Patent application number | Description | Published |
20080232534 | REFLECTOR CONTROL TYPE FAST REACTOR - A reflector control type fast reactor | 09-25-2008 |
20090175403 | REACTIVITY CONTROLLING APPARATUS AND FAST REACTOR - A fast reactor has a reactivity control assembly including a reactor shutdown rod of a backup reactor shutdown system and neutron absorbers to suppress the initial surplus reactivity, a reactor shutdown rod drive mechanism for releasing the reactor shutdown rod and units of neutron absorber drive mechanism capable of moving the respective neutron absorbers up and down. The reactor shutdown rod and the neutron absorbers are arranged in a wrapper tube. The reactor shutdown rod drive mechanism causes an inner extension tube to fall and release the reactor shutdown rod by means of a gripper section at the lowermost end of an outer extension tube by turning off the power supply to a holding magnet at the time of scram. Each of the units of neutron absorber drive mechanism has a dual tube type drive shaft including an outer extension shaft and an inner extension shaft. When grasping the neutron absorbers, the outer extension shaft is pulled up to allow both of the extension shafts to be inserted. After the outer extension tube gets to the handling head section of the neutron absorber, the outer extension shaft is pushed down to grasp the neutron absorber externally by means of the latch fingers of the gripper section thereof so that the neutron absorber can be moved up and down. | 07-09-2009 |
20090190710 | FAST REACTOR HAVING REACTIVITY CONTROL REFLECTOR - A fast reactor having a reactivity control reflector has a reactor vessel in which a coolant is accommodated, a reactor core which is installed in the reactor vessel and dipped with the coolant, and a reflector installed outside of the reactor core so as to be movable in a vertical direction for controlling the reactivity of the reactor core. The reflector of the fast reactor has a lower neutron reflecting portion having a neutron reflection capability higher than that of the coolant and an upper cavity portion located above the neutron reflecting portion and having a neutron reflection capability lower than that of the coolant. The cavity portion is composed of a plurality of cylindrical hermetically-sealed vessels. | 07-30-2009 |
20090230693 | General purpose engine - The present invention achieves reductions in the weight and size of a general purpose engine provided for a power generation application. An optional external apparatus can be attached to one shaft part of a rotary shaft, and an axial gap type motor/generator constituted by a power generating rotor (inner rotor) and a stator is attached integrally to another shaft part of the rotary shaft. | 09-17-2009 |
20090230694 | General purpose engine - The present invention achieves an improvement in the power generation capacity of a general purpose engine provided for a power generation application while realizing reductions in the weight and size thereof. An optional external apparatus can be attached to one shaft part of a rotary shaft, and an axial gap type motor/generator constituted by power generating rotors (inner and outer rotors) and a stator is attached integrally to another shaft part of the rotary shaft. | 09-17-2009 |
20090230695 | General purpose engine - A general purpose engine is provided with an engine main body, a rotary shaft, and an axial gap type motor/generator. The rotary shaft is rotated by a driving force of the engine main body. The rotary shaft includes a first shaft part disposed on one side portion of the engine main body and a second shaft part disposed on another side portion of the engine main body. The axial gap type motor/generator is attached integrally to the second shaft part. The axial gap type motor/generator is provided with a power generating rotor that rotates integrally with said rotary shaft, and a stator that is attached to the engine main body. The stator is disposed on a side closer to the engine main body than the power generating rotor and at a remove from the power generating rotor. | 09-17-2009 |
20100008463 | NEUTRON SHIELD - A neutron reactor includes a neutron shield which is disposed outside a nuclear reactor core and adapted to absorb neutrons leaking from the core. The neutron shield includes a plurality of containers each of which contains a powdered neutron absorbing material and which are stacked with one another in a vertical direction, and a cladding tube which houses the containers. The neutron absorbing material is composed of B | 01-14-2010 |
20100092877 | METHOD OF MANUFACTURING MASK BLANK AND TRANSFER MASK - In a method of manufacturing a mask blank adapted to be formed with a resist pattern by electron beam writing and having a light-shielding film and an etching mask film of an inorganic-based material resistant to etching of the light-shielding film which are formed in this order on a transparent substrate, when forming the etching mask film, shielding is performed using a shielding plate so as to prevent the etching mask film from being formed at least at a side surface of the substrate. | 04-15-2010 |
