Patent application number | Description | Published |
20100003502 | TRANSPARENT CONDUCTIVE LAMINATE AND TOUCH PANEL EQUIPPED WITH IT - The transparent conductive laminate of the present invention is a transparent conductive laminate, comprising: a transparent film substrate; a transparent conductive thin film provided on one side of the transparent film substrate with a dielectric thin film interposed therebetween; and a transparent substrate bonded to another side of the transparent film substrate with a transparent pressure-sensitive adhesive layer interposed therebetween, wherein the transparent substrate comprises at least two transparent base films laminated with the transparent pressure-sensitive adhesive layer interposed therebetween, and the dielectric thin film comprises a first transparent dielectric thin film consisting of a SiO | 01-07-2010 |
20100013784 | TRANSPARENT CONDUCTIVE FILM, TRANSPARENT CONDUCTIVE LAMINATE, TOUCH PANEL, AND METHOD FOR PRODUCING TRANSPARENT CONDUCTIVE FILM - The transparent conductive film of the present invention is a transparent conductive film, comprising a transparent film substrate, and a first transparent dielectric layer, a second transparent dielectric layer and a transparent conductive layer that are formed on one or both sides of the transparent film substrate in this order from the transparent film substrate side, wherein the transparent conductive layer is patterned, the relation n | 01-21-2010 |
20100013798 | TRANSPARENT CONDUCTIVE FILM AND TOUCH PANEL - The transparent conductive film of the present invention is a transparent conductive film, comprising: a transparent film substrate; a patterned transparent conductive layer formed on one side of the transparent film substrate; and a colored layer provided on at least one of an opposite side of the transparent conductive layer from the transparent film substrate and an opposite side of the transparent film substrate from the transparent conductive layer, wherein the colored layer has an average absorptance of from 35% to 90% for light in the wavelength range of from 380 nm to 780 nm. | 01-21-2010 |
20100015417 | TRANSPARENT CONDUCTIVE FILM AND TOUCH PANEL - The transparent conductive film of the present invention is a transparent conductive film, comprising a transparent film substrate, and a first transparent dielectric layer, a second transparent dielectric layer and a patterned transparent conductive layer that are formed on one or both sides of the transparent film substrate in this order from the transparent film substrate side, wherein the transparent conductive layer has a thickness of 31 nm or more, the first transparent dielectric layer has a thickness of from 7 nm to 16 nm, the second transparent dielectric layer has a thickness of from 30 nm to 60 nm, and the relation n | 01-21-2010 |
20100136276 | PRESSURE-SENSITIVE ADHESIVE LAYER-CARRYING TRANSPARENT CONDUCTIVE FILM AND METHOD FOR PRODUCTION THEREOF - An object of the invention is to provide a transparent conductive film having good processability and to provide a method for production thereof. The pressure-sensitive adhesive layer-carrying transparent conductive film of the invention comprises: an amorphous transparent conductive laminate comprising a transparent plastic film substrate and an amorphous transparent conductive thin film provided on one side of the transparent plastic film substrate; a pressure-sensitive adhesive layer; and a release film that is provided on another side of the transparent plastic film substrate with the pressure-sensitive adhesive layer interposed therebetween and comprises at least a film substrate, wherein the release film is thicker than the amorphous transparent conductive laminate, and a value obtained by subtracting the thermal shrinkage percentage of the release film in the MD direction from the thermal shrinkage percentage of the amorphous transparent conductive laminate in the MD direction is from −0.3% to 0.45%. | 06-03-2010 |
20120111718 | METHOD FOR PRODUCING TRANSPARENT CONDUCTIVE FILM - A method for producing a transparent conductive film including a transparent film substrate and a crystalline transparent conductive layer, including: a first depositing a first indium-based complex oxide having a first tetravalent metal element oxide on the transparent film substrate; and a second depositing indium oxide or a second indium-based complex oxide and lower than the tetravalent metal element oxide content of the indium-based complex oxide used in the first depositing by sputtering to form an amorphous transparent conductive layer, and crystallizing the amorphous transparent conductive layer. The method allows a reduction in crystallization time. | 05-10-2012 |
20120114923 | TRANSPARENT CONDUCTIVE FILM, METHOD FOR PRODUCTION THEREOF AND TOUCH PANEL THEREWITH - A transparent conductive film includes a transparent film substrate; and a first and second crystalline transparent conductive laminate, wherein the second crystalline layer is located between the transparent film substrate and the first transparent conductive layer, and a second content of the tetravalent metal element oxide of the second transparent conductive layer is higher than a first content of the tetravalent metal element oxide of the second transparent conductive layer. The transparent conductive film allows a reduction in crystallization time. | 05-10-2012 |
