Tzu-Ching
Tzu-Ching Chao, Chia-Yi TW
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20090045537 | METHOD OF SENSING MELT-FRONT POSITION AND VELOCITY - A method of sensing melt-front position and velocity is applicable for injection-molding systems. Firstly, at least one actuation signal value of the melt-injection device of the injection-molding system is retrieved, and at least one state variable value of the injection-molding system is measured. Then, the retrieved actuation signal values and the measured state variable values are substituted into a plurality of simultaneous equations to calculate the melt-front position and velocity of the injection-molding system. | 02-19-2009 |
Tzu-Ching Huang, Taipei TW
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20090174613 | ARRAY ANTENNA AND ELECTRONIC APPARATUS USING THE SAME - An array antenna and an electronic apparatus using the array antenna are provided. The array antenna includes a plurality of antenna units, a first connection line, and a second connection line. Each of the antenna units includes a rectangular radiation region, a first feeding line and a second feeding line. The first and second feeding lines are connected to two adjacent feeding corners of the rectangular radiation region. The first connection line and the second connection line are disposed at two sides of the antenna unit for connection with the other ends of the first feeding line and the second feeding line, respectively. | 07-09-2009 |
Tzu-Ching Lin, Taipei TW
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20130143407 | METHOD FOR PRODUCING A THIN SINGLE CRYSTAL SILICON HAVING LARGE SURFACE AREA - The present invention relates to a method for producing a thin single crystal silicon having large surface area, and particularly relates to a method for producing a silicon micro and nanostructure on a silicon substrate (or wafer) and lifting off the silicon micro and nanostructure from the silicon substrate (or wafer) by metal-assisted etching. In this method, a thin single crystal silicon is produced in the simple processes of lifting off and transferring the silicon micro and nanostructure from the substrate by steps of depositing metal catalyst on the silicon wafer, vertically etching the substrate, laterally etching the substrate. And then, the surface of the substrate is processed, for example planarizing the surface of the substrate, to recycle the substrate for repeatedly producing thin single crystal silicons. Therefore, the substrate can be fully utilized, the purpose of decreasing the cost can be achieved and the application can be increased. | 06-06-2013 |
Tzu-Ching Lin, New Taipei City TW
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20150052432 | ELECTRONIC DEVICE AND CONTROL METHOD - An electrical device includes an input device, an application recorder and a control unit. The input unit is configured to receive a first enabling signal at a first time and a second enabling signal at a second time, respectively. The application recorder is configured to record the plurality of applications which have been executed by the electrical device. At the first time, the first application is the latest-executed among the plurality of applications. The control unit obtains a first metadata of a first application from the application recorder and links a first memo data input by the user to the first metadata. At the second time, the second application is the latest-executed among the plurality of applications. The control unit obtains a second metadata of a second application and links a second memo data input by the user to the second application. | 02-19-2015 |
Tzu-Ching Meng, Taipei CN
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20160033502 | COMPOSITIONS AND METHODS FOR DETECTION OF PROTEIN S-NITROSYLATION AND OXIDATION - The present invention discloses a novel isolated antibody that specifically binds to an N-phenyl-acetamide group. Also disclosed are related compositions, kits, methods for detecting protein S-nitrosylation or oxidation vivo or in vitro, and drug screening methods. | 02-04-2016 |
Tzu-Ching Yang, Hsinchu TW
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20150259826 | EPITAXIAL GROWTH SYSTEMS - Disclosed is about an epitaxial growth system, including an epitaxial growth reactor chamber; a susceptor disposed in the epitaxial growth reactor chamber, wherein the susceptor includes a top surface and a side surface; a plurality of wafer fixing elements disposed on the top surface, and each of the wafer fixing elements has a boundary; a plurality of first heating elements directly under the susceptor arranged in parallel to the top surface; and a second heating element disposed directly under the outermost first heating element; wherein no other heating elements are disposed directly under the first heating elements other than the outermost first heating element; and wherein the first and the second heating elements are independently controllable. | 09-17-2015 |
20150259827 | SUSCEPTOR - A susceptor, comprises: a bottom structure comprising atop surface; and a top structure detachably attached to the bottom structure comprising: a central part; and a peripheral part surrounding the central part and comprising a lower surface facing the bottom structure, wherein an outermost part of the lower surface distal from the central part is exposed and a part of the lower surface between the outermost part of the lower surface and the central part is connected to the top surface. | 09-17-2015 |
Tzu-Ching Yang, Taipei City TW
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20100284256 | METHOD FOR IMPROVING READABILITY OF AN OPTICAL DISC, AND ASSOCIATED OPTICAL STORAGE APPARATUS - A method for improving readability of an optical disc includes: changing a first control parameter of an optical storage apparatus that accesses the optical disc and obtaining a plurality of associated values of an index corresponding to the readability of the optical disc for respective changed/unchanged values of the first control parameter; setting the first control parameter to be an optimal value out of the changed/unchanged values of the first control parameter according to the index; changing a second control parameter with the first parameter set to be the optimal value to obtaining a plurality of associated values of the index for respective changed/unchanged values of the second control parameter; and setting the second control parameter to be an optimal value according to the index. The control parameters having their individual optimal values are utilized for further control during decoding. In addition, an associated optical storage apparatus is further provided. | 11-11-2010 |
Tzu-Ching Yen, Kaohsiung City TW
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20090191723 | METHOD OF PERFORMING LITHOGRAPHIC PROCESSES - Method of performing lithographic processes on a wafer in a lithographic apparatus having multiple stages. First, a lithographic apparatus including a first wafer chuck and a second wafer chuck is provided. Subsequently, a cassette including a plurality of wafers is provided in the lithographic apparatus, and each wafer has a wafer identification. Thereafter, the first wafer chuck is set for holding the wafers having odd wafer identifications, and the second wafer chuck is set for holding the wafers having even wafer identifications. Next, a first lithographic process is performed on each wafer by the lithographic apparatus. | 07-30-2009 |