Patent application number | Description | Published |
20090045534 | SYSTEM, METHOD, AND APPARATUS FOR MEMBRANE, PAD, AND STAMPER ARCHITECTURE FOR UNIFORM BASE LAYER AND NANOIMPRINTING PRESSURE - A nanoimprinting system incorporates a patterned media contact architecture to provide a uniform imprinting pressure across the target imprinting area on a disk substrate. The system leverages the unique disk substrate characteristic of an inner diameter hole by incorporating a membrane suspension, gel-pad buffering, and air cushion loading that exploits the inner diameter hole characteristics of the disk substrate. This design dramatically increases the uniformity of the pressing pressure across the target imprinting area. As a result, a simple and effective improvement of the quality of the patterns imprinted on the recording disk substrate is realized. | 02-19-2009 |
20090139314 | SYSTEM, METHOD AND APPARATUS FOR OBTAINING TRUE ROUGHNESS OF GRANULAR MEDIA - The true roughness of highly granular perpendicular media is measured by forming an inverse replica of the surface of the media. The invention enables AFM measurements of granular media valley depth to more consistently predict the corrosion performance of the media. A liquid resist is used to first replicate the media topography and form the inverse replica. The narrow valleys in the original media are precisely modeled as sharp peaks on the replica. The height of the peaks are readily measured with an AFM tip. The resulting image is a negative of the original surface. | 06-04-2009 |
20100018945 | SYSTEM, METHOD AND APPARATUS FOR BATCH VAPOR DEPOSITION OF ADHESION PROMOTER FOR MANUFACTURING DISCRETE TRACK MEDIA AND BIT-PATTERNED MEDIA, AND MONO-MOLECULAR LAYER LUBRICANT ON MAGNETIC RECORDING MEDIA - A batch vapor deposition process for applying adhesion promoter during manufacturing of nanoimprinted discrete track media and bit-patterned media, and mono-molecular layer lubricant on magnetic recording media are disclosed. The adhesion promoter is simultaneously coated on both sides of numerous disk substrates, and minimal solution is wasted. In another step, the lubricant is applied at a uniform thickness that is on the order of a single molecular layer. The lubricant is also applied on the entire disk surfaces while processing multiple disks at a time. Batch processing increases throughput, and vapor lubricant reduces costs compared to conventional techniques. Limited air exposure controls bonding and monolayer adsorption guarantees uniformity. | 01-28-2010 |
20100117256 | SELF-RELEASING RESIST MATERIAL FOR NANO-IMPRINT PROCESSES - Nanoimprint lithography using resist material with the addition of a surfactant is described. A template release layer is formed on a pattern of a template. A non-ionic surfactant is added to a resist material to form a mixed resist material. The resist material may comprise a hydrocarbon material having an unsaturated bond, such as an acrylate material. The surfactant may comprise polyakylene glycol or an organically modified polysiloxane. A resist layer is then formed on a substrate from the mixed resist material. The surfactant added to the resist material forms a resist release layer on the surface of the resist layer. The template is then pressed into the resist layer, where the template release layer and the resist release layer are between the pattern of the template and the resist layer. | 05-13-2010 |
20110074062 | SYSTEM, METHOD AND APPARATUS FOR MANUFACTURING MAGNETIC RECORDING MEDIA - A system, method and apparatus for manufacturing high density magnetic media is disclosed. A flexible mold having a very low modulus of less than about | 03-31-2011 |
20140242341 | PATTERN TONE REVERSAL - A method for patterning a substrate is disclosed. Depressions are patterned into a resist layer over a substrate. A mask layer is deposited over the resist layer at least partially filling the depressions. The mask layer is etched to expose a top surface of the resist layer and leaving at least a portion of the mask layer in the depressions of the resist layer, wherein the mask layer over said top surface of the resist layer is etched at a faster rate than said mask layer in the depressions of the resist layer. Exposed portions of the resist layer are removed to expose portions of the substrate. Exposed portions of the substrate are etched. | 08-28-2014 |
20150044321 | SYSTEM, METHOD AND APPARATUS FOR MANUFACTURING MAGNETIC RECORDING MEDIA - A system, method and apparatus for manufacturing high density magnetic media is disclosed. A flexible mold having a very low modulus of less than about 4 GPa is made on a rigid support. The mold nano-imprints a resist material on disks for hard disk drives. The flexible mold may comprise a perfluoropolyether with urethane acrylate end groups with a low surface adhesion from which the cured resist is easily released. | 02-12-2015 |
20160064026 | METHOD FOR MAKING A PATTERNED PERPENDICULAR MAGNETIC RECORDING DISK USING GLANCING ANGLE DEPOSITION OF HARD MASK MATERIAL - A method for making a bit-patterned media (BPM) magnetic recording disk by etching the recording layer using a patterned hard mask layer uses glancing angle deposition (GLAD) of additional hard mask material as a capping layer onto the tops of the patterned hard mask pillars while the disk is rotated about an axis orthogonal to the plane of the disk. In one embodiment the capping layer is deposited after the pillars have been only partially eroded during a partial ion-milling of the recording layer. Ion-milling is then again performed to remove the remaining recording layer material. In another embodiment, before ion-milling of the recording layer, the capping layer is deposited onto the tops of the un-eroded hard mask pillars. This increases the lateral dimension of the hard mask pillars so that after ion-milling of the recording layer, the magnetic islands have an increased lateral dimension. | 03-03-2016 |