Toshio Ando
Toshio Ando, Ishikawa JP
Patent application number | Description | Published |
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20080307864 | Scan Type Probe Microscope - Provided is an atomic force microscope capable of increasing the phase detection speed of a cantilever vibration. The cantilever ( | 12-18-2008 |
20090133168 | SCANNING PROBE MICROSCOPE - A scanning probe microscope is provided, which can be stably used for a long time even if excitation efficiency varies during scan. A cantilever ( | 05-21-2009 |
20090276924 | SCANNING PROBE MICROSCOPE AND ACTIVE DAMPING DRIVE CONTROL DEVICE - There is provided a scanning probe microscope that allows active damping to be advantageously carried out. | 11-05-2009 |
20090313729 | SCAN TYPE PROBE MICROSCOPE AND CANTILEVER DRIVE DEVICE - A driving laser unit ( | 12-17-2009 |
20100024082 | ATOMIC FORCE MICROSCOPE - There is provided an atomic force microscope (AFM) with increase the speed and sensitivity of detection of the resonant frequency shift in a cantilever. An AFM ( | 01-28-2010 |
20110093989 | SCANNER DEVICE FOR SCANNING PROBE MICROSCOPE - A scanner device is provided which enables high-frequency scanning and can increase the speed of a scanning probe microscope. A scanner device ( | 04-21-2011 |
Toshio Ando, Kitakatsuragi-Gun JP
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20090276939 | SOCK - A sock may include a first low-elasticity area disposed on a dorsal portion of the foot, the first low-elasticity area being band-shaped and having a lower elasticity than other areas of the sock. The first low-elasticity area may include a curved ankle portion and an end portion, the end portion being disposed below the curved ankle portion and extending to the base of the toes. The end portion may be positioned within a range from the base of the third toe to the base of the small toe. A center line in the course direction with respect to the width of the first low-elasticity area may gradually shift toward the side of the small toe in the course direction. Preferably, the first low-elasticity area applies a force that raises the side of the fifth toe toward the ankle curve portion thereby providing a resistive force against the ankle twisting inwards. | 11-12-2009 |
20120198601 | VAPOR-PERMEABLE WATERPROOF SOCK - A vapor-permeable waterproof sock includes a cylindrical main body including a cloth having vapor permeability and that is waterproof. The vapor-permeable waterproof sock covers a range from a foot tip portion to a crus portion. The cylindrical main body includes a plurality of cloth areas, each of which expands and contacts more easily in one direction as compared with other directions. The plurality of cloth areas are joined together, and include a crus cloth area expanding and contracting more easily in a circumferential direction of the crus portion as compared with in a longitudinal direction of the crus portion, the crus cloth area covering the crus portion; and a planta portion cloth area expanding and contacting more easily in a longitudinal direction of the planta portion as compared with a width direction of the planta portion. | 08-09-2012 |
Toshio Ando, Fukuoka-Ken JP
Patent application number | Description | Published |
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20110134741 | RECORDING/REPRODUCING METHOD IN READ-ONLY HOLOGRAPHIC RECORDING MEDIUM, AND READ-ONLY HOLOGRAPHIC RECORDING MEDIUM - A recording signal beam and a recording reference beam are irradiated onto a first surface of a holographic recording medium to write an information as an interference pattern therein. Next, a reflective layer is provided on a second surface opposite to the first surface of the holographic recording medium such that the reflective layer is adhered with the second surface, and a reproducing reference beam is irradiated onto the first surface of the holographic recording medium so as to read a signal beam which is reflected at the reflective layer and reproduced from the holographic recording medium. | 06-09-2011 |
Toshio Ando, Kitakyushu-Shi JP
Patent application number | Description | Published |
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20130321783 | VECTOR WAVE RECORDING MEDIUM, AND MULTIPLE RECORDING AND REPRODUCING METHOD - The present invention pertains to a vector wave recording medium which: has an information recording layer comprising a photo-induced birefringence material; irradiates a recording signal light of a first polarization state, and a recording reference light of a second polarization state that differs to the first polarization state; and carries out vector wave multiplex recording by holography on the information recording layer. The vector wave recording medium is configured in such a manner that ηmin/ηmax=0.1 is satisfied, where, assuming irradiation energy for the recording signal light and the recording reference light is constant, the maximum value of the diffraction efficiency of a playback signal light from diffraction gratings corresponding to information recorded in the information recording layer after the vector wave multiplex recording has been carried out by holography on the information recording layer, is regarded as ηmax, and the minimum value is regarded as ηmin. A vector wave recording medium and a multiplex recording and playback method therefor, which do not require scheduling to be carried out, and which carry no risk of causing a reduction in transfer rates in a recording system, can thus be provided. | 12-05-2013 |
20140349218 | PHOTOSENSITIVE MATERIAL, HOLOGRAPHIC RECORDING MEDIUM AND HOLOGRAPHIC RECORDING METHOD - A photosensitive material includes: a polymer matrix, a radical polymerization monomer and photo-radical polymerization initiator, wherein the polymer matrix has stable nitroxy radical at side chain thereof, wherein a molar ratio of the stable nitroxy radical to the radical polymerization monomer is set within a range of 0.03 to 0.25. | 11-27-2014 |
Toshio Ando, Kunitachi JP
Patent application number | Description | Published |
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20130244146 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE - After performing a pretreatment step of coating an organic solvent mixed with a polymeric organic compound over a substrate having a tungsten film formed on the surface of the substrate, a chemically amplified resist is coated to form a resist pattern. Further, a ratio of a C1s peak intensity to a W4d peak intensity measured by XPS is 0.1 or mote at the surface of the tungsten film after the pretreatment step and before coating the chemically amplified resist. | 09-19-2013 |