Patent application number | Description | Published |
20080239151 | VIDEO SIGNAL PROCESSING APPARATUS, VIDEO DISPLAY APPARATUS AND VIDEO SIGNAL PROCESSING METHOD - According to one embodiment, a video signal processing apparatus has a scaling processing unit configured to perform scaling processing on a video signal, an expansion processing unit configured to perform expansion processing on a video signal, and a switching unit configured to switch whether the scaling processing unit uses a video signal after being expanded by the expansion processing unit or uses the video signal before being expanded by the expansion processing unit according to a resolution of the video signal inputted to the expansion processing unit. | 10-02-2008 |
20100066712 | VIDEO PROCESSING APPARATUS AND VIDEO PROCESSING METHOD - According an aspect of the invention, a video processing apparatus including: a sensor configured to measure an illuminance level; and a processing unit configured to receive a video signal and perform a gamma correction processing on the video signal to correct luminance of the video signal by using a correction value for the illuminance level so that the correction value becomes smaller as the illuminance level gets larger. | 03-18-2010 |
20100214472 | Image Processing Apparatus and Image Processing Method - According to one embodiment, an image processing apparatus includes a scaling converter, a luminance histogram detector, a determination module, and a super resolution processor. The scaling converter converts a first image signal to a second image signal having more pixels. The luminance histogram detector detects a luminance histogram. The determination module determines whether the second image signal includes a graphics image based on the luminance histogram. The super resolution processor converts the second image signal to a third image signal with a higher resolution than that of the second image signal, and performs sharpening based on the reference gain. When the second image signal includes a graphics image, the super resolution processor sets the gain of sharpening below the reference gain. | 08-26-2010 |
Patent application number | Description | Published |
20100048375 | METHOD FOR POLISHING GLASS SUBSTRATE AND PROCESS FOR PRODUCING GLASS SUBSTRATE - Spots generated on a glass substrate after a polishing step are reduced. The present invention relates to a method for polishing a glass substrate including injecting a silica abrasive and a high-boiling solvent in a final glass substrate polishing step. The high-boiling solvent is preferably a solvent having a molecular weight of 300 or lower and a boiling point of 150° C. or higher. As Examples of the high-boiling solvent having a molecular weight of 300 or lower and a boiling point of 150° C. or higher includes ethylene glycol, propylene glycol and glycerine. | 02-25-2010 |
20100248593 | POLISHING SLURRY, PROCESS FOR PRODUCING THE SAME, POLISHING METHOD AND PROCESS FOR PRODUCING GLASS SUBSTRATE FOR MAGNETIC DISK - The present invention provides a process for producing a polishing slurry, which achieves high-speed polishing of a principal plane of a glass substrate even when ceria crystal fine particles or ceria-zirconia solid solution crystal fine particles are employed. | 09-30-2010 |
20110123831 | METHOD FOR MANUFACTURING GLASS SUBSTRATE FOR MAGNETIC DISK - The present invention relates to a method for manufacturing a glass substrate for a magnetic disk, the method including: a polishing step of supplying a polishing slurry between a polishing cloth and a circular glass plate and polishing a main surface of the circular glass plate by the polishing cloth; and a slurry circulating step of allowing the polishing slurry to contain a polishing slurry used in the polishing step, in which the polishing slurry contains a cerium oxide particle having a median diameter of from 0.3 to 3 μm and an acetylenic surfactant. | 05-26-2011 |
20120038976 | COATING SOLUTION FOR FORMING ULTRAVIOLET-ABSORBING FILM, AND ULTRAVIOLET-ABSORBING GLASS ARTICLE - To provide a coating solution for forming an ultraviolet-absorbing film which has mechanical durability such as abrasion resistance and which is little susceptible to deterioration of the ultraviolet-absorbing ability by use for a long period of time, and an ultraviolet-absorbing glass article having an ultraviolet-absorbing film formed by using such a coating solution, which has mechanical durability such as abrasion resistance and which is little susceptible to deterioration of the ultraviolet-absorbing ability by use for a long period of time. | 02-16-2012 |
