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True, CA
Bruce True, Campbell, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20110234790 | TIME RESOLVED PHOTOLUMINESCENCE IMAGING SYSTEMS AND METHODS FOR PHOTOVOLTAIC CELL INSPECTION - A time-resolved photoluminescence technique is disclosed to image photovoltaic cells and wafers. The effective lifetime is measured directly using a photodetector that has a fast response. A pulsed light source flashes the wafer, generating excess carriers in the silicon. The rate of carrier recombination is monitored by imaging the photoluminescence decay over time. An effective lifetime can be extracted from the photoluminescence decay curve, which can be used to determine the quality of the photovoltaic cells and wafers. | 09-29-2011 |
Emily True, Pleasanton, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20110058731 | Dual-sided substrate measurement apparatus and methods - An apparatus for measuring the relative positions of frontside and backside alignment marks located on opposite sides of a substrate is disclosed. The apparatus includes upper and lower optical systems that allow for simultaneous imaging of frontside and backside alignment marks. The frontside and backside alignment mark images are processed to determine the relative position of the marks, as a measurement of the alignment and/or overlay performance of the tool that formed the marks on the substrate. | 03-10-2011 |
Emily True, San Ramon, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20110038704 | Sub-field enhanced global alignment - Sub-field enhanced global alignment (SEGA) methods for aligning reconstituted wafers in a lithography process are disclosed. The SEGA methods provide the ability to accommodate chip placement errors for chips supported by a reconstituted wafer when performing a lithographic process having an overlay requirement. The SEGA methods include measuring chip locations to determine sub-fields of the reconstituted wafer over which enhanced global alignment (EGA) can be performed on the chips therein to within the overlay requirement. The SEGA methods further included individually performing EGA over the respective sub-fields. The SEGA methods take advantage of the benefits of both EGA and site-by-site alignment and are particularly applicable to wafer-level packing lithographic processes such as fan-out wafer-level packaging. | 02-17-2011 |
Randall True, San Francisco, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20100227770 | Brownian microbarcodes for bioassays - An encoded microparticle, methods for using the same in bioassays, and a method of making the same are provided herein. | 09-09-2010 |
| 20100290018 | Miniaturized Microparticles - A system and method for forming encoded microparticles is described. One embodiment includes a system for forming encoded microparticles, the system comprising a step and repeat exposure system capable of performing a method comprising: printing at a first time a first portion of a code of a microparticle; and printing at a second time after the first time a second portion of the code of the microparticle; and a computer readable medium having a sequence of computer executable instructions for controlling the step and repeat exposure system to perform said method. | 11-18-2010 |
| 20100297336 | Multiple Step Printing Methods for Microbarcodes - A system and method for forming encoded microparticles is described. One embodiment includes a method of forming an encoded microparticle, the method comprising: depositing and patterning a plurality of layers on a substrate so as to form a plurality of microparticles, each microparticle comprising a plurality of separate segments aligned along an axis and representing a code; and releasing the microparticles in order to separate the microparticles from the substrate. | 11-25-2010 |
Randall J. True, San Francisco, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20090149340 | Encoded microparticles - Microparticles including spatially coded microparticles, systems for imaging and methods of detecting such microparticles as well as using the same in bioassays are provided. | 06-11-2009 |
| 20100227279 | Methods for producing codes for microparticles - Methods and apparatus are provided for forming a plurality of encoded microparticles with a printing process to define a code for identifying the microparticles. In some embodiments the printing process includes printing steps performed with photolithography. | 09-09-2010 |
| 20100297448 | MINIATURIZED MICROPARTICLES - A system and method for encoded microparticles is described. One embodiment includes an encoded microparticle comprising a plurality of segments, wherein the plurality of segments form a spatial code; contrast coating on at least one segment of the plurality of segments, wherein the contrast coating further encodes the microparticle; an outer surface, wherein the outer surface encloses the spatial code and contrast coating, and wherein the spatial code and contrast coating are detectable through the outer surface. | 11-25-2010 |
| 20110143967 | SURFACE MODIFICATIONS AND METHODS FOR THEIR SYNTHESIS AND USE - Novel processes are disclosed for forming an array of polymers by functionalizing the surface of particles by methods that include covalently attaching a functionalized silicon compound. Substrates such as microparticles having functionalized silicon compounds attached thereto are produced by introducing at least one carboxyl group directly by silanating a carboxylated silane compound to the surface of a microparticle. In a further aspect of the invention, the silane compound is a dipodal carboxylated silane. | 06-16-2011 |
Richard Brownell True, Sunnyvale, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20110062898 | DUAL ELEMENT SWITCHED ELECTRON GUN - The invention provides an apparatus and method of switching more than one bias voltage within an electron beam tube in order to achieve electron beam cutoff. The invention is particularly useful for high-perveance electron tubes in which a large change in focus-electrode-to-cathode or anode-cathode voltage might otherwise be needed to achieve cutoff. In one embodiment of the invention, the cathode and anode bias voltages are both switched by magnitudes well within the capabilities of standard high-voltage switches to achieve beam cutoff. | 03-17-2011 |