Patent application number | Description | Published |
20100007862 | EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An apparatus that projects a pattern of an original, onto a substrate held by a substrate stage having a top plate, to expose the substrate, comprises a cleaning unit, the cleaning unit including a discharge nozzle configured to discharge a fluid toward the top plate, and a recovery nozzle configured to recover the fluid discharged from the discharge nozzle, wherein an opening of the recovery nozzle has a shape which surrounds a path of the fluid discharged from the discharge nozzle. | 01-14-2010 |
20100282278 | EXPOSURE APPARATUS, CLEANING METHOD, AND DEVICE MANUFACTURING METHOD - The exposure apparatus of the present invention includes a cleaning nozzle that discharges a cleaning liquid or a rinsing liquid so as to clean a member that forms a space between a end surface of the projection optical system and a surface of the substrate stage facing the end surface and clean a member that is present in the space, a cleaning liquid supply unit configured to supply the cleaning liquid to the cleaning nozzle, a rinsing liquid supply unit configured to supply the rinsing liquid to the cleaning nozzle, and a control unit configured to control the supply from the cleaning liquid supply unit and the rinsing liquid supply unit. The control unit carries out control such that the rinsing liquid is supplied successively with the discharge of the cleaning liquid before and after the discharge of the cleaning liquid from the cleaning nozzle. | 11-11-2010 |
20120080820 | IMPRINTING METHOD - Provided is an imprinting method for transferring a pattern formed on a mold to a substrate, the imprinting method including applying a resin to a predetermined shot area on the substrate; moving the shot area from an application position to an imprinting position; supplying gas to the shot area; and imprinting the mold into the shot area, wherein, in the gas supply step, gas is supplied only from a gas supplying unit located above a moving path extending from the application position to the imprinting position, and the supply of the gas is started before the shot area passes beneath the gas supplying unit to thereby supply the gas to the shot area while moving it. | 04-05-2012 |
20130113136 | IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE - The present invention provides an imprint apparatus which performs an imprint process, the apparatus including a holding unit configured to hold a mold, a stage configured to hold a substrate, and a control unit configured to control the imprint process, wherein in the imprint process for an outer peripheral shot region among shot regions on the substrate, the control unit controls at least one of the holding unit and the stage to relatively rotate the mold and the substrate so that an outermost portion, in a radial direction of the substrate, of the imprint material supplied to the outer peripheral shot region at least partially separates from the mold last. | 05-09-2013 |
20140312532 | IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD - Provided is an imprint apparatus that imprints a pattern formed on a mold onto a substrate. The imprint apparatus includes a substrate holder that holds the substrate and can move in a direction along the surface of the substrate; a gas supply unit for supplying a gas into a space between a pattern part of the mold and the substrate; and a wall part that is disposed so as to enclose the space that is supplied with gas, wherein at a position opposed to the substrate and the mold, the wall part faces the substrate holder or the substrate with a gap therebetween. | 10-23-2014 |
20150158243 | IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE - The present invention provides an imprint apparatus which forms a pattern on a substrate, the apparatus including a supply unit including a discharge outlet which discharges the imprint material and configured to supply the imprint material onto the substrate via the discharge outlet, and a generation unit configured to generate ions by irradiating, with soft X-rays, a second space away from a first space between the mold and the substrate, wherein the discharge outlet and the generation unit are arranged to sandwich a side face of the mold, and a charge is removed in the first space by supplying the ions generated in the second space to the first space. | 06-11-2015 |
20150174816 | IMPRINT APPARATUS, FOREIGN PARTICLE REMOVAL METHOD, AND METHOD OF MANUFACTURING ARTICLE - The present invention provides an imprint apparatus which performs an imprint process of molding an imprint material on a substrate using a mold and forming a pattern on the substrate, the apparatus including a substrate chuck configured to hold the substrate, a protective plate configured to surround the substrate chuck, and a suction mechanism configured to suction at least a part of a gap between the substrate chuck and the protective plate, wherein while the suction mechanism suctions at least the part of the gap, the substrate chuck holds a plate which is different from the substrate on which the pattern is to be formed. | 06-25-2015 |
20150343680 | APPLICATION DEVICE, IMPRINTING APPARATUS, AND METHOD FOR MANUFACTURING OBJECT - Provided is an application device capable of extracting an imprinting material in which impurities are mixed from a container of the application device and supplying new imprinting material to the container of the application device. | 12-03-2015 |
20160001493 | IMPRINT APPARATUS, IMPRINT SYSTEM, AND METHOD OF MANUFACTURING ARTICLE - The present invention provides an imprint apparatus which performs an imprint process of dispensing an imprint material on a substrate and forming the imprint material dispensed on the substrate by using a mold, the apparatus comprising a dispensing unit configured to dispense an imprint material on the substrate, and including a tank which contains an imprint material, a dispenser which discharges the imprint material contained in the tank to the substrate, and a detection unit which detects a remaining amount of imprint material contained in the tank; and a control unit configured to perform control to supply an imprint material to the tank or exchange the dispensing unit based on a detection result obtained by the detection unit. | 01-07-2016 |
20160026084 | LIQUID DISCHARGE APPARATUS, IMPRINT APPARATUS, AND ARTICLE MANUFACTURING METHOD - A liquid discharge apparatus includes: a container divided by a dividing member into a first chamber configured to contain a first liquid to be discharged from a discharge port and a second chamber configured to contain a second liquid; a supply unit configured to supply the second liquid into the second chamber in accordance with decrease of the first liquid contained in the first chamber; and a measurement unit configured measure flow of the first liquid into the second chamber. | 01-28-2016 |