Patent application number | Description | Published |
20090022614 | Method for Producing Sputtering Target Material for Ni-W Based Interlayer - There is provided a method for producing sputtering target materials which are used for a Ni—W based interlayer in a perpendicular magnetic recording medium. In this producing method, a Ni—W based alloy powder is prepared as a raw material powder. The alloy powder comprises 5 to 20 at % of W and the balance Ni and unavoidable impurities and is produced by gas atomization. The raw material powder is consolidated at a temperature ranging from 900 to 1150° C. This producing method makes it possible to significantly restrain expansion of the powder-filled billet in the consolidation step, thus efficiently producing Ni—W based sputtering target materials with stable qualities. | 01-22-2009 |
20110048582 | Ti-Based Brazing Filler Metal and Method for Producing the Same - A Ti-based brazing filler material comprising in mixture a Zr-containing alloy powder comprising 30 to 90% by mass of one or two of Cu and Ni, the balance being Zr and unavoidable impurities and a Ti-based powder comprising 0 to 50% by mass of one or two of Cu and Ni, the balance being Ti and unavoidable impurities, wherein the weight ratio of the Zr-containing alloy powder to the Ti-based powder is 8:2 to 4:6. This Ti-based brazing filler material can achieve good brazing and can exhibit excellent effects in the production of aerospace instruments, medical instruments, frames of glasses, heat-exchangers made from titanium. | 03-03-2011 |
20110265535 | High-Hardness Shot Material for Shot Peening and Shot Peening Method - A high hardness, high toughness and inexpensive shot material for shot peening is provided. The high-hardness shot material for shot peening comprises, in mass %, 5 to 8% of B; 0.05 to 1% of C; 0 to 25% of Cr; balance Fe and inevitable impurities. B and C are contained in a total amount of 8.5% or less. | 11-03-2011 |
20120286025 | Ni-Fe-BASED ALLOY BRAZING FILLER MATERIAL - A Ni—Fe-based alloy brazing filler material is provided comprising, in mass %, Fe: 21 to 40%; Cr: 10 to 30%; P: 7 to 11%; B: 0 to 5%; Si: 0 to 4.5%; V: 0 to 5%; Co: 0 to 5%; Mo: 0 to 5%; the balance being Ni and unavoidable impurities, wherein the mass ratio of Fe to P (Fe/P) is in a range of 2.6 to 5. The present invention provides a Ni—Fe-based alloy brazing filler material having a low melting temperature and a superior corrosion resistance and comprising raw materials that are relatively easily available, for use in manufacture of stainless-steel heat exchangers or the like. | 11-15-2012 |
20130224067 | Soft Magnetic Alloy for Magnetic Recording Medium, Sputtering Target Material, and Magnetic Recording Medium - There is provided a soft magnetic alloy for a perpendicular magnetic recording medium having a low coercive force, high amorphous properties, high corrosion resistance, and a high hardness; and a sputtering target for producing a thin film of the alloy. The alloy comprises in at. %: 6 to 20% in total of one or two of Zr and Hf; 1 to 20% of B; and 0 to 7% in total of one or two or more of Ti, V, Nb, Ta, Cr, Mo, W, Ni, Al, Si, and P; and the balance Co and/or Fe and unavoidable impurities. The alloy further satisfies 6≦2×(Zr%+Hf%)−B%≦16 and 0≦Fe%/(Fe%+Co%)<0.20. | 08-29-2013 |
20130302691 | Si Alloy Powder for Negative Electrode of Lithium-Ion Secondary Cell, and Method for Manufacturing Same - There are provided a Si alloy powder for a lithium ion secondary battery negative electrode active material, which has a high discharge capacity and excellent cycle life, and a method for producing the same. The Si alloy powder of the present invention comprises a eutectic structure including a Si phase and a CrSi | 11-14-2013 |
20140090222 | High-Hardness Atomized Powder, Powder for Projecting Material for Shot Peening, and Shot Peening Method Using Same - There is disclosed a high-hardness atomized powder comprising in mass %: 2 to 8% of B; and one or two or more of Ti, Cr, Mo, W, Ni, Al, and C in an amount satisfying the following expression: | 04-03-2014 |
20140154127 | Alloy and Sputtering Target Material for Soft-Magnetic Film Layer in Perpendicular Magnetic Recording Medium, and Method for Producing the Same - There are provided a sputtering target material for a soft-magnetic film layer with a high saturation magnetic flux density and high amorphous properties and a method for producing the sputtering target material. The target material is made of an alloy comprising one or more of Zr, Hf, Nb, Ta and B in an amount satisfying 5 at %≦(Zr+Hf+Nb+Ta)+B/2≦10 at % and having 7 at % or less of B; 0 to 5 at % in total of Al and Cr; and the balance being Co and Fe in an amount satisfying 0.20≦Fe/(Fe+Co)≦0.65 (at % ratio) with unavoidable impurities. | 06-05-2014 |
20140370386 | Si-Based-Alloy Anode Material - Disclosed is a Si-based alloy anode material for lithium ion secondary batteries, including an alloy phase with a Si principal phase including Si and a compound phase including two or more elements, which includes a first additional element A selected from Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zr, Nb and Mg and a low-melting second additional element B selected from S, Se, Te, Sn, In, Ga, Pb, Bi, Zn, Al. This compound phase includes (i) a first compound phase including Si and the first additional element A; a second compound phase including the first additional element A and the second additional element B; and one or both of a third compound phase including two or more of the second additional elements B and a single phase of the second additional element B. | 12-18-2014 |