20100167185 | PHOTOMASK BLANK MANUFACTURING METHOD AND PHOTOMASK MANUFACTURING METHOD - A thin film made of a material containing a metal and silicon is formed on a light-transmissive substrate. Then, a treatment is performed to modify a main surface of the thin film in advance so that when exposure light having a wavelength of 200 nm or less is accumulatively irradiated on a thin film pattern of a photomask to be produced by patterning the thin film, the transfer characteristic of the thin film pattern does not change more than a predetermined degree. This treatment is performed by carrying out, for example, a heat treatment in an atmosphere containing oxygen at 450° C. to 900° C. | 07-01-2010 |
20100172459 | FAST REACTOR - A fast reactor has: a reactor vessel containing a coolant; a reactor core housed in the reactor vessel; a core supporting plate; a reflector; a partition arranged to surround the reflector on the side of the reactor vessel, for forming a passage of the coolant; a thermal shield arranged to cover at least one of the core side and the reactor vessel side of the partition; and a neutron shield. The thermal shield is mounted on the partition. The thermal shield includes a metallic thermal shield plate and a heat insulator mounted in the thermal shield plate, and has its inside filled with an inert gas. By the thermal shield, the thermal insulation of the partition can be improved to suppress the heat exchange between primary coolants on the core side and on the side of the reactor vessel of the partition. | 07-08-2010 |
20100197478 | CERAMIC SUBSTRATE, PROCESS FOR PRODUCING THE SAME, AND DIELECTRIC-PORCELAIN COMPOSITION - A ceramic substrate is provided as one having a large coefficient of thermal expansion α, having properties suitable for use as a high-frequency substrate, being capable of being fired at a low temperature, and having an excellent substrate strength. The ceramic substrate has a main composition containing Mg | 08-05-2010 |
20100211211 | DRUG DISCOVERY SCREENING APPARATUS - The invention is to provide a drug discovery screening apparatus capable of improving a testing operation efficiency. The drug discovery screening apparatus comprises an image measurement unit, an incubator unit integrally connected to the image measurement unit, a fixed stage disposed at the incubator unit, first conveyance means for taking out one of plates stored in a carousel of the incubator unit and conveying the plate onto the fixed stage, second conveyance means for taking out the plate conveyed onto the fixed stage and conveying the plate onto an XY stage disposed at the image measurement unit, and a control unit, wherein the second conveyance means comprises first and second conveyance arms, respectively supported horizontally by a conveyance unit support section, which convey the plates onto the fixed stage and XY stage so as to allow the respective plates to cross each other. | 08-19-2010 |
20100243296 | DIELECTRIC CERAMIC COMPOSITION AND ELECTRONIC COMPONENT USING THE SAME - A dielectric porcelain composition contains a major component represented by a composition formula (BaO.xTiO | 09-30-2010 |
20110051716 | TV ACTING AS POTS PHONE SWITCH - A TV receives IP calls and POTS calls. When a POTS call is received the TV passively passes the call to a non-IP phone, and when an IP call is received the TV processes the IP packets as appropriate for the non-IP phone and passes the call to the phone. The non-IP phone can also signal using a special code a desired to place an IP call, with the signals from the phone being rendered into IP packets by the TV. In this way, a non-IP phone may be used to place and receive both POTS calls and IP-based calls. | 03-03-2011 |
20110217635 | METHOD OF MANUFACTURING TRANSFER MASK AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - The present invention is a method of manufacturing a transfer mask with use of a mask blank in which a thin film for pattern formation and a chromium-based thin film made of a material containing chromium are stacked on a transparent substrate in this order. The thin film for pattern formation is made of material containing silicon and a transition metal other than chromium. The chromium-based thin film is made of a material containing chromium. Exposure light having a wavelength of 200 nm or less is applied to the transfer mask. In the manufacturing method, the transfer mask is produced by performing, in the following order, a process of forming a resist film having a transfer pattern on the chromium-based thin film, a process of forming a transfer pattern in the chromium-based thin film with use of a mask of the resist film having the transfer pattern, a process of forming a transfer pattern in the thin film for pattern formation with use of a mask of the chromium-based thin film having the transfer pattern, and a process of removing the chromium-based thin film by etching. The manufacturing method further includes a cleaning process of at least one of alkali solution cleaning, hot water cleaning, and ozone-containing water cleaning on the produced transfer mask until a width of the transfer pattern of the thin film for pattern formation is reduced by 4 nm or a space width of the thin film for pattern formation is increased by 4 nm. | 09-08-2011 |