20140094032 | POLISHING AGENT AND POLISHING METHOD - A polishing agent for polishing a non-oxide single-crystal substrate such as a silicon carbide single-crystal substrate with a high polishing rate to obtain a smooth surface is provided. This polishing agent comprises an oxidant having redox potential of 0.5 V or more and containing a transition metal, silicon oxide particles, cerium oxide particles and a dispersion medium, in which a mass ratio of the silicon oxide particles to the cerium oxide particles is from 0.2 to 20. | 04-03-2014 |
20140187043 | POLISHING AGENT AND POLISHING METHOD - A non-oxide single-crystal substrate such as a silicon carbide single-crystal substrate is polished at a high polishing rate, whereby a smooth surface is obtained. There is provided a polishing agent containing: an oxidant that contains a transition metal and has a redox potential of 0.5 V or more; silica particles that have an average secondary particle size of 0.2 μm or less; and a dispersion medium, wherein a content ratio of the oxidant is not less than 0.25 mass % nor more than 5 mass %, and a content ratio of the silica particles is not less than 0.01 mass % and less than 20 mass %. | 07-03-2014 |
20140220299 | SINGLE-CRYSTAL SILICON-CARBIDE SUBSTRATE AND POLISHING SOLUTION - The present invention relates to a single-crystal silicon-carbide substrate provided with a principal surface having an atomic step-and-terrace structure containing atomic steps and terraces derived from a crystal structure, in which the atomic step-and-terrace structure has a proportion of an average line roughness of a front edge portion of the atomic step to a height of the atomic step being 20% or less. | 08-07-2014 |
Patent application number | Description | Published |
20100089758 | METHOD OF PREPARING ELECTROLYTIC COPPER SOLUTION ACIDIFIED WITH SULFURIC ACID, SULFURIC-ACID-ACIDIFIED ELECTROLYTIC COPPER SOLUTION PREPARED BY THE PREPARATION METHOD, AND ELECTRODEPOSITED COPPER FILM - An object of the present invention is to provide a method for preparing a sulfuric acid base copper electrolytic solution used for formation of an electro-deposited copper film comprising a surface excellent in smoothness and gloss when formed by using the solution just after preparation and is prepared by using mono-sulfides. To achieve the object, a sulfuric acid base copper electrolytic solution is made to contain a sulfonated active sulfur compound, the bis(3-sulfopropyl)disulfide which is recommended for formation of a glossy electro-deposited copper film. And the bis(3-sulfopropyl)disulfide contained is obtained by converting a 3-mercapto-1-propanesulfonic acid into the bis(3-sulfopropyl)disulfide in an aqueous solution of the 3-mercapto-1-propanesulfonic acid by an oxidation reaction. In the oxidation reaction, an air bubbling method is preferably used to prevent oxidative decomposition of the 3-mercapto-1-propanesulfonic acid. | 04-15-2010 |
20130295407 | SURFACE-TREATED COPPER FOIL - An object of the present invention is to provide a copper foil excellent in softening resistance performance which reduces decrease in tensile strength after heat treatment at about 350° C. to 400° C. In order to achieve the object, a surface-treated copper foil provided with a rust-proofing treatment layer on both surfaces of a copper foil in which a rust-proofing treatment layer is constituted by zinc alloy, and the either rust-proofing treatment layer is a zinc alloy layer having zinc amount of 20 mg/m | 11-07-2013 |
20130302635 | SURFACE-TREATED COPPER FOIL - An object of the present invention is to provide a copper foil excellent in softening resistance performance which reduces decrease in tensile strength after heat treatment at about 350° C. to 400° C. In order to achieve the object, a surface-treated copper foil provided with a rust-proofing treatment layer on both surfaces of a copper foil in which a rust-proofing treatment layer is constituted by zinc, and the either rust-proofing treatment layer is a zinc layer having zinc amount of 20 mg/m | 11-14-2013 |
