can each have fins for radiating heat generated by the light emitting device. The multiple light emitting device modules can be arranged in such a manner that a main optical axis line of one light emitting device module and main optical axis lines of any other light emitting device modules form an angle larger than zero degrees, or are in a skewed position, and the fins can be arranged in such a manner that all the fins are parallel with respect to a vertical plane and roots of the fins are positioned at the same level as or lower than tips of the fins. | 01-29-2009 |
Keisuke Ui, Tokyo JP
| Patent application number | Description | Published |
|---|---|---|
| 20090123749 | Unit Optical Fiber - The present invention provides an optical fiber superior in yellowing resistance. An optical fiber according to the present invention has a coating made from a UV curable resin formed on the outer surface of a bare optical glass fiber, and is characterized in that the coated material includes an unreacted photoinitiator in an amount of 2.4×10 | 05-14-2009 |
| 20110059236 | OPTICAL FIBER - The present invention provides an optical fiber superior in yellowing resistance. An optical fiber according to the present invention has a coating made from a UV curable resin formed on the outer surface of a bare optical glass fiber, and is characterized in that the coated material includes an unreacted photoinitiator in an amount of 2.4×10 | 03-10-2011 |
| 20110177257 | METHOD OF MANUFACTURING OPTICAL FIBER - A method of manufacturing an optical fiber, comprises applying a UV cured resin to an outer circumference of a running glass optical fiber, forming an accompanying flow composed of an inert gas near a surface of the resin by passing the glass optical fiber immediately after having the resin being applied through an atmosphere of the inert gas, and forming a coating by irradiating the resin coated with the accompanying flow with ultraviolet ray to cure the resin while the glass optical fiber accompanied by the accompanying flow is passed through a UV transmission tube to which a gas containing oxygen is supplied. | 07-21-2011 |
Makoto Ui, Tokyo JP
| Patent application number | Description | Published |
|---|---|---|
| 20120269563 | TRANSPORTING DEVICE AND IMAGE FORMING APPARATUS USING THE SAME - In a transporting device that transports a sheet of paper which is transporting on a first direction, a control unit has a detection-unit-cleaning mode in which when roller members move to a second direction, which is perpendicular to the first direction, to perform a correction of the positional deflection of the sheet of paper, the control unit controls the roller members to move the sheet of paper to an outside position from an image forming position and a position of the side end of the sheet of paper when the sheet of paper passes through the detection unit, and then to move the sheet of paper to the image forming position, based on the image forming position and the position of a side end of the sheet of paper, which is detected by a detection unit. | 10-25-2012 |
Shunji Ui, Tokyo JP
| Patent application number | Description | Published |
|---|---|---|
| 20090169177 | STREAM MULTIPLEXING APPARATUS, STREAM MULTIPLEXING METHOD, AND RECORDING MEDIUM - The present invention provides a stream multiplexing apparatus, a stream multiplexing method, and a recording medium capable of, easily and seamlessly and without holding redundant data, reproducing each of a plurality of stories which share at least one system stream. A stream multiplexing apparatus according to the present invention includes a multiplexing control unit. In the multiplexing of a system stream included in a first group and a system stream, subject to be selectively and seamlessly reproduced subsequently to the system stream included in the first group, included in a second group, the multiplexing control unit controls the multiplexing of respective system streams such that the difference between a video and an audio reproduction end times of the system stream included in the first group is equalized with the difference between a video and an audio reproduction start times of the system stream included in the second group. | 07-02-2009 |
Takaharu Ui, Tokyo JP
| Patent application number | Description | Published |
|---|---|---|
| 20090049538 | Identifier Authenticating System - There is provided an identifier authenticating system in which information requesting users can share all the predetermined information held in a plurality of information providing servers. In the identifier authentication system, when an identifier holding user | 02-19-2009 |
| 20090106259 | Identifier Authenticating System - There is provided an identifier authenticating system in which information requesting users can share all predetermined information held in a plurality of information providing servers. In the identifier authenticating system, when an identifier holding user | 04-23-2009 |
| 20090106354 | Identifier Authentication System - There is provided an identifier authentication system in which information requesting users can share all predetermined information held in a plurality of information providing servers. | 04-23-2009 |