20120181063 | TRANSPARENT CONDUCTIVE FILM AND TOUCH PANEL - The present invention relates to a transparent conductive film in which a transparent conductive layer is patterned and that is capable of suppressing deterioration of the appearance due to the difference in hues of reflected light between the pattern portion and the portion directly under the pattern opening portion, and a touch panel that uses it. In the transparent conductive film ( | 07-19-2012 |
20120273344 | METHOD FOR PRODUCTION OF TRANSPARENT CONDUCTIVE FILM AND TOUCH PANEL THEREWITH - There is provided a transparent conductive film having a transparent conductor layer with a high level of pen input durability and high-temperature, high-humidity reliability. The transparent conductive film of the present invention is a transparent conductive film, comprising: a transparent film substrate; a transparent conductor layer that is provided on one side of the transparent film substrate and has a thickness d of 15 nm to 35 nm and an average surface roughness Ra of 0.37 nm to 1 nm; and at least a single layer of an undercoat layer interposed between the transparent film substrate and the transparent conductor layer. | 11-01-2012 |
20130056149 | METHOD FOR MANUFACTURING TRANSPARENT CONDUCTIVE FILM - A method for manufacturing a transparent conductive film that can reduce a heating time of crystallizing an amorphous layer containing an indium-based complex oxide is provided. The method for manufacturing a transparent conductive film according to the present invention includes a first step of laminating an amorphous layer formed of an indium-based complex oxide on a first side of a film base material having a thickness of 10 to 50 μm, a second step of forming a transparent conductive layer by heating the film base material on which the amorphous layer is laminated to 160° C. or above to crystallize the amorphous layer during a process of conveying the film base material from a feed roller and taking up the film base material on a take-up roller, and a third step of forming an adhesive layer on a second side of the film base material. | 03-07-2013 |
20130098663 | TOUCH PANEL SENSOR - A capacitive touch panel sensor in which waviness generated in a film furnished with a transparent electrode pattern can be small. The touch panel sensor according to the present invention includes a first film, a first transparent electrode pattern formed on the first film, a first adhesive layer laminated on the first film so as to cover the first transparent electrode pattern, a second film laminated on the first adhesive layer, a second adhesive layer laminated on the second film, a third film laminated on the second adhesive layer, and a second transparent electrode pattern formed on the third film, wherein Da/Db is 0.5 to 0.9 where a total thickness of the second film and the second adhesive layer is Da, and a distance between the first transparent electrode pattern and the second transparent electrode pattern is Db. | 04-25-2013 |
20130105207 | TRANSPARENT CONDUCTIVE FILM | 05-02-2013 |
20130105301 | TRANSPARENT CONDUCTIVE FILM AND MANUFACTURING METHOD THEREFOR | 05-02-2013 |
20130149555 | TRANSPARENT CONDUCTIVE FILM AND MANUFACTURING METHOD THEREFOR - An object of the present invention is to manufacture a long transparent conductive film comprising a transparent film substrate and a crystalline indium composite oxide film formed on the transparent film substrate. The manufacturing method of the present invention includes an amorphous laminate formation step of forming an amorphous film of an indium composite oxide containing indium and a tetravalent metal on the long transparent film substrate with a sputtering method, and a crystallization step of continuously feeding the long transparent film substrate on which the amorphous film is formed into a furnace and crystallizing the amorphous film. The temperature inside the furnace in the crystallization step is preferably 170 to 220° C. The change rate of the film length in the crystallization step is preferably +2.5% or less. | 06-13-2013 |
20130241689 | TRANSPARENT CONDUCTIVE FILM AND TOUCH PANEL - The present invention provides a transparent conductive film in which occurrence of scratches during sliding is suppressed even when transparent conductive layer forming surfaces are so arranged as to face each other. Provided is a transparent conductive film comprising a transparent film base; at least one dielectric layer formed on a first main surface of the transparent film base; and a transparent conductive layer formed on the dielectric layer, wherein the transparent conductive layer is patterned; and the surface on the first main surface of the transparent conductive film has an arithmetical mean roughness Ra of 22 nm or more, and has 140/mm | 09-19-2013 |
20130258570 | CAPACITIVE TOUCH SENSOR LAMINATE FOR DISPLAY PANEL DEVICE - A capacitive touch sensor laminate for use in a display panel device includes: a dielectric central substrate structure made of a transparent resin material and formed to have flat surfaces, respectively, on opposite sides thereof; a at least one-layer structured coat layer made of a transparent material, formed on each of the flat surfaces, and including at least one refractive index adjusting layer for suppressing visibility of an electrode pattern formed by the transparent electrically conductive layer; and a transparent electrically conductive layer formed on and in adjacent relation to the coat layer. The at least one-layer structured coat layers formed on respective ones of the flat surfaces are configured such that thicknesses of corresponding layers therein on respective opposite sides of the dielectric central substrate structure are set to allow the corresponding layers to become mutually symmetrical across the dielectric central substrate structure. | 10-03-2013 |