20130306486 | METHOD FOR MANUFACTURING COPPER FOIL FOR NEGATIVE ELECTRODE CURRENT COLLECTOR - An object of the present invention is to provide a method for manufacturing a copper foil for a negative electrode current collector (specifically, copper foil for a negative electrode current collector of a lithium ion secondary battery) more excellent in discoloration resistance to improve charge/discharge cycle life of a secondary battery. To achieve the object, a method for manufacturing a copper foil for a negative electrode current collector of a secondary battery subjecting the copper foil to rust-proofing treatment, the method characterized in that the copper foil is rust-proofing treated with a chromate-treatment solution having pH in the range from 3.5 to 7.0 to form a chromate film on the surface of the copper foil is employed. | 11-21-2013 |
20140127569 | COPPER FOIL PROVIDED WITH CHROMATE FILM FOR NEGATIVE ELECTRODE CURRENT COLLECTOR, AND NEGATIVE ELECTRODE MATERIAL USING THE COPPER FOIL PROVIDED WITH CHROMATE FILM FOR NEGATIVE ELECTRODE CURRENT COLLECTOR - An object of the present invention is to eliminate deviation in the quality of a chromate film provided on a copper foil for a negative electrode current collector to eliminate fluctuation of electric capacity in a lithium ion secondary battery. | 05-08-2014 |
20140170489 | METHOD OF MANUFACTURING NEGATIVE ELECTRODE MATERIAL FOR LITHIUM ION SECONDARY BATTERY, AND NEGATIVE ELECTRODE MATERIAL FOR LITHIUM ION SECONDARY BATTERY - In manufacturing of a negative electrode material of a lithium ion secondary battery provided with a negative electrode mixture layer including a negative electrode active substance on a surface of a negative electrode current collector, one or mixture selected from granular materials alloyable with lithium and carbon materials for storing and releasing lithium is used as the negative electrode active substance; manufacturing method of a negative electrode material for a lithium ion secondary battery employed is characterized in that an electro-deposited copper foil in which a surface roughness (Ra) is 0.20 μm06-19-2014 | |
Patent application number | Description | Published |
20100081013 | MAGNETIC DISK SUBSTRATE AND MAGNETIC DISK - In a magnetic disk substrate being annular and having a first and a second main surface, (1) surface roughness measured by an atomic force microscope having a resolution of 256×256 pixels per 2 μm square and/or (2) the number of foreign substances detected to have sizes of 0.1 μm or more and 1.0 μm or less upon detection of scattered light from the magnetic disk substrate when laser light with a wavelength of 405 nm is irradiated with a spot size of 5 μm at a laser power of 25 mW differ/differs between the first and the second main surfaces. Only the first main surface has a surface quality usable as a magnetic recording surface. The number of the foreign substances detected to have the sizes of 0.1 μm or more and 1.0 μm or less upon detection of the scattered light from the magnetic disk substrate when the laser light with the wavelength of 405 nm is irradiated with the spot size of 5 μm at the laser power of 25 mW is 400 or less per 30 cm | 04-01-2010 |
20110165439 | METHOD OF MANUFACTURING A GLASS SUBSTRATE FOR A MAGNETIC DISK, GLASS SUBSTRATE FOR A MAGNETIC DISK, METHOD OF MANUFACTURING A MAGNETIC DISK, AND MAGNETIC DISK - Provided is a method of manufacturing a magnetic disk glass substrate, wherein, in a main surface polishing process, main surface polishing is applied to one of main surfaces of a glass substrate so that the one main surface has a predetermined arithmetic mean roughness, and main surface polishing is applied to the other main surface of the glass substrate so that the other main surface has a roughness which is higher than the arithmetic mean roughness (Ra) of the one main surface and which is low enough to prevent a component forming the magnetic disk glass substrate from being eluted from the other main surface. | 07-07-2011 |
20110308073 | MAGNETIC DISK MANUFACTURING SUPPORT METHOD AND MAGNETIC DISK MANUFACTURING METHOD - A defect inspection is performed for each of glass substrates by a surface defect detector. The distance from the center of the glass substrate to a detected defect, as a radius of a nonmagnetic region to be formed circular, is recorded along with an ID assigned to the glass substrate. Such defect information is recorded in a defect list using a printer or recorded in an RFID tag using an RFID writer. The defect list or the RFID tag is attached to a glass-substrate case. Each glass substrate and its defect information are in one-to-one correspondence and are provided to a customer as a magnetic disk manufacturer. Based on the obtained defect information, the customer manufactures magnetic disks each being a discrete track recording medium having the nonmagnetic region formed at the position where the defect is present. | 12-22-2011 |