20110244375 | MASK BLANK, TRANSFER MASK, METHODS OF MANUFACTURING THE SAME AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE - In a mask blank for manufacturing a transfer mask, the mask blank has a light-shielding film on a transparent substrate. The light-shielding film is made of a material containing tantalum as a main metal component and includes a highly oxidized layer which has an oxygen content of 60 at % or more and which is formed as a surface layer of the light-shielding film. The highly oxidized layer is placed on a side opposite to a transparent substrate side. | 10-06-2011 |
20120028787 | DIELECTRIC CERAMIC COMPOSITION, DIELECTRIC BODY, CERAMIC SUBSTRATE, ELECTRONIC COMPONENT, AND METHOD FOR PRODUCING DIELECTRIC BODY - An electronic component | 02-02-2012 |
20120034552 | METHOD OF MANUFACTURING A PHOTOMASK - A thin film composed of a material containing a metal and silicon is formed on a transparent substrate, and a thin film pattern is formed by patterning the thin film. Then, the main surface and the side walls of the thin film pattern are previously modified so as to prevent the transfer characteristics of the thin film pattern from changing more than predetermined even in the case where exposure light with a wavelength of 200 nm or less is cumulatively applied onto the thin film pattern which has been formed. The main surface and the side walls are modified by, for instance, performing heat treatment to the main surface and the side walls at 450-900° C. in the atmosphere containing oxygen. | 02-09-2012 |
20120045713 | PHOTOMASK BLANK, METHOD OF MANUFACTURING THE SAME, PHOTOMASK, AND METHOD OF MANUFACTURING THE SAME - A photomask blank for use in the manufacture of a photomask adapted to be applied with exposure light having a wavelength of 200 nm or less has a thin film on a transparent substrate. The thin film is made of a material containing a transition metal, silicon, and carbon and comprising silicon carbide and/or a transition metal carbide. | 02-23-2012 |
20120251931 | TRANSFER MASK, METHOD OF MANUFACTURING A TRANSFER MASK, AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE - Provided is a transfer mask which has a transfer pattern formed in a pattern-forming thin film provided on a transparent substrate and is adapted to be applied with exposure light having a wavelength of 200 nm or less. The pattern-forming thin film is made of a material containing silicon an a transition metal other than chromium and the chromium content in the film is less than 1.0×10 | 10-04-2012 |
20130316271 | METHOD OF MANUFACTURING A TRANSFER MASK AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE - In a mask blank for manufacturing a transfer mask, the mask blank has a light-shielding film on a transparent substrate. The light-shielding film is made of a material containing tantalum as a main metal component and includes a highly oxidized layer which has an oxygen content of 60 at % or more and which is formed as a surface layer of the light-shielding film. The highly oxidized layer is placed on a side opposite to a transparent substrate side. | 11-28-2013 |
20140090459 | ENGINE STROKE DETERMINATION APPARATUS - There is provided an engine stroke determination apparatus. The engine stroke determination apparatus is for determining stroke of a single-cylinder four-stroke engine and includes a transistor igniter. The apparatus is configured to determine a compression stroke and an exhaust stroke by comparing voltages of ignition signals that are output in the compression stroke and the exhaust stroke by the transistor igniter. | 04-03-2014 |
20140127614 | PHOTOMASK BLANK, METHOD OF MANUFACTURING THE SAME, PHOTOMASK, AND METHOD OF MANUFACTURING THE SAME - A photomask blank for use in the manufacture of a photomask adapted to be applied with exposure light having a wavelength of 200 nm or less has a thin film on a transparent substrate. The thin film is made of a material containing a transition metal, silicon, and carbon and comprising silicon carbide and/or a transition metal carbide. | 05-08-2014 |
20150072273 | MASK BLANK, TRANSFER MASK, AND METHODS OF MANUFACTURING THE SAME - This invention provides a mask blank in which a thin film for transfer pattern formation is provided on a main surface of a transparent substrate. The thin film is made of a material containing a transition metal and silicon and further containing at least one of oxygen and nitrogen. The thin film has as its surface layer an oxide layer with an oxygen content higher than that of a region, other than the surface layer, of the thin film. The thin film is formed so that the thickness of its central portion is greater than that of its outer peripheral portion on the main surface side. The oxide layer is formed so that the thickness of its central portion is greater than that of its outer peripheral portion on the main surface side. | 03-12-2015 |
20150079502 | MASK BLANK AND METHOD OF MANUFACTURING A TRANSFER MASK - Provided is a mask blank having a structure including a thin film on a substrate, wherein the thin film is made of a material containing one or more elements selected from tantalum, tungsten, zirconium, hafnium, vanadium, niobium, nickel, titanium, palladium, molybdenum, and silicon, and wherein the normalized secondary ion intensity of at least one or more ions selected from a calcium ion, a magnesium ion, and an aluminum ion is 1.0×10 | 03-19-2015 |