20130280554 | TRANSPARENT CONDUCTIVE FILM AND MANUFACTURING METHOD THEREFOR - The present invention relates to a transparent conductive film which is excellent in dotting property under a heavy load and excellent in bending resistance. Provided is a transparent conductive film, comprising a flexible transparent base; and a transparent conductive layer formed on the flexible transparent base and including a crystalline indium/tin composite oxide, wherein a compressive residual stress of the transparent conductive layer is 0.4 to 2 GPa. | 10-24-2013 |
20130288047 | TRANSPARENT CONDUCTIVE FILM AND MANUFACTURING METHOD THEREFOR - Disclosed is a highly productive method for manufacturing a transparent conductive film. The method includes the step of sputter depositing a transparent, amorphous tin-indium oxide conductive layer on a transparent substrate. The surface of the substrate, on which the transparent conductive layer is formed, has an arithmetic mean roughness Ra of 1.0 or less. The sputter depositing step is performed under an atmosphere having a water partial pressure of 0.1% or less based on an AR gas partial pressure at a base material temperature of more than 100° C. and 200° C. or less, using a metal target or oxide target in which the amount of tin atoms is more than 6% by weight and 15% by weight or less, based on the total weight of indium and tin atoms. | 10-31-2013 |
20130295349 | TRANSPARENT CONDUCTIVE FILM WITH PRESSURE-SENSITIVE ADHESIVE LAYER, METHOD FOR PRODUCING SAME, AND TOUCH PANEL - The transparent conductive film is capable of preventing a situation in which level differences formed due to patterning exceed a design value, even when the film base used is a thin film base having a thickness of 110 μm or less or even when the transparent conductive layer has been crystallized by heating. Transparent conductive film with a pressure-sensitive adhesive layer comprises: a film base, a transparent conductive layer laminated on one surface of the film base and which is patterned and a pressure-sensitive adhesive layer laminated on the other surface of the film, wherein the film base has a thickness of 10 to 110 μm, a total thickness of the film base and the pressure-sensitive adhesive layer is 30 to 300 μm, and the pressure-sensitive adhesive layer has a storage modulus measured at 23° C. of 1.2×10 | 11-07-2013 |
20140035193 | METHOD FOR PRODUCTION OF TRANSPARENT CONDUCTIVE FILM - A method for producing a transparent conductive film includes heat-treating a transparent conductive film comprising a transparent film substrate and a transparent conductive laminate including a first transparent conductive layer and a second transparent conductive layer, so that the first and the second transparent conductive layers in the transparent conductive film are crystallized, wherein the first transparent conductive layer is a first amorphous layer comprising indium oxide or an indium-based complex oxide having a tetravalent metal element oxide, the second transparent conductive layer is a second amorphous layer comprising an indium-based complex oxide having a tetravalent metal element oxide, wherein each of the first and the second contents of the tetravalent metal element oxide content is expressed by the formula: {the amount of the tetravalent metal element oxide/(the amount of the tetravalent metal element oxide+the amount of indium oxide)}×100 (%). | 02-06-2014 |
20140036171 | TRANSPARENT CONDUCTIVE FILM AND TOUCH PANEL THEREWITH - A transparent conductive film includes a transparent film substrate; and a first and second crystalline transparent conductive laminate, wherein the second crystalline layer is located between the transparent film substrate and the first transparent conductive layer, and a second content of the tetravalent metal element oxide of the second transparent conductive layer is higher than a first content of the tetravalent metal element oxide of the second transparent conductive layer. The transparent conductive film allows a reduction in crystallization time. | 02-06-2014 |
20140071353 | DISPLAY PANEL DEVICE WITH TOUCH INPUT FUNCTION, OPTICAL UNIT FOR SAID DISPLAY PANEL DEVICE, AND PRODUCTION METHOD FOR SAME - Provided is an optical unit for a display panel device with a capacitive touch input function. In the optical unit, a touch panel laminate comprises: an optically transparent first substrate layer laminated to one surface of a transparent adhesive layer; a first transparent electrically conductive layer laminated, through a first undercoat layer, to a surface of the first substrate layer on a side opposite to the adhesive layer; an optically transparent second substrate layer laminated to the other surface of the adhesive layer; and a second transparent electrically conductive layer laminated, through a second undercoat layer, to a surface of the second substrate layer on a side opposite side to the adhesive layer. | 03-13-2014 |
20150086789 | TRANSPARENT CONDUCTIVE FILM - A transparent conductive film includes a film base and a polycrystalline layer of indium tin oxide formed on the film base. The polycrystalline layer has a thickness of 10 nm to 30 nm, an average value of gain size of 180 nm to 270 nm, and a carrier density of greater than 6×10 | 03-26-2015 |